Makeup removing composition as well as preparation method and application thereof
A composition and makeup removal technology, which is applied in cosmetic preparations, dressing preparations, cosmetics, etc., can solve the problems of weak makeup removal power and high sensitization rate, and achieve the effect of high makeup removal power
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Embodiment 1
[0058] This embodiment provides a makeup remover composition and makeup remover water prepared by using the makeup remover composition.
[0059] (1) the makeup remover composition comprises:
[0060] Cleansing ingredients: 2g poloxamer 184, 1g caprylic / capric glyceryl polyglycerol-10 esters, 8g glyceryl polyether-26, 2g sapinberry fruit extract, 0.01g polysorbate-20, 2.5g 1,2-pentanediol;
[0061] Skin conditioner: 1g reed extract, 1g Poria cocos extract, 2g sugar isomers, 1g hot spring water and 1g yeast lysate extract;
[0062] Moisturizer: 2g hexanediol;
[0063] Chelating agent: 0.05g EDTA-2Na.
[0064] (2) Utilize described cleansing composition to prepare a kind of cleansing water, described cleansing water comprises following component by mass percentage:
[0065] 2% Poloxamer 184, 1% Caprylic / Capric Glycerides Polyglyceryl-10 Esters, 8% Glyceryl Polyethers-26, 2% Sapinberry Fruit Extract, 0.01% Polysorbate-20, 2.5% 1,2-pentanediol, 1% reed extract, 1% poria cocos ...
Embodiment 2
[0074] This embodiment provides a makeup remover composition and makeup remover water prepared by using the makeup remover composition.
[0075] (1) the makeup remover composition comprises:
[0076] Cleansing ingredients: 2g poloxamer 184, 1g caprylic / capric glyceryl polyglycerol-10 esters, 8g glyceryl polyether-26, 2g sapinberry fruit extract, 0.01g polysorbate-20, 2.5g 1,2-pentanediol;
[0077] Skin conditioner: 1g purslane extract, 0.05g dipotassium glycyrrhizinate, 1g yeast lysate extract, 1g hot spring water;
[0078] Moisturizer: 2g hexanediol;
[0079] Chelating agent: 0.05g EDTA-2Na.
[0080] (2) Utilize described cleansing composition to prepare a kind of cleansing water, described cleansing water comprises following component by mass percentage:
[0081] 2% Poloxamer 184, 1g Caprylic / Capric Glyceryl Polyglyceryl-10 Esters, 8% Glyceryl Polyethers-26, 2% Sapinberry Fruit Extract, 0.01% Polysorbate-20, 2.5 %1,2-pentanediol, 1% purslane extract, 0.05% dipotassium g...
Embodiment 3
[0084] This embodiment provides a makeup remover composition and makeup remover water prepared by using the makeup remover composition.
[0085] (1) the makeup remover composition comprises:
[0086] Cleansing ingredients: 2g poloxamer 184, 1g caprylic / capric glyceryl polyglycerol-10 esters, 8g glyceryl polyether-26, 2g sapinberry fruit extract, 0.01g polysorbate-20, 2.5g 1,2-pentanediol;
[0087] Skin conditioner: 1g reed extract, 1g Poria cocos extract, 2g sugar isomers, 1g hot spring water and 1g yeast lysate extract;
[0088] Moisturizer: 2g hexanediol;
[0089] Chelating agent: 0.05g EDTA-2Na.
[0090] (2) Utilize described cleansing composition to prepare a kind of cleansing water, described cleansing water comprises following component by mass percentage:
[0091] 2% Poloxamer 184, 1g Caprylic / Capric Glyceryl Polyglyceryl-10 Esters, 8% Glyceryl Polyethers-26, 2% Sapinberry Fruit Extract, 0.01% Polysorbate-20, 2.5 %1,2-pentanediol, 1% reed extract, 1% Poria cocos ex...
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