HMDS leakage-proof protection device for spin coating developer

A protection device and developing machine technology, applied in photography, opto-mechanical equipment, photo-engraving process of pattern surface, etc., can solve the problem of easy leakage of HMDS
CN113376977APending Publication Date: 2021-09-10宁波润华全芯微电子设备有限公司
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
宁波润华全芯微电子设备有限公司
Publication Date
2021-09-10

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Abstract

The invention relates to the technical field of HMDS treatment equipment, and particularly relates to an HMDS leakage-proof protection device for a spin coating developer. The device comprises an HMDS tank, a sealing protection cover, a nitrogen feeding mechanism, a rack, an air exhaust mechanism mounted on the rack, an absorption mechanism, an automatic recovery mechanism, a controller, a leakage detection sensor and an alarm, wherein the air exhaust end of the air exhaust mechanism is arranged in the sealing protection cover; the absorption mechanism is arranged on the air exhaust mechanism; the automatic recovery mechanism is arranged on the rack, and the air exhaust end of the automatic recovery mechanism is in sealing connection with the top end of the inner side of the sealing protection cover; the controller is arranged on the outer side wall of the sealing protection cover; the leakage detection sensor is arranged on the inner side of the sealing protection cover, and the leakage detection sensor is electrically connected with the controller; and the alarm is installed on the outer side wall of the sealing protection cover and electrically connected with the leakage detection sensor and the controller. Safety accidents caused by HMDS leakage can be completely eradicated, if leakage occurs, an alarm signal is sent out, raw material supply is cut off, continuous leakage is avoided, and leaked HMDS is collected.
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Description

technical field

[0001] The invention relates to the technical field of HMDS processing equipment, in particular to an HMDS leak-proof protection device for a glue leveling developing machine. Background technique

[0002] In the prior art, before coating the photoresist, people need to put the substrate into the HMDS pretreatment equipment for pretreatment. The purpose is to reduce the contact angle between the HMDS-treated silicon wafer and the photoresist, thereby reducing the The difficulty of spreading the photoresist on the surface of the silicon wafer during the photoresist improves the adhesion between the photoresist and the silicon wafer. The tackifier HMDS (hexamethyldisilazane) can improve this situation very well. After the HMDS is coated on the surface of the silicon wafer, it can be reacted to form a compound mainly composed of siloxane after being heated in an oven. It successfully changes the surface of the silicon wafer from hydrophilic to hydrophobic, and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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