Alternaria compacta and application thereof

A Alternaria, dense technology, applied in the field of microorganisms, can solve the problems of plant withering, reduction of active ingredients, and intensified spread, and achieve the effect of broad application prospects

Active Publication Date: 2021-12-10
杨凌未来中科环保科技有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology allows creating tiny chains called cyclorimycins that have high activity against various types of bacteria such as those causing whisker disease or root rot caused by fungi. These small molecules were found effective at killing these germs effectively without harmful side reactions like other chemical agents.

Problems solved by technology

This patented describes various methods for controlling vegetative forms such as stalk weeds like grasshopper moss, wheatgrass rust, barley scurfrogs, tomato bulbs, rice stem borne germ plugs, etceterious organisms called Actinosynnema Colletae. These microorganism colonies may enter through cracks during harvesting causing economic losses due to their ability to attack different types of folds and organs found throughout these structures. Biology controls prevention measures against this type of insect pest, while chemical pesticide treatments aim towards reducing resistance over time.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Alternaria compacta and application thereof
  • Alternaria compacta and application thereof
  • Alternaria compacta and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The source and identification of embodiment 1 Alternaria compacta (Alternaria compacta) XL-0013

[0030] ①The source of Alternaria compacta XL-0013

[0031] On September 4, 2017, a fungus was isolated from basil picked from the botanical garden of Shenyang Pharmaceutical University in Liaoning Province, named XL-0013.

[0032] ② Identification of XL-0013

[0033] See the sequence listing (SEQ ID NO.1) for the ITS sequencing sequence of XL-0013, which has the highest sequence similarity with Sequence ID: MW008978.1, with a similarity of 100.00%.

[0034] According to the above identification results, XL-0013 belongs to Alternaria compacta.

Embodiment 2

[0035] Main morphological characteristics of embodiment 2 Alternaria compacta (Alternaria compacta) XL-0013

[0036] Inoculate Alternaria compacta XL-0013 on potato glucose medium, culture at a constant temperature of 28°C, the initial colony is white, radially expanding, the mycelium is dense, the colony is round, the edges are neat, and the aerial hyphae are well developed, 3d After that, the color of the colony gradually becomes darker, and gradually turns grayish brown to black. Conidiophores dark, solitary, of varying lengths, terminal conidia. The conidia are dark in color, with 1 to 7 diaphragms and 0 to 4 mediastinums, obtrusive, oval or ovoid, with an average size of 6.3-15.2um×22.4-50.6um.

[0037] The formula of the PDA medium: potato powder 3g / L, glucose 20g / L, agar 14g / L, pH 5.6±0.2.

[0038] See the single colony morphology of the strain on the PDA platefigure 1 , figure 1 -A for figure 1 -A is the front view of the tablet; figure 1 -B is the back view of th...

Embodiment 3

[0039] Embodiment 3 Alternaria compacta (Alternaria compacta) XL-0013 is to pathogenic fungus bacteriostatic rate determination

[0040] Adopt plate confrontation method to measure the bacteriostatic ability of fungus to be screened (Alternaria compacta XL-0013) to fungi (ten strains of pathogenic fungi) to be tested, concrete method is as follows:

[0041] Prepare a PDA plate, culture the fungus to be screened and the fungus for testing respectively, and then use a sterilized 5mm hole puncher to punch holes in the parts where the growth of the two culture media is the same (distance from the edge of the dish). equidistant). On the PDA empty plate, use sterilized tweezers to pick up the perforated medium block, and inoculate two kinds of fungi respectively on the same straight line from the center of the plate about 3cm away, and then measure the antibacterial effect every 24 hours Circle size (cross method). The antibacterial rate was calculated according to the following f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to Alternaria compacta and application thereof, and belongs to the technical field of microorganisms. The Alternaria compacta is preserved in the China General Microbiological Culture Collection Center on July 15, 2021, and the preservation number is CGMCC No. 23046. A liquid culture of the Alternaria compacta has a remarkable inhibiting effect on four fungi including Alternaria maydis, pathogenic bacteria of rhizoma atractylodis wilt, pathogenic bacteria of salvia miltiorrhiza wilt and pathogenic bacteria of salvia miltiorrhiza root rot, and the application prospect is wide.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner 杨凌未来中科环保科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap