Offset amount calibrating method and surface texture measuring machine
Patent Information
- Authority / Receiving Office
- US · United States
- Current Assignee / Owner
- Publication Date
- 2011-04-14
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Abstract
Description
[0001] The entire disclosure of Japanese Patent Application No. 2009-236126 filed Oct. 13 2009 is expressly incorporated by reference herein.BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to a surface texture measuring machine equipped with a contact-type detector with a stylus and an image probe and to an offset amount calibrating method for obtaining the offset amount between the contact-type detector and the image probe.
[0004] 2. Description of Related Art
[0005] There has been known a surface texture measuring machine in which a stylus is moved along a surface of an object while being in contact with the surface of the object. The displacement of the stylus due to the surface profile or surface roughness of the object is detected, thereby measuring the surface texture such as the surface profile, surface roughness or the like of the object based on the displacement of the stylus (see, for instance, Patent Literature: JP-A-05-087562).[00...
Examples
Embodiment Construction
Description of Surface Texture Measuring Machine (Reference to FIGS. 1 to 5)
[0036]As shown in FIGS. 1 and 2, a surface texture measuring machine according to an exemplary embodiment of the present invention includes: a mount stand 1; a base 2 being fixed on the upper surface of the mount stand 1; a stage 10 being mounted on the base 2, the stage 10 having an upper surface on which an object is mounted; a contact-type detector 20 being provided with a stylus 24 that is brought into contact with a surface of the object; an image probe 30 that captures the image of the surface of the object; a relative movement mechanism 40 that relatively moves the contact-type detector 20 and the image probe 30 against the stage 10 and moves the stage 10 against the contact-type detector 20 and the image probe 30; and a controller 50.
[0037]The relative movement mechanism 40 includes: an X-axis driving mechanism 41 as a first movement mechanism being located between the base 2 and the stage 10 to move...