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Mechanical rubbing method for fabricating cycloidal diffractive waveplates

a diffractive waveplate and mechanical rubbing technology, applied in the field of liquid crystal fabrication, can solve the problems of limited use of the technique to small components, optics, and expensive lasers providing coherent beams, and achieve the effect of high spatial resolution

Active Publication Date: 2018-03-01
BEAM ENG FOR ADVANCED MEASUREMENTS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The objective of this patent is to create precise boundary conditions using mechanical rubbing with high spatial resolution.

Problems solved by technology

Holographic technique requires expensive lasers providing coherent beams, optics and opto-mechanical stabilization systems.
Radiation power and beam size limitations limit the use of the technique to small components only.
The materials used for photoalignment are also expensive, not widely available, and often do not provide strong enough orientation conditions for LC molecules.
However, to the best of our knowledge none addressed the opportunity for producing general patterns with high spatial resolution.

Method used

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  • Mechanical rubbing method for fabricating cycloidal diffractive waveplates
  • Mechanical rubbing method for fabricating cycloidal diffractive waveplates
  • Mechanical rubbing method for fabricating cycloidal diffractive waveplates

Examples

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Embodiment Construction

[0022]Before explaining the disclosed embodiment of the present invention in detail it is to be understood that the invention is not limited in its application to the details of the particular arrangement shown since the invention is capable of other embodiments. Also, the terminology used herein is for the purpose of description and not limitation.

[0023]The method of aligning LCs due to mechanical rubbing, still the main technique used in fabrication of LCDs, is shown in FIG. 3. A wheel 300 with a rubbing film 310 wrapped around it, typically a textile, is rotating around an axis 301 such as the rubbing film 310 touches the surface of a substrate 320 carrying the alignment polymer layer 313, typically, a polyimide, poly-vinyl alcohol, etc. The substrate is translated exposing fresh areas of the polymer to the rubbing action. The process creates anisotropy due to aligning the polymer fragments 312 as well as scratching the surface of the polymer at nanoscale. This anisotropy is not ...

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Abstract

Cycloidal boundary conditions for aligning liquid crystalline materials are obtained by mechanical rubbing of a polymer coating. The rubbing is performed by a rubbing head rotating around an axis perpendicular to the rubbing plane while the alignment polymer film is being translated across the rubbing film such as only a linear portion of the alignment film touches the rubbing film at any given time.

Description

CROSS REFERENCESU.S. Patent Documents[0001]U.S. Pat. No. 7,048,619 May 2006 Park et al.[0002]U.S. Pat. No. 8,045,130 October 2011 Son, et al.RELATED APPLICATIONS[0003]This application claims priority to Provisional Application No. 61 / 771,895 filed Mar. 3, 2013, the contents of which are relied upon and incorporated herein.FIELD OF THE INVENTION[0004]This invention relates to fabrication of liquid crystal, including liquid crystal polymer diffractive waveplates (DWs) with the aid of mechanical rubbing. DWs are used in imaging, sensor, communication, photonics, laser and display technologies.BACKGROUND OF THE INVENTION[0005]The structure of one of the optical components of interest is schematically shown in FIG. 1. Essentially, it is an optically anisotropic film 100 with the optical axis orientation 101 rotating in the plane of the film, the x,y plane in FIG. 1. In simplest realization, the rotation angle α of the optical axis orientation is a linear function of a single coordinate, ...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G02F1/1337
CPCG02F1/133784G02B5/3016G02B5/3083
Inventor TABIRIAN, NELSON
Owner BEAM ENG FOR ADVANCED MEASUREMENTS