Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cultivation method for improving cold resistance of improved peach variety

A cultivation method and a technology of cold resistance, which are applied in the cultivation field of improving the cold resistance performance of improved peach varieties, can solve problems such as lack of improved peach varieties and difficulty in large-scale development, and achieve improved cold resistance, uniform and reasonable nutrient distribution, and promotion of large-scale production The effect of development

Active Publication Date: 2014-01-01
张掖市林业科学研究院
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a cultivation method for improving the cold resistance of improved peach varieties, so as to solve the problem of lack of improved peach varieties in the Hexi area of ​​Gansu and difficulty in large-scale development

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] 1. Rootstock construction:

[0016] Use 2-3 year-old local Gansu peach rootstock seedlings, plant the plants with a row spacing of 2×4m, dig planting holes (1m×1m×1m), separate the topsoil from the raw soil, and first spread a layer of 15cm thick crop straw on the bottom of the hole. Then mix and fill with 1 / 3 topsoil, 1 / 3 sand, and 1 / 3 decomposed sheep manure, and then plant after watering and sinking. After planting, set the stem height to 85-120cm to promote the germination of side branches.

[0017] 2. Scion preparation:

[0018] Select the well-developed branches of peach varieties with substantial growth and full bud eyes as the scion;

[0019] 3. Grafting:

[0020] ①Time: June 20-August 10;

[0021] ②Grafted varieties: Sand Red Peach, Abu White, Super Hard Heart Peach, etc.;

[0022] ③Grafting method and operation: "T" shaped bud grafting. Carry out multi-branch high-grafting at the rootstock fixed height of 85cm-120cm, complete the gra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a cultivation method for improving cold resistance of an improved peach variety. The problems of shortage of improved peach variety in Hexi district in Gansu province and difficulty of large-scale development of peaches are solved. The method comprises the following steps of: A selecting stocks, namely selecting local seedling Gansu wild peach stocks; B, building a stock garden, namely adopting 2-3 perennial wild peach stock seedlings, digging planting holes according to the planting space of 2*4m, laying a crop straw layer with the thickness of 15cm at the bottoms of the holes, uniformly mixing and filling the holes through surface soil, sand and thoroughly decomposed sheep manure, watering, settling and planting; C, grafting, namely taking developmental branches of the improved peach variety which have full growth and full eyes as scions, performing multi-branch top grafting on 20, June to 10, August by employing a T-shaped budding method, and finishing grafting of 6-10 buds; D, managing after grafting; and E, trimming. The local seedling Gansu wild peach stocks are selected, the cultivation method is high in adaptability and high in grafting compatibility, and the fruiting year limit is prolonged; and moreover, the cold resistance of the improved peach variety is greatly improved, and the aim of safely overwintering the exposed improved peach variety is fulfilled.

Description

technical field [0001] The invention relates to the field of fruit tree cultivation, in particular to a cultivation method for improving the cold resistance performance of improved peach varieties. Background technique [0002] Peach tree fruit is rich in nutrition, good in quality, good in taste, and high in medicinal and health care value. It is known as "fairy fruit on earth". Peach trees have early fruit and high yield, strong drought tolerance, wide suitable range, and a large cultivation area in my country. Good seedlings of peach are mainly propagated by grafting, and the selection of good rootstocks has practical significance such as regulating tree vigor, prolonging the fruiting period, and even regulating fruit quality. At present, in the cultivation and reproduction of improved peach varieties at home and abroad, low-grafting is adopted, that is, the grafting height is less than 10 cm. After grafting improved varieties, the growth rate is fast, the growth is vigo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A01G17/00
Inventor 马力冯军仁占玉芳丁丽萍陈斌张永霞
Owner 张掖市林业科学研究院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com