Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate installing device of exposure machine

An installation device and mask technology, which can be used in photolithography process exposure devices, optomechanical equipment, microlithography exposure equipment, etc., and can solve problems such as the disappearance of the suction force of the negative pressure unit, the falling of the mask, and the deflation of the air bag. , to prevent damage

Active Publication Date: 2013-05-08
BOE TECH GRP CO LTD +1
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned structure has the following defects: once the supply of the CDA supply unit or the negative pressure unit is abnormal, the air bag will be deflated, the cylinder piston will retract, or the suction force of the negative pressure unit will disappear, causing the mask frame to drop, the mask plate to fall, damage, serious loss

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate installing device of exposure machine
  • Mask plate installing device of exposure machine
  • Mask plate installing device of exposure machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0035] figure 2 A schematic structural view of the mask plate mounting device of the exposure machine of this embodiment is shown, image 3 yes figure 2 The enlarged view of the local structure in Figure 4 is a schematic diagram of the anti-mask drop structure. refer to figure 2 and image 3 , the exposure machine mask installation device includes: a mask holder 8 for fixing the mask 9, a plurality of airbags arranged under the mask holder 8 for supporting the mask holder 8, and a gas communicated with the airbags A supply unit (not shown in the figure), the gas supply unit may be a CDA supply unit; a pneumatic switch valve is arranged on the gas supply pipeline ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a mask plate installing device of an exposure machine. The device comprises a mask frame for fixing a mask plate and an air bag which is arranged below the mask frame and used for supporting the mask frame, wherein the air bag is communicated with an air supply unit through an air supply pipeline; a pneumatic switch valve is arranged on the air supply pipeline; and when the supply of the air supply unit is interrupted, the air supply pipeline is controlled by the pneumatic switch valve to be closed so as to prevent the air bag from air leakage. According to the invention, the pneumatic switch valve is arranged on the air supply pipeline, so that when the supply of the air supply unit is interrupted, the pneumatic switch valve can be automatically switched to a close state so as to block the air in the air bag and prevent the mask frame from dropping due to the air leakage of the air bag; and when the air supply unit normally supplies, the air supply pipeline is controlled by the pneumatic switch valve to continue supply air to the air bag, so that the danger that the mask frame drops due to the interruption of the air supply unit is avoided.

Description

technical field [0001] The invention relates to an exposure machine structure, in particular to a mask mounting device for an exposure machine which has high safety and can prevent the mask frame from falling off in the equipment. Background technique [0002] The mask (Mask) is an important part of the exposure system. The mask needs to be clamped and supported by certain devices when used, such as figure 1 As shown, the mask plate 9 is installed on the mask frame 8 of the exposure equipment, the mask frame 8 is a square frame structure, the mask plate 9 is located at the center of the mask frame 8, the upper part of the edge area of ​​the mask plate 9 and The lower part ensures the stability of the mask plate 9 through adsorption or supporting structures. Specifically, a negative pressure unit is provided on the mask frame 8 to absorb the upper part of the edge area of ​​the mask plate 9; a support part is provided at the lower part of the edge area of ​​the mask plate 9 ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70691G03F7/707G03F7/70783G03F7/70816G03F7/709G03F7/70991H01L21/027G03F7/70716G03F7/708G03F7/70808G03F7/70825
Inventor 陈润肖金涛周振远
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com