Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An auxiliary guiding system for intracranial puncture

A guidance system and subsystem technology, applied in the field of intracranial puncture auxiliary guidance system, can solve the problems of inconvenient use, high price, complex structure, etc., and achieve the effect of reducing pain, low cost and low complexity

Active Publication Date: 2015-09-16
ZHEJIANG UNIV OF TECH
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the disadvantages of complex structure, inconvenient use and high price of the existing puncture guide devices, the present invention provides an auxiliary guide system for intracranial puncture with simplified structure, low cost and easy operation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An auxiliary guiding system for intracranial puncture
  • An auxiliary guiding system for intracranial puncture
  • An auxiliary guiding system for intracranial puncture

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The present invention will be further described below in conjunction with the accompanying drawings.

[0021] refer to Figure 1 ~ Figure 3 , an intracranial puncture auxiliary guidance system, comprising a puncture angle and depth calculation subsystem and a puncture device subsystem, the puncture angle and depth calculation subsystem comprising:

[0022] The planned puncture angle and depth calculation module is used to set the reference point, target point and entry point to establish a reference reference plane according to the head scan image, calculate the length of the puncture path composed of the target point and entry point, and determine the length of the puncture path and the reference point The included angle between the reference planes is corrected by the angle correction data to obtain the final planned puncture angle and depth;

[0023] a first communication module, configured to transmit the planned puncture angle and depth to the puncture device;

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an encephalic puncturing auxiliary guiding system which comprises a puncturing angle and depth calculating subsystem and a puncturing device subsystem. The puncturing angle and depth calculating subsystem comprises a plan puncturing angle and depth calculating module and a first communication module. The puncturing device subsystem comprises an angle measuring module, a depth measuring module, a second communication module and a puncturing monitoring module and is used for comparing a real-time angle with a plan puncturing angle of a puncturing device and comparing a current puncturing depth with a plan puncturing depth. The encephalic puncturing auxiliary guiding system is simple in structure, low in cost and easy to operate.

Description

technical field [0001] The invention relates to an auxiliary guiding system for intracranial puncture, which belongs to medical equipment for intracranial puncture. Background technique [0002] Intracranial puncture is one of the effective surgical methods for the treatment of cerebral hemorrhage hematoma. Compared with traditional craniotomy, which is difficult, dangerous and expensive, puncture treatment of cerebral hemorrhage has the advantages of less trauma, safety and reliability, simple operation and lower price and so on, so its application is becoming more and more extensive. However, because the puncture direction angle and puncture depth often need to be determined by the doctor's experience, it has a certain impact on the efficiency and quality of the operation, and some existing puncture guides or systems are often complex in structure, inconvenient to use, and expensive, and Some devices need to be fixed on the patient's head to achieve the purpose of positio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61B17/34A61B19/00
CPCA61B17/3403
Inventor 方路平潘清曹平洪文杰姚家良陈晓雷郑远
Owner ZHEJIANG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com