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Mild moisturizing facial mask

A wet face, gentle technology, applied in the field of daily chemicals, can solve the problems of unsafety, mask allergies, preservative irritation, etc., achieve the effect of less preservative dose, maintain system moisture, and high solubility

Active Publication Date: 2014-12-10
HUNAN YUJIA COSMETICS MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the masks on the market generally have problems such as irritation and allergies. The main reason is that the conventional preservatives used now are more or less irritating and unsafe.

Method used

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  • Mild moisturizing facial mask
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  • Mild moisturizing facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The present invention is used with the conventional facial film usage method, mainly comprises the following several steps:

[0042] (1) After cleansing, apply the facial mask to the face and stick to the skin;

[0043] (2) Gently press the mask with your fingers to make it completely adhere to the skin. Relax and wait for 15-20 minutes;

[0044] (3) Remove the mask and gently massage the face to absorb the essence.

[0045] Table 1 is the comparison test grouping of the mild and moisturizing facial mask of the present invention (both Examples 1 and 2 are an embodiment of the mild and moisturizing facial mask of the present invention) and the control group

[0046] The percentages in Table 1 are all percentages by weight

[0047]

[0048]

[0049] Following is the experimental test data of the present invention:

[0050] Microbial Challenge Experiment

[0051] 1. Method

[0052] A challenge test recommended by CTFA.

[0053] 2. Evaluation criteria

[0054]...

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PUM

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Abstract

The invention discloses a mild moisturizing facial mask which comprises the following components in percentage by weight: 8-20 percent of a wetting agent, 0.1-0.5 percent of a thickening suspending agent, 0.2-2 percent of an antiallergic agent, 0.1-0.5 percent of a neutralizer, 0.1-0.8 percent, preferably 0.2-0.5 percent of a preservative, 0.4-0.7 percent of an anticorrosion synergistic agent, 0.05-0.2 percent of a solubilizer and the balance of water. The mild moisturizing facial mask disclosed by the invention is mild in components and low in addition amount of the preservative; various antiallergic agents are added and combined; no components leading to the sensitivity of skin are added; the stimulation to the skin is avoided; moisturizing ingredients can quickly infiltrate into the skin; besides, the skin and the damaged skin are subjected to water replenishing and restoring; energy and water required by the skin are supplemented; the moisturizing capability is strong; the mild moisturizing facial mask is mild and stimulation-free.

Description

technical field [0001] The invention belongs to the field of daily chemicals, and in particular relates to a mild and moisturizing facial mask. Background technique [0002] In recent years, there are more and more varieties of cosmetics, and the number of consumers is gradually increasing, and the disputes caused by cosmetics are also on the rise, especially the incidents of consumer victimization caused by the safety of cosmetics that do not meet the requirements are not uncommon. This not only harms the interests of consumers, but also brings a lot of losses to cosmetics manufacturers. Therefore, improving the safety of cosmetics is not only the demand of consumers, but also a problem that development companies should pay attention to. [0003] Now, the most common safety problem of cosmetics is skin irritation and allergy. There are many manifestations of skin sensitivity. Some people have allergic reactions to specific skin care products, while others have thin skin th...

Claims

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Application Information

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IPC IPC(8): A61K8/97A61K8/63A61K8/92A61Q19/00A61P37/08
Inventor 康文术徐宁
Owner HUNAN YUJIA COSMETICS MFG CO LTD
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