Batching method for gas state materials
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
- Publication Date
- 2015-05-06
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to a batching method, in particular to a batching method of gaseous materials. Background technique
[0002] on WF 6 During the production process, there will be a certain amount of light impurities, such as HF, N 2 , O 2 etc., produced or leaked into the product, so the output WF 6 The material is purified.
[0003] In the separation of the above WF 6 In the process of experimental research with light impurities, it is necessary to simulate the raw materials in the production device, and the results of the quantitative ratio will directly affect the objectivity and accuracy of the test results. But simply put WF 6 , HF, N 2 , O 2 When standing in a closed container, the above-mentioned gases will be distributed in layers instead of uniformly mixed, resulting in uneven composition and content of the materials flowing out of the container. Therefore, the above-mentioned batching method cannot meet the existing needs. Cont...