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Batching method of gaseous materials

A technology of gaseous materials and materials, applied in the field of batching of gaseous materials, can solve the problems of uneven material composition and content in the outflow container, improve control accuracy and control difficulty, and meet the effect of large material leakage rate

Inactive Publication Date: 2016-09-28
RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

But simply put WF 6 , HF, N 2 , O 2 When standing in a closed container, the above-mentioned gases will be distributed in layers instead of uniformly mixed, resulting in uneven composition and content of the materials flowing out of the container. Therefore, the above-mentioned batching method cannot meet the existing needs

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  • Batching method of gaseous materials
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Embodiment Construction

[0041] Below, the present invention is described in detail with reference to accompanying drawing and embodiment:

[0042] Such as figure 1 As shown, a batching system used in the batching method of gaseous materials, including WF 6 Feeding device 1, HF feeding device 2, N 2 The feeding device 3 is connected in parallel to the pipeline 6 and communicates with the batching tank 4 .

[0043] Such as figure 2 shown, the WF 6 Feed unit 1 includes WF 6 Feed container 5, WF 6 The first interface of the supply container 5 is provided with an F0 valve, WF 6 Feed container 5 with WF 6 The pipelines 6 between the surge tanks 7 are sequentially provided with valves F1-F3, WF 6 The pipeline 6 between the surge tank 7 and the batching tank 4 is provided with F4 valve, F5 valve, manual fine-tuning valve 8, WF 6Mass flow meter 12 and No. VII pressure gauge 27.

[0044] so image 3 As shown, the HF feeding device 2 described includes a HF feeding container 10, the first interface ...

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Abstract

The invention discloses a batching method for gas state materials. The batching method comprises the following seven steps: feeding WF6 gas to a separation unit, vacuumizing an HF material feeding device, adjusting the leak rate of HF gas, feeding the HF gas into the separation unit, vacuumizing an N2 material feeding device, adjusting the leak rate of the N2 gas, and feeding the N2 gas into the separation unit. According to the batching method disclosed by the invention, the materials can be quantitatively adjusted and supplied; the material flows fed to the separation unit and the content of the materials can be guaranteed to be invariable; the flows of the three materials in the testing process are highly different, and the flow of the WF6 can be controlled by a mass method, and the flows of the HF and the N2 are controlled by a volumetric method, so that the flow control precision can be improved, and the control difficulty can be reduced; as a valve W7 and a valve N4 are utilized, the batching method can meet the requirement on high leak rate of the material.

Description

technical field [0001] The invention belongs to a batching method, in particular to a batching method of gaseous materials. Background technique [0002] on WF 6 During the production process, there will be a certain amount of light impurities, such as HF, N 2 , O 2 etc., produced or leaked into the product, so the output WF 6 The material is purified. [0003] In the separation of the above WF 6 In the process of experimental research with light impurities, it is necessary to simulate the raw materials in the production device, and the results of the quantitative ratio will directly affect the objectivity and accuracy of the test results. But simply put WF 6 , HF, N 2 , O 2 When standing in a closed container, the above-mentioned gases will be distributed in layers instead of uniformly mixed, resulting in uneven composition and content of the materials flowing out of the container. Therefore, the above-mentioned batching method cannot meet the existing needs. Cont...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B9/08
CPCC01B9/08
Inventor 刘巍韩莉果周勃王永华
Owner RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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