Dosing system for gaseous materials

A batching system and gaseous material technology, applied in the direction of mixer accessories, gas and gas/steam mixing, dissolution, etc., can solve the problem of uneven material composition and content in the outflow container, improve control accuracy and control difficulty, and meet large materials The effect of leak rate

Inactive Publication Date: 2017-06-23
RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But simply put WF 6 , HF, N 2 , O 2 When standing in a closed container, the above-mentioned gases will be distributed in layers instead of uniformly mixed, resulting in uneven composition and content of the materials flowing out of the container. Therefore, the above-mentioned batching method cannot meet the existing needs

Method used

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  • Dosing system for gaseous materials
  • Dosing system for gaseous materials
  • Dosing system for gaseous materials

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Embodiment Construction

[0028] Below, the present invention is described in detail with reference to accompanying drawing and embodiment:

[0029] Such as figure 1 As shown, a batching system for gaseous materials, including WF 6 Feeding device 1, HF feeding device 2, N 2 The feeding device 3 is connected in parallel to the pipeline 6 and communicates with the batching tank 4 .

[0030] Such as figure 2 shown, the WF 6 Feed unit 1 includes WF 6 Feed container 5, WF 6 The first interface of the supply container 5 is provided with an F0 valve, WF 6 Feed container 5 with WF 6 The pipelines 6 between the surge tanks 7 are sequentially provided with F1-F3 valves, WF 6 The pipeline 6 between the surge tank 7 and the batching tank 4 is provided with F4 valve, F5 valve, manual fine-tuning valve 8, WF 6 Mass flow meter 9 and No. VII pressure gauge 27.

[0031] so image 3 As shown, the HF feeding device 2 described includes a HF feeding container 10, the first interface of the HF feeding container...

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PUM

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Abstract

The invention discloses a batching system for gaseous materials, which comprises a WF6 feeding device, an HF feeding device, and a N2 feeding device connected to a batching tank. WF6 pressure stabilizing tank, WF6 mass flowmeter, batching tank, the HF feeding device includes HF feeding container, HF stabilizing tank, HF mass flowmeter, standard volume tank and batching tank connected in sequence through pipelines and valves , N2 feeding device includes N2 feeding container, N2 surge tank, N2 mass flow meter, standard volume tank, batching tank connected in sequence through pipelines and valves. The invention realizes the quantitative adjustment and supply of each material and ensures The material flow of batching tank and respective content are stable, respectively adopt mass method to control the flow of WF6 and volumetric method to control the flow of HF, N2, control precision and control difficulty, the use of valve W7 and valve N4, make the present invention It can meet the requirements of large material leakage rate.

Description

technical field [0001] The invention belongs to a batching device, in particular to a batching system for gaseous materials. Background technique [0002] on WF 6 During the production process, there will be a certain amount of light impurities, such as HF, N 2 , O 2 etc., produced or leaked into the product, so the output WF 6 The material is purified. [0003] In the separation of the above WF 6 In the process of experimental research with light impurities, it is necessary to simulate the raw materials in the production device, and the results of the quantitative ratio will directly affect the objectivity and accuracy of the test results. But simply put WF 6 , HF, N 2 , O 2 When standing in a closed container, the above-mentioned gases will be distributed in layers instead of uniformly mixed, resulting in uneven composition and content of the materials flowing out of the container. Therefore, the above-mentioned batching method cannot meet the existing needs. Con...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01F15/04B01F3/02B01F23/10
Inventor 刘巍韩莉果周勃赫梓宇
Owner RES INST OF PHYSICAL & CHEM ENG OF NUCLEAR IND
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