A thermally controlled skin whose equivalent emissivity can be adjusted by voltage and its application in spacecraft

A technology of equivalent emissivity and voltage adjustment, which is applied in the direction of instruments, buildings, and building components, can solve the problems that the thermal control devices cannot be guaranteed in space, the material selection range is small, and they cannot withstand erosion. Spatial stability, large degree of freedom, and high spatial stability

Active Publication Date: 2021-06-11
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Although the electrochromic thermal control has a wide range of emissivity adjustment, electrochromic materials must be used, and the selection range of materials is small
Moreover, many electrochromic materials have poor chemical stability and cannot withstand the erosion caused by high vacuum, ultraviolet radiation, atomic oxygen, etc., and the dimensional stability of thermal control devices cannot be guaranteed.

Method used

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  • A thermally controlled skin whose equivalent emissivity can be adjusted by voltage and its application in spacecraft
  • A thermally controlled skin whose equivalent emissivity can be adjusted by voltage and its application in spacecraft
  • A thermally controlled skin whose equivalent emissivity can be adjusted by voltage and its application in spacecraft

Examples

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Embodiment 1

[0061] A thermal control skin, comprising base 1, inner layer 2, outer layer 3 and optical solar reflector 4 from bottom to top, with spacer 5 between inner layer 2 and outer layer 3, said spacer 5 makes inner layer 2 A vacuum gap 6 is formed between the outer layer 3 and the outer layer 3, and the inner layer 2 is a metal-insulator-semiconductor structure.

[0062] Specifically, the material of substrate 1 is SiO 2 ; The inner layer 2 is a metal-insulator-semiconductor structure, the metal layer in the structure is an Ag film with a thickness of 1 μm, the insulator layer is a SiC film with a thickness of 1 μm, and its breakdown voltage is 300V, and the semiconductor layer is an ITO film with a thickness of 10nm, and the semiconductor layer in the structure is adjacent to the vacuum gap 6, and a forward DC adjustable voltage is applied between the semiconductor layer and the metal layer; the outer layer 3 is a 10μm thick Al film substrate + a 10nm thick ITO film, coated on an ...

Embodiment 2

[0065] A thermal control skin, comprising base 1, inner layer 2, outer layer 3 and optical solar reflector 4 from bottom to top, with spacer 5 between inner layer 2 and outer layer 3, said spacer 5 makes inner layer 2 A vacuum gap 6 is formed between the outer layer 3 and the outer layer 3, and the inner layer 2 is a metal-insulator-semiconductor structure.

[0066] Specifically, the material of substrate 1 is SiO 2 ; The inner layer 2 is a metal-insulator-semiconductor structure, the metal layer in the structure is an Ag film with a thickness of 1 μm, the insulator layer is a SiC film with a thickness of 1 μm, and its breakdown voltage is 300V, and the semiconductor layer is an ITO film with a thickness of 10nm, and the semiconductor layer in the structure is adjacent to the vacuum gap 6, and a forward DC adjustable voltage is applied between the semiconductor layer and the metal layer; the outer layer 3 is a 10μm thick Al film substrate + a 10nm thick p-type doped silicon fi...

Embodiment 3

[0069] A thermal control skin, comprising base 1, inner layer 2, outer layer 3 and optical solar reflector 4 from bottom to top, with spacer 5 between inner layer 2 and outer layer 3, said spacer 5 makes inner layer 2 A vacuum gap 6 with a pitch of micronano scale is formed between the outer layer 3 and the outer layer 3 is a metal-insulator-semiconductor structure.

[0070] Specifically, the material of substrate 1 is SiO 2 The inner layer 2 is a 10 μm thick Al substrate+10nm thick ITO film; the outer layer 3 is a metal-insulator-semiconductor structure, and the metal layer in the structure is an Ag film with a thickness of 1 μm, which is coated on the inner surface of the optical solar mirror 5, and the insulator The layer is a SiC film with a thickness of 1 μm, its breakdown voltage is 300V, the semiconductor layer is an ITO film with a thickness of 10nm, and the semiconductor layer in the structure is adjacent to the vacuum gap 6, and a positive direct current can be added...

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Abstract

The invention relates to a thermal control skin capable of adjusting equivalent emissivity through voltage and its application in spacecraft. The thermal control skin includes a base, an inner layer, an outer layer and a protective layer from bottom to top, and there is a spacer between the inner layer and the outer layer, and the spacer forms a distance between the inner layer and the outer layer that is micronano A vacuum gap of the order of magnitude; the inner layer and / or the outer layer contain a metal-insulator-semiconductor structure, and a DC adjustable voltage is applied between the semiconductor and the metal in the structure; the protective layer has high infrared emission rate or both high infrared emissivity and low solar spectral absorptivity. On the one hand, this thermal control skin has good adaptability to the space environment, which solves the problem of performance degradation of electrochromic materials caused by direct exposure to the space environment. On the other hand, it can provide a large range of emissivity adjustment, which can be applied in in the spacecraft.

Description

technical field [0001] The invention relates to the technical field of thermal control devices, in particular to a thermal control skin whose equivalent emissivity can be adjusted by voltage and its application in spacecraft. Background technique [0002] The spacecraft thermal control technology uses various surface materials and temperature control devices to keep the spacecraft and internal components in the desired temperature environment, which is of great significance to ensure the normal operation of the spacecraft’s internal components. In many thermal control technologies such as electrochromism, thermal phase change, MEMS shutters, etc., electrochromic thermal control uses the principle of electrochromism to change the light and thermal characteristics of materials through external voltage, thereby adjusting the reflectivity of thermal control devices Or emissivity, which has the advantages of real-time active adjustment, large emissivity adjustment range, and low ...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G02F1/153G02F1/161
CPCE06B3/6722G02B27/56G02B26/02G02F1/015
Inventor赵军明徐德宇裘俊
OwnerHARBIN INST OF TECH