Data generating system, patterning data generating apparatus, method of generating patterning data and storage medium carrying patterning data
A technology of drawing data and data generation, which is applied in the direction of electrical digital data processing, special data processing applications, and original parts for optical mechanical processing, etc., and can solve problems such as difficulty in realizing design change automation and increasing design time
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[0043]FIG. 1 is a block diagram showing a data generating system 1 for generating cartographic data according to a first preferred embodiment of the present invention. Drawing data are used to form geometric patterns on any of printed circuit boards, semiconductor substrates, flat-panel displays such as plasma displays or liquid crystal displays, photomask glass substrates (hereinafter referred to as "substrates") when manufacturing these substrates. pattern.
[0044] The data generating system 1 has a structure in which a basic pattern generating device 21 and a server 22 are provided in and managed by a design department 2 for designing a pattern; a drawing data generating device 31 is provided in a part of a manufacturing department and used for drawing These constituent units are all connected to the communication network 9 in and managed by the drawing department 3 of the company. Although the basic pattern generating device 21 and the drawing data generating device 31 a...
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PROBLEM TO BE SOLVED: To improve design efficiency of a pattern by individually defining a basic pattern and a correction rule on pattern formation, in pattern forming data to be used on forming a geometric pattern on a substrate. Ž
SOLUTION: A data generating apparatus converts a description format of basic pattern CAD data into XML to generate pattern formation data 91, adds a rule addition index 912 representing pattern formation conditions and an object pattern element to the pattern formation data 91, and further adds a correction rule as a correction rule part 913 acquired from a database, based on the rule addition index 912. Since the pattern formation data 91 include a basic pattern part 911 and the correction rule part 913, the basic pattern and the correction rule on pattern formation are defined individually, which easily improves design efficiency of a pattern. Ž
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