A 3D nonvolatile memory device uses laminated electrodes with specific recesses to form vertical wirings on selected side walls.
A dielectric substrate with impingement openings directs pressurized fluid streams to cool electronic devices directly.
Dual heat dissipation layers conduct thermal energy from the semiconductor element back surface and substrate interface to improve device cooling.
Embedding dies in substrate recesses reduces parasitic inductance and package footprint while wire-in-film adhesive manages thermal loads.
Titanium and copper seed layers block copper diffusion in stacked vias, reducing stress concentrations and void formation during thermal cycles.
Gradient thermal via density concentrates conduction pathways in high-heat zones, suppressing temperature rises and preventing component failure.
A staggered bonding pad layout optimizes mutual inductance and loop inductance within semiconductor packages.
A surface alignment notch resolves warpage burial issues to ensure accurate solder ball positioning.
Removing the substrate after forming the passive circuit eliminates expensive materials and reduces manufacturing costs.
Conformal shielding layers contact tapered vias in saw streets to isolate stacked semiconductor die, reducing package size and manufacturing costs.
A second connecting body extends vertically from stacked electronic elements to abut a substrate, creating a direct thermal path.
A high resistivity cap on the bottom electrode concentrates heating near the GST interface to improve switching efficiency.
Separately formed redistribution layers wrap dies to increase vertical connections without costly through-silicon vias.
Stress compensation layers counteract tensile forces to prevent wafer warpage and bonding cracks during semiconductor fabrication.
Reversible jigs with recesses position components during assembly, reducing module volume while preventing positional shifts and thickness variations.
A GaN-Si cascode transistor uses gate capacitance to manage switching timing and prevent overvoltage.
Local silicon capping on faceted epitaxial fins minimizes interface defects while reducing source/drain contact resistance.
A dual-coating system deposits a water-based soft touch layer followed by a solvent-based superhydrophobic top coat on microstructured substrates.
A semiconductor package structure positions an inductor within a molding layer covering the die sidewall to enable flexible redistribution layer placement.
A piezoelectric pattern enables direct bonding of through-silicon-vias and pads using physical pressure without heat.
A direct bonding method aligns recessed metal pads within dielectric materials without pressure.
Power semiconductor module terminals feature dual lateral protrusions for flexible length adjustment via printed circuit board locking.
A curable polysilsesquioxane die bonding material with a refractive index of 1.41 to 1.43 and a thixotropic index of 2 or more.
Laterally offset conductive vias distribute mechanical stress during bonding, preventing crack propagation in miniaturized redistribution layers.
Stacking a memory chip inside a system chip opening increases the heat sink overlap area, reducing thermal damage to adjacent components.
A flat solder bump structure uses a non-metallic core to prevent cracking and bridging while maintaining consistent stand-off height.
A chip carrier with a thinned contacting region reduces mechanical stress during assembly, preventing bending and cracks in the mounted chip.
Selective deposition forms thickened word lines in terrace regions, preventing etch-through during contact via cavity formation.
An integrated electrode plate merges electrical connection and thermal paths in a power semiconductor module.
Thick and thin metal layers reduce junction temperature while shielding electromagnetic interference.
Replacing high-resistivity silicon handles with a thermally conductive polymer eliminates RF nonlinearities and simplifies manufacturing.
Laser-formed hole regions lower substrate strength, enabling precise thickness control while preventing tool wear and surface damage during grinding.
Insulating protrusions on the mounting land form gaps that allow vaporized flux to escape, preventing solder void formation in large-area joints.
Grooves in the outermost interlayer insulating layer segment the structure to reduce mechanical stress during semiconductor package manufacturing.
Extending lead portions perpendicularly increases withstand voltage without expanding the device footprint or altering circuit board designs.
Concentric upper wiring segments the conductive path to distribute thermal stress, preventing lift-off in through silicon via structures.
Segmented clip pillars with attached solder balls control reflow shape, preventing random solder bleed and shorting between adjacent components.
Integrating a precharge transistor with an anti-fuse reduces chip area and power consumption by eliminating high-voltage peripherals.
Integrating patterned structures into the cutting region reduces compressive stress and threading dislocations, enhancing epitaxial layer quality.
Segmenting the encapsulant with grooves before final cutting minimizes thermal expansion warpage during semiconductor package fabrication.
Laser ablation removes mask portions to define high-resolution patterns, avoiding thick-film resolution limits.
A buffer layer fills the gap between an embedded die and a core substrate, eliminating dimples that hinder lamination operations.
Localized isolations between segmented transistors reduce parasitic junctions and latch-up effects, enabling compact integration of logic and memory circuits.
Segmented guard rings eliminate lateral electric fields to prevent breakdown in contaminated dielectric layers.
A copper diffusion barrier fills voids within metal interconnect structures to enhance electromigration reliability.
A metal etch stop layer protects redistribution wiring integrity while removing the carrier substrate for thinner semiconductor packages.
A semiconductor die package utilizes a coplanar clip structure to enhance thermal management and electrical connectivity.
Vertical via stacks couple metal traces into a continuous seal ring boundary, mitigating film delamination and cracking under thermal stress.
Encircling passive units with a first glue structure defines an area for a second covering glue layer.