Shorting external and internal voltages during power-up equalizes rise slopes, suppressing in-rush current and protecting peripheral circuits.
Vertically stacked DRAM cells place capacitors horizontally offset from transistors to raise integration density while managing layout complexity.
A third insulating layer with full-height vias improves phase change memory connectivity while reducing parasitic capacitance in chip integration.
A horizontally offset transistor-capacitor layout reduces multi-layer alignment burden while supporting denser, better-performing memory arrays.
Trench-separated substrate regions and stacked vias integrate phase change memory cells with lower parasitic capacitance and smaller footprints.