The application relates to the technical field of
semiconductor manufacturing, and particularly discloses a heating disc reference position adjusting method and adjusting device, which are used for aligning and adjusting the spatial position of a heating disc in an internal chamber of a
film coating equipment. The adjusting method comprises the following steps: installing a level
detector on the heating disc; adjusting the levelness of the heating disc under a vacuum environment, and confirming that the heating disc is in a horizontal posture through the level
detector; adjusting the levelness of the heating disc under normal pressure, and confirming that the heating disc is in a horizontal posture through the level
detector; aligning the heating disc under normal pressure, aligning the center of the heating disc with the center of the internal chamber of the
film coating equipment, and determining the reference position of the heating disc. The combination of the level detector and the tool structure can realize horizontal adjustment and centering adjustment, and can greatly reduce the production cost of the
wafer film coating equipment.