Transparent diffusive OLED substrate and method for producing such a substrate
A diffusive, substrate technology that can be used in instruments, optical components, coatings, etc., to solve problems such as worker safety, complex processes, and difficulty in optimizing roughness profile parameters.
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[0069] 20 g of organomodified silica beads having an average diameter of 2.5 μm were dispersed in 150 g of 2-methoxy-propanol and dispersed by ultrasound. To this dispersion add 30g of Xenios ? Surface Perfection (Evonik GmbH). The resulting dispersion was then applied to a clean glass substrate by dip coating and dried at 120° C. for about 1 minute. The dried, coated substrate was then heated at a rate of 5°C / minute to a temperature of 500°C and fired at this temperature for 5 minutes.
[0070] figure 1 and figure 2 SEM micrographs of the rough low index layer after firing and before planarization with high index frit are shown. The spherical particles can be seen laying down in a very tightly packed monolayer on the glass substrate.
[0071] The resulting low refractive index rough layer was then coated by screen printing using a paste of high refractive index frit (n=1.90). The coating was dried at 150°C and fired in an IR oven at 545°C for 10 minutes.
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