Thin film transistor, array substrate, production method of thin film transistor and display device

Abstract

The invention discloses a thin film transistor, an array substrate, a production method of the thin film transistor and a display device. By a one-time patterning process, patterns of an active layer, source and drain electrodes and an etching stopping layer are formed, and the etching stopping layer covers the active layer and is positioned between the source and drain electrodes, i.e. by the one-time patterning process, patterning of three patterns of the active layer, the source and drain electrodes and the etching stopping layer is simultaneously completed. Patterning times in the production process of the thin film transistor are reduced, the production process is simplified, and production cost is saved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a thin film transistor, an array substrate, a manufacturing method thereof and a display device. Background technique [0002] The 21st century is the era of flat panel display in the field of display. Display devices such as liquid crystal display panels (LCD, Liquid Crystal Display), electroluminescence (EL, electroluminescence) display panels, and electronic paper are well known. These display devices have a thin film transistor (TFT, Thin Film Transistor) that controls the switching of each pixel, and the TFT can be divided into a top-gate TFT and a bottom-gate TFT according to different structures. [0003] Taking the bottom-gate TFT as an example, the manufacturing process is as follows: first, the pattern of the gate is formed on the substrate through a patterning process, and the gate insulating layer is formed on the pattern of the gate; The patterning process forms t...

AI Technical Summary

Problems solved by technology

[0004] In view of this, an embodiment of the present invention provides a thin film transistor, an array substrate, a manufacturing method thereof, and a display device, so as to solve the existing problems of using masks frequently and low production efficiency when manufacturing thin film transistors.

Images