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Secondary optical lens design method based on quantum measurement and uneven irradiation

A secondary optical lens and design method technology, applied in the field of non-imaging optics, can solve the problems of multi-color mixed light of plant lighting lamps, unsuitable for animal radiance and luminosity, etc., and achieve the effect of being conducive to growth and widely used

Active Publication Date: 2017-05-10
INST OF ENGINEERING THERMOPHYSICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] Based on the problems existing in the above-mentioned prior art, the present invention proposes a design method of a secondary optical lens based on quantum measurement. The problem of being suitable for animals and solving the problem that the two measurement units of secondary optical design, radiance and luminosity, cannot meet the needs of secondary optical design of multi-color mixed light for plant lighting lamps, etc.

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  • Secondary optical lens design method based on quantum measurement and uneven irradiation
  • Secondary optical lens design method based on quantum measurement and uneven irradiation
  • Secondary optical lens design method based on quantum measurement and uneven irradiation

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Embodiment Construction

[0027] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0028] According to an embodiment of the present invention, a quantum metric-based design method for a secondary optical lens satisfies the law of photon number and / or photon flux conservation, marginal ray theorem, beam elongation conservation theory, and geometrical optics principles. The quantum metrics include photon number, photon flux, photon illuminance, photon intensity, photon brightness and photon emission.

[0029] The photon number conservation law is to consider that from the light source to the illuminated surface, the difference in the route traveled by each ray is negligible compared with the length of the route traveled, so it is assumed that the number of photons lost by each ray or the difference in the ...

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Abstract

The invention discloses a secondary optical lens design method based on quantum measurement. The uneven photon irradiance requirement is met. The method comprises steps as follows: a light source and an irradiated surface are divided into grids, the correspondence between the light source and the irradiated surface is found out, a free-form surface normal vector is calculated, a free-form surface is constructed in the normal vector direction and is filled to form a lens, the lens is substituted into optical simulation software for simulation calculation, if the unevenness of the photon irradiance of the irradiated surface cannot meet the requirement, the steps are repeated, and grid parameters are modified until the uneven photon irradiance of the irradiated surface meets the requirement.

Description

technical field [0001] The invention relates to non-imaging optics, in particular to a design method of a secondary optical lens based on quantum measurement inhomogeneity. Background technique [0002] With the rapid development of plant physiology, zoology, optical technology, LED technology and the continuous increase of China's facility agriculture, especially the number of greenhouses and greenhouses and large-scale breeding plants, more and more high-power LEDs are applied to animal and plant lighting. In the case of plant supplementary light, secondary optical design is required for ordinary plant lighting LED lamps to obtain a suitable lens to meet the requirements of optical inhomogeneity (because according to the supplementary light situation, considering the sunlight, the sun Where the light is weak, the light that needs to be provided by the LED will be strong, otherwise the light provided will be weak, which requires a non-uniform design of photon illuminance). ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F21K9/69F21V5/04
CPCF21V5/04
Inventor 魏伟胡学功
Owner INST OF ENGINEERING THERMOPHYSICS - CHINESE ACAD OF SCI
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