The invention discloses a uniform
irradiation secondary optical reflector design method based on
quantum measure. The method comprises the steps of dividing a
light source and an irradiated plane into grids, finding a correspondence between the
light source and the irradiated plane, computing a freeform surface, filling the freeform surface to form a reflector, taking optimal
simulation software to perform simulated computation, and if uniformity of
photon irradiance of the irradiated plane cannot meet the requirement, repeating the above steps, and modifying grid parameters, until the
photon irradiance of the irradiated plane meets the requirement. Compared with the secondary optical design based on
radiation measure and optical measure, the method provided by the invention is more accurate in the field of optical design of
plant illumination lights, so that more uniform
photon irradiance on a using surface of the
plant illumination light is achieved instead of more uniform
illuminance and optical radiancy on the using surface of the same, and the method can meet the
plant need for light better, and is more beneficial to growth of the plant, wide in application range, and applicable to the fields of
greenhouse supplementary lights or plant factories.