Uniform irradiation secondary optical reflector design method based on quantum measure

A secondary optics and design method technology, applied in the field of non-imaging optics, can solve the problem that the irradiance and luminosity cannot meet the multi-color mixed light of plant lighting lamps, and achieve the benefits of growth, uniform illuminance and light radiance, and uniform photon illuminance Effect

Inactive Publication Date: 2017-05-31
INST OF ENGINEERING THERMOPHYSICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] Based on the problems existing in the above-mentioned prior art, the present invention proposes a design method of a secondary optical reflector based on quantum measurement, which is used to solve the problem that th

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  • Uniform irradiation secondary optical reflector design method based on quantum measure
  • Uniform irradiation secondary optical reflector design method based on quantum measure
  • Uniform irradiation secondary optical reflector design method based on quantum measure

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[0028] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0029] According to an embodiment of the present invention, a design method of a secondary optical mirror based on quantum metrics satisfies the law of photon number and / or photon flux conservation, marginal ray theorem, beam elongation conservation theorem, and geometrical optics principles. The quantum metrics include photon number, photon flux, photon illuminance, photon intensity, photon brightness and photon emission.

[0030] The photon number conservation law is to consider that from the light source to the illuminated surface, the difference in the route traveled by each ray is negligible compared with the length of the route traveled, so it is assumed that the number of photons lost by each ray or the difference i...

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Abstract

The invention discloses a uniform irradiation secondary optical reflector design method based on quantum measure. The method comprises the steps of dividing a light source and an irradiated plane into grids, finding a correspondence between the light source and the irradiated plane, computing a freeform surface, filling the freeform surface to form a reflector, taking optimal simulation software to perform simulated computation, and if uniformity of photon irradiance of the irradiated plane cannot meet the requirement, repeating the above steps, and modifying grid parameters, until the photon irradiance of the irradiated plane meets the requirement. Compared with the secondary optical design based on radiation measure and optical measure, the method provided by the invention is more accurate in the field of optical design of plant illumination lights, so that more uniform photon irradiance on a using surface of the plant illumination light is achieved instead of more uniform illuminance and optical radiancy on the using surface of the same, and the method can meet the plant need for light better, and is more beneficial to growth of the plant, wide in application range, and applicable to the fields of greenhouse supplementary lights or plant factories.

Description

technical field [0001] The invention relates to non-imaging optics, in particular to a design method of a secondary optical reflector based on quantum measurement uniform illumination. Background technique [0002] With the rapid development of plant physiology, optical technology, and LED technology, as well as the increasing number of China's facility agriculture, especially greenhouses and greenhouses, more and more high-power LEDs are applied to plant lighting. Since plants have relatively high requirements on light uniformity, it is necessary to carry out secondary optical design on ordinary plant lighting LED lamps to obtain suitable reflectors to meet the requirements of optical uniformity. However, all the secondary optical designs currently on the market use the radiance unit system and the photometric unit system, such as the law of energy conservation. This method does not use the secondary optical design of the quantum measurement system for plant illumination. ...

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Application Information

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IPC IPC(8): F21K9/68F21V7/00F21Y115/10
Inventor 魏伟胡学功
Owner INST OF ENGINEERING THERMOPHYSICS - CHINESE ACAD OF SCI
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