High-strength antireflection film system structure

An anti-reflection film, high-strength technology, applied in the direction of optics, instruments, layered products, etc., can solve the problems of not being durable, not resistant to abrasion, and not strong enough to form a film, and achieve the effect of long-term use

Inactive Publication Date: 2013-06-26
凤凰光学(上海)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] (1) The AR film is not resistant to high temperature, high humidity, or abrasion, and the usual high-temperature coating cannot meet the harsh requirements during use;
[0008] (2) In the case of general vacuum plating, the film formation of AR film is not strong enough and cannot be used for a long time, especially in some extremely harsh environmental conditions.
[0009] The above two defects bring difficulties to the design and manufacturing process of optical lenses

Method used

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Examples

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Effect test

Embodiment 1

[0031] See figure 1 As shown, a high-strength anti-reflection film structure according to the present invention includes a base material S-FPL51 and an AR film plated on the base material. Among them, the AR film is an anti-reflection film, which includes a nine-layer film structure from inside to outside: the first low refractive index film (L1), the middle refractive index film (M), the second low refractive index film (L2), the first High-refractive-index film (H1), third low-refractive-index film (L3), second high-refractive-index film (H2), fourth low-refractive-index film (L4), third high-refractive-index film (H3), fifth Low refractive index film (L5).

[0032] Among them, the film material of the first low refractive index film (L1) and the medium refractive index film (M) is MgF 2 and AL 2 o 3 . The film material of the first high refractive index film (H1) is SV 7 (H 4 ). The substrate is S-FPL51 by SIO 2 , GaCO 3 、Na 2 CO 3 And inorganic compounds such a...

Embodiment 2

[0034] A high-strength anti-reflection film system structure described in the present invention comprises a base material S-BSM81 and an AR film plated on the base material. Among them, the AR film is an anti-reflection film, which includes a nine-layer film structure from inside to outside: the first low refractive index film (L1), the middle refractive index film (M), the second low refractive index film (L2), the first High-refractive-index film (H1), third low-refractive-index film (L3), second high-refractive-index film (H2), fourth low-refractive-index film (L4), third high-refractive-index film (H3), fifth Low refractive index film (L5).

[0035] Among them, the film material of the first low refractive index film (L1) and the medium refractive index film (M) is MgF 2 and AL 2 o 3 . The film material of the first high refractive index film (H1) is SV 7 (H 4 ). The base material is S-FSL5 by SIO 2 , GaCO 3 、Na 2 CO 3 And inorganic compounds such as rare earth ...

Embodiment 3

[0037]A high-strength anti-reflection film system structure described in the present invention comprises a base material LAK10 and an AR film plated on the base material. Among them, the AR film is an anti-reflection film, which includes a nine-layer film structure from the inside to the outside: the first low refractive index film (L1), the middle refractive index film (M), the second low refractive index film (L2), the first High-refractive-index film (H1), third low-refractive-index film (L3), second high-refractive-index film (H2), fourth low-refractive-index film (L4), third high-refractive-index film (H3), fifth Low refractive index film (L5).

[0038] Among them, the film material of the first low refractive index film (L1) and the medium refractive index film (M) is MgF 2 and AL 2 o 3 . The film material of the first high refractive index film (H1) is SV 7 (H 4 ). The base material is LAK10, by SIO 2 , GaCO 3 、Na 2 CO 3 And inorganic compounds such as rare e...

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Abstract

The invention provides a high-strength antireflection film system structure which comprises a base material S-FPL51 and an antireflection (AR) film. The AR film comprises nine film structure layers from inside to outside, namely a first low-refractive-index film (L1), a middle-refractive-index film (M), a second low-refractive-index film (L2), a first high-refractive-index film (H3), a third low-refractive-index film (L3), a second high-refractive-index film (H2), a fourth low-refractive-index film (L4), a third high-refractive-index film (H3) and a fifth low-refractive-index film (L5). The high-strength antireflection film system structure is high-temperature-resisting and can be used for a long time, survival possibility is provided for stable performance of an optical instrument under the extreme environment requirements, and convenience is provided for design and manufacture of optical lenses.

Description

field of invention [0001] The invention relates to a special soft material film system structure, in particular to a high-strength anti-reflection film system structure. Background technique [0002] In the application of SLR optical imaging and the use of other projection display devices, in consideration of factors such as cost and imaging clarity, manufacturers will use a large number of special materials to make spherical lenses of various sizes and radians. Usually, the above-mentioned material mixture contains different rare earth metal formulations, and the materials in the lens need to be resistant to high temperature, high humidity, and oxidation. This material has good optical properties - characterized by high dispersion, low refractive index, etc. [0003] S-FPL51 is a material commonly used in optical design (it has a lower refractive index nd=1.49700, and a higher dispersion vd=81.6), the abrasion of this material (abrasion is usually used to indicate the hard...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11B32B33/00B32B9/04G02B1/115
Inventor 叶祥云汤士博
Owner 凤凰光学(上海)有限公司
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