Method for etching metal workpiece and method for manufacturing display panel
A metal workpiece and metal etching technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, semiconductor devices, etc., and can solve problems such as short circuits, voids, and large slope angles.
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[0032] The technical solutions of the present invention will be further described below according to specific embodiments. The protection scope of the present invention is not limited to the following examples, which are listed for illustrative purposes only and do not limit the present invention in any way.
[0033] It should be understood that the drawings disclosed herein are not necessarily drawn according to the scale of actual devices and components. The shapes and thicknesses of the embodiments may be exaggerated in the drawings in order to clearly show the features of the embodiments of the present invention. In addition, the structures and devices in the drawings are shown schematically in order to clearly show the features of the embodiments of the present invention.
[0034] figure 1 It is a schematic diagram of the working state of etching a metal workpiece when no electric field is applied, such as figure 1 As shown, the metal wire 12 is laid on the substrate 1...
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