Multi-pass scanning device for laser-induced graphene

A laser scanning device and laser-induced technology, which are applied in graphene, cleaning method using gas flow, chemical/physical/physical-chemical process of applying energy, etc., can solve the problem that the preparation device does not have the function of dust removal and cannot meet production needs , reduce the scanning accuracy and other problems, to achieve the effect of preventing wrinkling, reducing heat input and ensuring conversion rate

Pending Publication Date: 2022-04-12
喆烯新材(北京)科技有限公司
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Problems solved by technology

[0004] At the same time, the existing preparation equipment cannot level the material during the transmission process, and during the transmission process, the material will absorb a certain amount of dust. The existing preparation device does not have the function of dust removal, which makes it unable to meet the actual use requirements. Production requirements, but also reduce the accuracy of scanning, in view of this, in-depth research on the above issues, then this case arises

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  • Multi-pass scanning device for laser-induced graphene
  • Multi-pass scanning device for laser-induced graphene
  • Multi-pass scanning device for laser-induced graphene

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Embodiment Construction

[0031] The present invention is specifically described below in conjunction with accompanying drawing, as Figure 1-6 Shown, a multi-pass scanning device for laser-induced graphene.

[0032] Such as figure 1 As shown, in one embodiment of the present invention, a laser-induced graphene multi-pass scanning device is disclosed. The device includes a foil conveying device 1, a laser scanning device 2 and a controller not shown in the figure; the foil conveying device 1 includes an unwinder 1-1, a winder 1-2, a guide roller 1-3 and a tension feedback sensor . A linear velocity feedback sensor; the laser scanning device 2 includes a laser beam 2-1 emitted by a laser, and a scanning focusing head 2-2. Under the action of the conveying device 1, the feedback sensor and the controller, the carbon source-coated foil 3 keeps constant tension and moves at a constant speed. The laser emits a modulated pulsed laser beam 2-1, which is incident on the scanning focusing head 2-2. The cont...

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Abstract

The invention discloses a multi-pass scanning device for laser-induced graphene. The multi-pass scanning device comprises a foil conveying device and a laser scanning device, the foil conveying device comprises an unwinding machine, a guide roller, a winding machine, a feedback sensor and a controller; the laser scanning device comprises a laser and a scanning focusing head; a controller of the foil conveying device controls a winding and unwinding machine to pull the foil coated with the carbon source, the foil is leveled through a guide roller, and constant-speed and constant-tension operation is achieved through feedback of a sensor; laser is focused on the surface of the foil wound by the guide roller, rapid scanning is conducted in the direction perpendicular to the material movement direction, and porous graphene is gradually formed by the carbon source on the surface of the substrate material through multi-pass laser scanning. The multi-pass laser scanning can reduce the heat input of the laser, avoid the surface deformation of the substrate foil, and ensure the graphene conversion rate of the carbon source.

Description

technical field [0001] The invention relates to the technical field of graphene material preparation devices, in particular to a multi-pass scanning device for laser-induced graphene. Background technique [0002] Compared with graphene single crystals, graphene with a three-dimensional porous structure has unique physical and chemical properties, and has huge potential applications in the fields of biology, materials, energy, and information. Therefore, in recent years, the potential application and preparation technology of porous graphene in the fields of biology, materials, energy, and information have attracted extensive attention. Porous graphene can be fabricated in situ on the substrate surface by chemical vapor deposition and plasma-enhanced chemical vapor deposition. However, the high temperature conditions required by the process either limit the type of substrate or damage the mechanical properties of the substrate. The method of treating the functionalized gra...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): B01J19/12C01B32/184B08B5/04B08B13/00B01D46/00
Inventor周素超陈韵吉孙宝国杨玉娜陈彦鹏
Owner喆烯新材(北京)科技有限公司