Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method

a technology of exposure apparatus and manufacturing method, which is applied in the direction of photomechanical apparatus, photosensitive material processing, instruments, etc., can solve the problem of difficult substrate positioning control

Inactive Publication Date: 2021-01-28
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This solution improves the positioning accuracy and controllability of substrates during scanning exposure, reducing the risk of bending and weight-related issues, while also allowing for the use of downsized actuators and minimizing the influence of air fluctuations, leading to enhanced manufacturing efficiency and reduced costs.

Problems solved by technology

Here, the positioning control of the substrate has tended to be difficult because the substrate holder increases in size and thus in weight due to the increase in size of the substrate in recent years.

Method used

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  • Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method
  • Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method
  • Exposure apparatus, exposure method, manufacturing method of flat-panel display, and device manufacturing method

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first embodiment

[0041]A first embodiment will be described below, using FIGS. 1 to 9b.

[0042]FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 related to the first embodiment. Liquid crystal exposure apparatus 10 is a projection exposure apparatus of a step-and-scan method, which is a so-called scanner, with a rectangular (square) glass substrate P (hereinafter, simply referred to as a substrate P) used in, for example, a liquid crystal display device (a flat-panel display) or the like, serving as an object to be exposed.

[0043]Liquid crystal exposure apparatus 10 has: an illumination system 12; a mask stage 14 to hold a mask M on which patterns such as a circuit pattern are formed; a projection optical system 16; an apparatus main body 18; a substrate stage device 20 to hold substrate P whose surface (a surface facing the +Z side in FIG. 1) is coated with resist (sensitive agent); a control system thereof; and the like. Hereinafter, the explanation is given assu...

second embodiment

[0114]Next, a liquid crystal exposure apparatus related to a second embodiment will be described using FIGS. 14 to 20b. Since the configuration of the liquid crystal exposure apparatus related to the second embodiment is the same as that in the first embodiment described above, except that the configuration of a substrate stage device 420 is different. Therefore, hereinafter only the differences will be described, and elements that have the same configurations and functions as those in the first embodiment described above will be provided with the same reference signs as those in the first embodiment described above, and the description thereof will be omitted.

[0115]In substrate stage device 20 (see the drawings such as FIG. 1) of the first embodiment described above, substrate carrier 40 that holds substrate P is configured to be moved with a long stroke integrally with noncontact holder 32 in the scanning direction and to be moved with a long stroke separately from noncontact hold...

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Abstract

A substrate stage device of an exposure apparatus is equipped with: a noncontact holder that supports, in a noncontact manner, a first area and at least a partial area of a second area, of a substrate, the second area being arranged side by side with the first area in the Y-axis direction; a substrate carrier that holds the substrate held in a noncontact manner by the noncontact holder, at a position not overlapping the noncontact holder in the X-axis direction; Y linear actuators and Y voice coil motors that relatively move the substrate carrier with respect to the noncontact holder in the Y-axis direction; X voice coil motors that move the substrate carrier in the X-axis direction; and actuators that move the noncontact holder in the X-axis direction.

Description

[0001]This is a Divisional of application Ser. No. 15 / 763,475 filed Mar. 27, 2018, which in turn is a National Phase Application of PCT / JP2016 / 078851, filed Sep. 29, 2016, which claims the benefit of Japanese Patent Application No. 2015-192794 filed Sep. 30, 2015. The disclosure of each of the prior applications is hereby incorporated by reference herein in its entirety.TECHNICAL FIELD[0002]The present invention relates to exposure apparatuses, exposure methods, manufacturing methods of flat-panel displays and device manufacturing methods.BACKGROUND ART[0003]Conventionally, in a lithography process for manufacturing electronic devices (micro devices) such as liquid crystal display devices and semiconductor devices (integrated circuits and the like), used are exposure apparatuses such as an exposure apparatus of a step-and-scan method (a so-called scanning stepper (which is also called a scanner)) that, while synchronously moving a mask or a reticle (hereinafter, generically referred...

Claims

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Application Information

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Patent Type & AuthorityApplications(United States)
IPC IPC(8): G03F7/20H01L21/68
CPCG03F7/70358H01L21/682G03F7/70791G03F7/70758G03F7/0007H01L21/68G03F7/70525G03F7/70616G03F7/70716G03F7/70725G03F7/70825G03F7/20G03F7/70141G03F7/70775G03F9/7088H01L21/683G03F7/30
InventorAOKI, YASUO
OwnerNIKON CORP