Hot compression chip low-temperature interconnection method using indium and micro needle cone structures
A thermal compression technology using indium, applied to semiconductor devices, electrical components, circuits, etc., can solve the problems of difficult removal of flux residues, achieve low bonding residual stress, lower process temperature, and less defects such as interface micro-holes Effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2015-06-24
- Estimated Expiration
- Not applicable · inactive patent
Abstract
Description
technical field
[0001] The invention relates to the field of semiconductor chip packaging, in particular to a method for realizing solid-state interconnection and bonding between elements by thermally compressing a nickel needle cone layer with an indium layer on the surface and a second metal layer on the other side. Background technique
[0002] The micro-interconnection technology of semiconductor chip packaging is constantly innovating. The traditional fusion bonding technology is to control the temperature to make the metal at the bonding point melt and wet the two sides of the bonding point. After cooling, the bonding point solidifies, so as to obtain good welding. Such as reflow soldering. The reflow soldering process needs to increase the soldering temperature above the melting point of the second metal, and the high temperature environment will have a bad impact on some chips or substrates and reduce the reliability of the product. In order to achieve the desired b...
Examples
Embodiment Construction
[0034] Below in conjunction with specific embodiment the present invention is described in further detail:
[0035] The low-temperature interconnection method of thermally compressed chips using indium and microneedle cone structures disclosed by the present invention has the following steps:
[0036](1) Preparation of nickel microneedle cone layer: The metal block in the chip pad area was cleaned of surface contamination by chemical degreasing treatment for about 30-60 s, and then immersed in 20 wt.% sulfuric acid for about 10 s to improve surface activity. Electrodeposition is used to prepare nickel needle cones, and the electrolyte composition used is: NiCl 2 120 g / L, H 3 BO 3 40 g / L, crystal regulator 200 g / L. Electrodeposition conditions are: bath temperature 60°C, pH=4, current density 2.0 A / dm 2 , the deposition time is 12 min.
[0037] (2) Indium layer preparation: The chip that has completed the above step (1) is immediately prepared for the indium layer. The f...