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A photomask board and photomask

A technology for photomasks and light-shielding materials, applied in photosensitive materials for optomechanical equipment, optics, optomechanical equipment, etc., can solve problems such as photomasks without photosensitive compositions, and achieve storage stability Excellent, high sensitivity, high linear effect

Inactive Publication Date: 2010-05-26
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] So far, there has not been provided a photomask containing a photosensitive composition that satisfies high sensitivity, storage stability, resolution, and image edge linearity at the same time. The current situation is to seek a new technology that has not been found before.

Method used

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  • A photomask board and photomask
  • A photomask board and photomask
  • A photomask board and photomask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～3、 comparative example 1～2

[0374] 1. Fabrication of photomask

[0375] (Formation of photosensitive composition layer)

[0376] Coating liquid composition (P-1) for a photosensitive composition layer of the following composition was coated on a glass substrate (10 cm x 10 cm) so that the dry coating mass was 1.4 g / m 2 , and dried at 100° C. for 1 minute to form a photosensitive composition layer.

[0377]

[0378] ・Carbon black dispersion (dispersion with the following composition) 16.0 parts by mass

[0379] ・Ethylenically unsaturated compound (C-1) (compound of the following structure) 4.2 parts by mass

[0380] ・Binder polymer (D-1) (3.6 parts by mass of polymer binder of the following structure

[0381] (MW: 50000)

[0382] Optical brightener or comparative sensitizing pigment (compound and amount shown in Table 2) 0.21 parts by mass

[0383] 0.81 parts by mass of polymerization initiator (compound shown in Table 2)

[0384] ・Chain transfer agent (F-1) (compound of the following structure) 0...

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Abstract

The invention provides a photomask board and photomask, wherein the photomask board is provided with a photosensitive composition layer on a cardinal plate; the photosensitive composition layer comprises (A) at least one optical whitener as shown in the following (I-1) to (I-3) formula, (B) initiator of polymerization, (C) compound with ethylene unsaturated linkage, (D) adhesive polymer and (E) lightproof material. The compound shown in the following (I-1) to (I-3) formula can be replaced by alkyl, aromatic radical and alkoxyl group.

Description

technical field [0001] The invention relates to a photomask blanks and a photomask. In more detail, it relates to a photomask that can make a photomask and the photomask obtained therefrom. The photomask can be used for flat panel displays such as PDP, FED, LCD, shadow masks for CRT, printing, etc. Photolithography process in the field of circuit boards, semiconductors, etc. Background technique [0002] As photomasks that can be used in photolithography processes in the fields of flat panel displays, CRT shadow masks, printed circuit boards, and semiconductors, there are well-known Cr masks with a metal chromium layer (Cr layer), and silver halide masks. Em mask (emulsion mask) of the emulsion layer (for example, refer to "Photographic Chemical Etching Manufacturing Method" edited by the Society for Education and Liberal Arts, published by the Japanese Association of Photochemical Etching Manufacturing Method, pp. 67-80, June 1992 .). [0003] The chromium mask is formed...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/028C08F2/44C08F2/50G03F1/50G03F1/56G03F7/004G03F7/031G03F7/09G03F7/11
CPCC08F2/50G03F1/24G03F1/32G03F1/36G03F1/50G03F1/56G03F1/58
Inventor 松本洋介
Owner FUJIFILM CORP