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Priming processing method and priming processing device

A technology for starting filling and treatment methods, applied in the direction of pretreatment of surfaces, devices for coating liquids on surfaces, optics, etc.

Active Publication Date: 2010-12-08
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, in the conventional priming treatment device, each time the priming process is performed, as a post-processing, the priming roller is continuously rotated as described above, and the cleaning solution is sprayed on the entire outer peripheral surface (whole circumference) of the priming roller. , so there is this problem of using a lot of cleaning fluid (usually thinner)

Method used

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  • Priming processing method and priming processing device
  • Priming processing method and priming processing device
  • Priming processing method and priming processing device

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Embodiment Construction

[0051] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

[0052] Structure of start-up processing device

[0053] figure 1 This shows the structure of a start-up processing device according to an embodiment of the present invention. The start-up filling processing device is incorporated in a resist coating device (not shown) that performs non-rotating resist coating processing in the photoetching process for LCD manufacturing processing, for example, and is arranged to perform In the vicinity of a coating table (not shown) where the substrate to be processed is placed or suspended for the resist coating process.

[0054] In the priming processing device shown in the figure, the housing 10 is composed of a long frame having a slit-shaped opening 12 on the upper surface, and the priming roller 14 to be accommodated passes through the opening 12 at its top. The exposed form is horizontally and rotatably supported by bearing...

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Abstract

The invention provides a priming processing method and priming processing device, which ensures the reliability of the priming processing and further reducing the usage amount of the cleaning fluid. The spray export of the narrow slit nozzle (72) is parallel to the top of the priming roller (14), at the stationary status of the priming roller (14), the narrow slit nozzle (72) ejects constant amount of resist liquid (R). Subsequently, the priming roller (14) start rotating, to wind the resist liquid R on the external circumstance surface of the priming roller (14). Subsequently, the revolution rate of the priming roller (14) is can be improved at one time, the liquid film of the resist liquid (R) can be separated to be divided into a narrow slit nozzle (72) side and a priming roller (14) side, after separating the priming roller (14) maintains rotation, for air drying of the resist liquid film (RM1).

Description

Technical field [0001] The present invention relates to a start-up filling processing method and a start-up filling processing device, which are used to form a liquid film of processing liquid near the discharge port of a slit nozzle for coating processing in a non-rotating method as a pre-coating process ready. Background technique [0002] In the photoetching process in the manufacturing process of flat panel displays (FPD) such as LCDs, non-rotational methods are often used. The non-rotational method is to scan a long slit nozzle with a slit-shaped ejection port. A resist solution is applied on a processing substrate (for example, a glass substrate). [0003] In such a non-rotating method, it is desirable to prevent the non-uniformity of the resist dry film thickness and coating unevenness, and make the resist liquid sprayed onto the substrate during the coating scan scan The meniscus formed by winding to the back side of the slit nozzle in the direction of the nozzle is align...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C5/02B05C13/02B05C11/10B05C9/12B05D1/26G03F7/16B05D3/00
CPCB05C5/0204B05C5/0208G03F7/2041H01L21/0274
Inventor 若元幸浩田代佳上田荣一
Owner TOKYO ELECTRON LTD
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