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Priming processing method and priming processing device

A technology for starting filling and treatment methods, applied in the direction of pretreatment of surfaces, devices for coating liquids on surfaces, optics, etc.

Active Publication Date: 2014-03-19
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, in the conventional priming treatment device, each time the priming process is performed, as a post-processing, the priming roller is continuously rotated as described above, and the cleaning solution is sprayed on the entire outer peripheral surface (whole circumference) of the priming roller. , so there is this problem of using a lot of cleaning fluid (usually thinner)

Method used

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  • Priming processing method and priming processing device
  • Priming processing method and priming processing device
  • Priming processing method and priming processing device

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Embodiment Construction

[0051] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

[0052] Structure of the start-up filling processing unit

[0053] figure 1 The configuration of the priming processing device according to one embodiment of the present invention is shown. This priming processing device is incorporated in, for example, a resist coating device (not shown) that performs a non-rotational resist coating process in a photolithography process for LCD manufacturing process (not shown), and is placed in a In the resist coating process, the substrate to be processed is placed or floated in the vicinity of a coating table (not shown).

[0054] In the illustrated priming processing device, the casing 10 is constituted by a long frame having a slit-shaped opening 12 on the upper surface, and the top of the accommodated priming roller 14 passes through the opening 12. The form exposed above is horizontally and rotatably supported by b...

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Abstract

The invention provides a priming processing method and priming processing device, which ensures the reliability of the priming processing and further reducing the usage amount of the cleaning fluid. The spray export of the narrow slit nozzle (72) is parallel to the top of the priming roller (14), at the stationary status of the priming roller (14), the narrow slit nozzle (72) ejects constant amount of resist liquid (R). Subsequently, the priming roller (14) start rotating, to wind the resist liquid R on the external circumstance surface of the priming roller (14). Subsequently, the revolution rate of the priming roller (14) is can be improved at one time, the liquid film of the resist liquid (R) can be separated to be divided into a narrow slit nozzle (72) side and a priming roller (14) side, after separating the priming roller (14) maintains rotation, for air drying of the resist liquid film (RM1).

Description

technical field [0001] The present invention relates to a priming treatment method and a priming treatment device, which are used to form a liquid film of a treatment liquid near the discharge port of a slit nozzle for coating treatment by a non-rotation method, as a preliminary treatment for coating treatment. Prepare. Background technique [0002] In the photolithography process in the manufacturing process of flat panel displays (FPD) such as LCDs, a non-rotational method is often used. In this non-rotational method, a long slit nozzle having a slit-shaped discharge port is scanned, and the A resist solution is coated on a processing substrate (for example, a glass substrate). [0003] In such a non-rotational method, it is desirable to keep the resist liquid sprayed onto the substrate during the coating scan on the basis of preventing uneven film thickness of the dried resist film and coating unevenness. The meniscus formed around the back side of the slit nozzle in th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05C5/02B05C13/02B05C11/10B05C9/12B05D1/26G03F7/16B05D3/00
CPCB05C5/0204B05C5/0208G03F7/2041H01L21/0274
Inventor 若元幸浩田代佳上田荣一
Owner TOKYO ELECTRON LTD
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