High transmittance toughenable low radiation glass and manufacture method thereof

A low-emissivity glass and high-transmittance technology, applied in the field of coated glass, can solve problems such as damage, loss of low-emission performance, and reduction of production capacity of coating lines, etc., and achieve the effect of low hemispheric emissivity and high visible light transmittance

Inactive Publication Date: 2012-02-01
SHANGHAI NORTH GLASS COATING TECHNOLOGY INDUSTRIAL CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] However, this low-e glass cannot be tempered or heat-treated, because during the process of tempering or heat treatment, Ag will be oxidized and destroyed, resulting in increased resistanc...

Method used

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  • High transmittance toughenable low radiation glass and manufacture method thereof
  • High transmittance toughenable low radiation glass and manufacture method thereof
  • High transmittance toughenable low radiation glass and manufacture method thereof

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Embodiment 1

[0036] The original piece of architectural grade transparent float glass with a thickness of 6.0mm is cleaned and dried, and the underlying dielectric layer Si is deposited on the surface in sequence. 3 N 4 / ZnSnO x / ZnO:Al, where Si 3 N 4 The thickness is 10nm, the ratio of argon to nitrogen is 1.2:1, ZnSnO x The thickness is 26nm, the ratio of argon to oxygen is 1:3, the thickness of ZnO:Al is 8nm, and the ratio of argon to oxygen is 1:3; the thickness of the Ag layer of the infrared reflection layer is 10nm, Ar=500sccm; the thickness of the NiCr layer of the metal barrier layer is 3nm, Ar=500sccm ; Upper dielectric layer ZnSnSbO x / Si 3 N 4 , where ZnSnSbO x The thickness is 20nm, the ratio of argon to oxygen is 1:3, Si 3 N 4 The thickness is 15nm, and the ratio of argon to nitrogen is 1.2:1. The above dielectric layers are all deposited by intermediate frequency power supply plus rotary cathode sputtering, and the infrared reflection layer and metal barrier layer...

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Abstract

The invention relates to high transmittance toughenable low radiation glass and a manufacture method thereof. The high transmittance toughenable low radiation glass comprises a glass substrate of transparent or colored float glass, and is characterized in that: a bottom dielectric layer with a film system structure of Si3N4/ZnSnOx/ZnO:Al or ZnSnOx/ZnO:Al is arranged above the glass substrate; an infrared reflecting layer of metallic Ag is arranged above the bottom dielectric layer; a metal barrier layer of NiCr alloy is arranged above the infrared reflecting layer; an upper dielectric layer with a film system structure of ZnSnSbOx/Si3N4 is arranged above the metal barrier layer. The beneficial effects of the invention are as follows: since composite dielectric layers are employed for the glass provided in the invention and all the film layers are reasonably arranged, the obtained glass can undergo toughening or heat treatment, and the treated glass can retain original properties and has high visible light transmittance and a low hemisphere radiant ratio; a single sheet of the toughened coated glass has visible light transmittance of 85% and a hemisphere radiant ratio below 0.10, and is extensively applicable to the field of architectural glass.

Description

technical field [0001] The invention relates to a coated glass, in particular to a high-transmittance toughened low-emissivity glass and a manufacturing method thereof. Background technique [0002] Glass is an integral part of the architectural field and undertakes many important functions, including beautifying buildings, lighting and bringing open views to the interior. But ordinary glass has high sunlight transmittance and low infrared reflectivity. Most of the sunlight enters the room through the glass, thereby heating objects, and the energy of these indoor objects will be lost through the glass in the form of radiation. The glass coated with low-emissivity film has a high reflection effect on the infrared energy of objects at room temperature. This feature greatly reduces the heat transfer coefficient of low-emissivity glass and effectively improves the thermal insulation and heat insulation performance of windows. [0003] The low-emissivity film layers in the prior...

Claims

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Application Information

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IPC IPC(8): C03C17/36
Inventor 施玉安郭爽
Owner SHANGHAI NORTH GLASS COATING TECHNOLOGY INDUSTRIAL CO LTD
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