Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Magneto-rheological polishing method and tool

A technology of magnetorheological polishing and polishing tools, which is applied in the application field of magnetorheological polishing methods, polishing tools and new intelligent materials, and can solve the problems of unsatisfactory polishing effect and complex magnetic field calculation, etc., and achieve simple structure, precise control, Applicable to a wide range of effects

Active Publication Date: 2014-12-10
ZHEJIANG FUSIDA TOOLS
View PDF7 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method can achieve uniform polishing, but in practice the calculation of the magnetic field is complicated and can only be approximated by calling the database, so the polishing effect is not ideal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Magneto-rheological polishing method and tool
  • Magneto-rheological polishing method and tool
  • Magneto-rheological polishing method and tool

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] The solution of the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments,

[0033] A magnetorheological polishing method, specifically comprising the steps of:

[0034] Step 1. The surface information of the workpiece is known;

[0035] Step 2. Determine the position of the polishing tool and the polishing gap;

[0036] Step 3, inject magnetorheological fluid into the polishing gap;

[0037] Step 4, calculate the polishing pressure distribution when the uniform removal rate is obtained from the surface shape information of the polishing area and the linear velocity distribution of each point in the polishing area;

[0038] It is known that the polishing speed ν=ωr in the plane polishing, the polishing speed distribution in the radial direction of the polished area, the linear speed at the center of the circle is the lowest, the linear speed increases gradually along the radial direction, and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a magneto-rheological polishing method and device. The magneto-rheological polishing method comprises the steps that surface type information of a workpiece is known; the position and polishing interval of the polishing tool are determined; the polishing interval is filled with magneto-rheological fluid; according to surface shape information of a polishing area and linear velocity distribution of all points in the polishing area, polishing pressure distribution is calculated when the removal rate is even; magnetic field distribution is obtained according to the pressure distribution through inverse solution; according to the obtained magnetic field distribution model, coil voltages of three layers of concentric circular electromagnets are changed respectively, so that magnetic field distribution in the radius direction meets the requirement; polishing is carried out. According to the magneto-rheological polishing method, the concentric circular electromagnets are of a nested structure and supply power to a collecting ring respectively, and therefore the purposes that magnetic fields at the same radius are the same in intensity and intensity of magnetic fields at different radii can be controlled separately are achieved.

Description

technical field [0001] The invention relates to the application of a novel intelligent material, belongs to the field of finishing processing, and in particular relates to a magnetorheological polishing method and a polishing tool. Background technique [0002] Magnetorheology is a kind of intelligent material, which is a suspension composed of tiny soft magnetic particles with high magnetic permeability and low magnetic hysteresis and non-magnetic liquid. It is a liquid under normal conditions. When a magnetic field is applied, a liquid-solid phase transition occurs, and when the magnetic field is removed, a solid-liquid phase transition occurs again. Within a certain range of magnetic field strength, the apparent viscosity of magnetorheological fluid is related to the magnetic field strength. This phenomenon is called the magnetorheological effect. Utilizing the magnetorheological effect of the magnetorheological fluid, the abrasive particles can be gathered in the polis...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00
CPCB24B1/005
Inventor 贺新升陈卫增王智深季海峰高春甫
Owner ZHEJIANG FUSIDA TOOLS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com