Maskless laser direct writing stacking exposure method

Abstract

The invention discloses a maskless laser direct writing stacking exposure method. During X-direction moving of a precision motion platform, exposed graphs are subjected to equal-pixel translational display in the height direction of an SLM (Spatial Light Modulator); when the movement distance of the platform is equal to the pixel imaging translational quantity of the SLM, an exposure signal is sent to realize synchronous exposure of graphs and positions; after one-line exposure, the images in the width direction of the SLM are subjected to set-pixel translational display, and at the same time, the precision motion platform deflects for a corresponding set-pixel imaging distance in the Y direction so as to realize bidimensional stacking exposure in the height and width directions. The maskless laser direct writing stacking exposure method is flexible in measures, can obtain different exposure stacking folds so long as the X-direction displayed translational quantity and the Y-direction stacking fold are changed, conveniently realizes accurate control of the exposure metering, is small in graphic data quantity and achieves the same stacking exposure data amount at any number of times.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to a maskless laser direct writing superposition exposure method. Background technique [0002] Maskless laser direct writing technology is widely used in precision mask manufacturing, MEMS device manufacturing, flat panel display, thin line width PCB board manufacturing and other fields. [0003] In order to achieve higher image accuracy, better exposure uniformity and exposure metering requirements, the maskless laser direct writing systems on the market generally adopt the method of overlapping and repeating exposure in the XY two-dimensional direction, but for overlapping There is no flexible method for the selection of the number of overlaps and the control of exposure measurement. The control of different overlap times and exposure measurement often requires the design of different data formats and unique platform position positioning methods to achieve repeated overl...

AI Technical Summary

Problems solved by technology

[0003] In order to achieve higher image accuracy, better exposure uniformity and exposure metering requirements, the maskless laser direct writing systems on the market generally adopt the method of overlapping and repeating exposure in the XY two-dimensional direction, but for overlapping There is no flexible method for the selection of the number of overlaps and the control of exposure measurement. The control of different overlap times and exposure measurement often requires the design of different data formats and unique platform position positioning methods to achieve repeated overlapping exposures. Purpose

Images