Laser direct writing method based on large-area multi-step binary optical element
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SVG TECH GRP CO LTD
- Publication Date
- 2017-01-25
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Abstract
Description
technical field
[0001] The invention relates to the technical field of multi-step microstructure preparation, in particular to a laser direct writing method based on a large-area multi-step binary optical element. Background technique
[0002] Based on the diffraction theory of light waves, binary optical devices use computer-aided design to etch relief structures with two or more step depths on the substrate or the surface of traditional optical devices, forming pure phase, coaxial reproduction, and extremely high diffraction A class of diffractive optical elements with high efficiency. Generally, the two-step binary optical element has symmetrical positive and negative first-order diffracted light, and the theoretical efficiency of the first-order diffracted light is 40.5%. The theoretical diffraction efficiency of more than 4 multi-step binary optical elements is 81%. The theoretical diffraction efficiency of the meta-optical element is 96%. Binary optical elements have...