38results about How to "Improve lithography efficiency" patented technology

The invention provides a synchronous control system of a step scanning photoetching machine based on a VME (Virtual Mobile Engine) bus and a synchronous control method thereof, which are to solve problems of large synchronization error and low photoetching efficiency in the exposure process of the step scanning photoetching machine. According to the invention, an upper machine is connected with a lower machine by an Ethernet; a synchronous control module is connected with the lower machine by a VME64 standard bus; the synchronous control module is connected with a laser counting module and a motion control module by VME64 user-defined protocol buses; a network port of the synchronous control module is connected with a network port of the lower machine by a network wire; and the VME bus comprises VME64 user-defined protocol buses and a VME64 standard bus. According to the invention, purposes of controlling and reducing the synchronization error in the step scanning process and increasing the photoetching efficiency are achieved. The synchronous control system and the synchronous control method, provided by the invention, are suitable for the field of scanning photoetching machines.

The invention relates to the technical field of micro-nanometer processing and discloses a projection photoetching system with a composite photon sieve. The system comprises a lighting system, a mask plate, the composite photon sieve and a substrate, which are sequentially arranged, wherein the lighting system is used for generating an incident light and emitting the incident light to the mask plate; the mask plate is used for providing an object space for imaging the composite photon sieve and emitting the incident light to the composite photon sieve through the mask plate; the composite photon sieve is used for realizing an imaging function and imaging a graph on the mask plate on the substrate; and the substrate is used for receiving an image, formed by the composite photon sieve, of the graph on the mask plate. The composite photon sieve projection photoetching system has the advantages that: because the composite photon sieve is adopted to replace a projection objective in the conventional projection photoetching system, the advantage of high efficiency of the conventional projection photoetching system can be reserved, quick massive photoetching is realized, photoetching efficiency is improved, cost can be effectively reduced, and the volume of the system is reduced.

The invention discloses a light intensity distribution obtaining method and device based on non-uniform calculation. The method comprises the following steps: uniformly sampling a light source function and a pupil function in a frequency domain to obtain a light source sampling matrix and a pupil sampling matrix based on an intersecting area; The non-uniform inverse Fourier transform is applied tothe sample matrix of light source and pupil to obtain the cross transfer matrix. Determining a frequency domain kernel function of the cross transfer matrix; The sampling matrix of the mask functionin frequency domain and the sampling matrix of the kernel function in frequency domain are established. According to the sampling matrix of the mask function in frequency domain and the sampling matrix of the kernel function in frequency domain, the light intensity distribution in the specified position of the user is obtained through the inverse non-uniform Fourier transform. In the present application, since the sampling method based on the intersecting area is adopted, the calculation accuracy is improved, and at the same time, the inverse non-uniform Fourier transform is adopted, and underthe same sampling density, the calculation amount of the light intensity distribution can be reduced, thereby shortening the calculation time and improving the efficiency of photoresist lithography.