Photoetching equipment and photoetching method

A lithography equipment and lithography technology, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve the problems of inconsistent stripe depth of lithography samples, huge impact on product quality, etc., to improve lithography efficiency, improve Yield rate, ensure the effect of lithography effect

Pending Publication Date: 2021-10-12
SVG TECH GRP CO LTD +1
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Problems solved by technology

[0002] In the laser direct writing industry, the instability of laser energy has a great impact on the quality of the products produced. When the laser energy is unstable during the working process of the laser direct writing equipment, it will cause the depth of the stripes of the photolithographic sample to be inconsistent. The obvious bright and dark stripes divide the area, which has a great impact on the subsequent process production. Therefore, it is necessary to design a device for the laser energy detection device in the direct writing lithography process, which can troubleshoot and solve problems in the light and dark areas of the sample during the production process. monitor

Method used

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  • Photoetching equipment and photoetching method
  • Photoetching equipment and photoetching method
  • Photoetching equipment and photoetching method

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Embodiment Construction

[0028] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0029] Please refer to figure 1 , the lithography equipment provided in the embodiment of the present invention includes a laser output device 1 , an optical path selection device 5 , a detection module 6 and a lithography module 7 . The laser output device 1 emits laser light to the optical path selection device 5 , and the optical path selection device 5 chooses to reflect the laser light to the photolithography module 7 or the detection module 6 .

[0030] The laser output device 1 is an adjustable laser, which can be adjusted to meet the output energy required by different exposure energies. Take the required exposure energy of each batch of products as the benchmark...

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Abstract

The invention discloses photoetching equipment which comprises a laser output device, a light path selection device, a detection module and a photoetching module. The laser output device emits laser to the light path selection device, and the light path selection device selects to reflect the laser to the photoetching module or the detection module. The invention also discloses a photoetching method which is used for photoetching by utilizing the photoetching equipment. The light path selection device selects to reflect the laser to the photoetching module or the detection module, so that the photoetching equipment can detect the exposure energy in real time, the photoetching effect is ensured, the photoetching efficiency is improved, and the yield of products is improved.

Description

technical field [0001] The present invention relates to the technical field of lithography equipment, in particular to a lithography equipment and a lithography method. Background technique [0002] In the laser direct writing industry, the instability of laser energy has a great impact on the quality of the products produced. When the laser energy is unstable during the working process of the laser direct writing equipment, it will cause the depth of the stripes of the photolithographic sample to be inconsistent. The obvious bright and dark stripes divide the area, which has a great impact on the subsequent process production. Therefore, it is necessary to design a device for the laser energy detection device in the direct writing lithography process, which can troubleshoot and solve problems in the light and dark areas of the sample during the production process. monitor. [0003] The foregoing description is provided to provide general background information and does not...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70383G03F7/70516G03F7/7085G03F7/20
Inventor 吕帅徐顺达王冠楠朱鹏飞浦东林
Owner SVG TECH GRP CO LTD
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