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Photoresist coating system and on-line measurement method for viscosity thereof

A measurement method and photoresist technology, which is applied in the direction of DC flow characteristic measurement, photo-plate making process coating equipment, etc., can solve problems that affect the photolithography effect of products, abnormal coating film layer, and product defects, so as to ensure consistency and uniformity, simple method and high feasibility

Active Publication Date: 2017-12-19
TRULY HUIZHOU SMART DISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the measurement of photoresist viscosity in the process of semiconductor production is offline measurement, that is, before using the photoresist, it is poured out or taken out from its container for measurement. The abnormality of the coating layer will affect the photolithography effect of the product and cause the product to be defective; and in the process of product production, the viscosity of the photoresist is generally not measured on the production line, which will bring certain problems to the product. yield risk

Method used

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  • Photoresist coating system and on-line measurement method for viscosity thereof
  • Photoresist coating system and on-line measurement method for viscosity thereof
  • Photoresist coating system and on-line measurement method for viscosity thereof

Examples

Experimental program
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Effect test

Embodiment approach 1

[0019] A photoresist coating system, comprising a glue application tank 1, an exhaust tank 2, a filter 3 and a glue application head 4 connected in sequence by a rubber hose, and the rubber hose between the glue application tank 1 and the exhaust tank 2 There is a three-way on-off control valve 5, the two ends of the three-way on-off control valve are respectively connected to the glue tank 1 and the exhaust tank 2 through rubber hoses, and the third end of the three-way on-off control valve 5 is connected to an online viscosity tester 6 . The online measurement method of adhesive viscosity is as follows: the three-way switch control valve 5 conducts the photoresist between the glue application tank 1 and the exhaust tank 2, turns on the switch leading to the photoresist viscosity tester 6, and measures the adhesive viscosity online.

Embodiment approach 2

[0021] On the basis of Embodiment 1, a control system is also included, and the online viscosity tester 6 is connected to the control system. The filter 3 is also connected with a waste liquid tank 7 through a rubber hose, and the control system controls the glue application tank 1 , the exhaust tank 2 , the waste liquid tank 7 , the filter 3 and the glue application head 4 . The online measurement method of adhesive viscosity is: the control system controls the three-way switch control valve to conduct the photoresist between the glue application tank and the exhaust tank according to the predetermined parameters, and turns on the switch leading to the photoresist viscosity tester , online measurement of adhesive viscosity.

Embodiment approach 3

[0023] On the basis of Embodiment 2, a flow meter 8 is connected between the filter 3 and the glue applicator 4 through a rubber hose, and the flow meter 8 is electrically connected to the three-way switch control valve 5 . The flowmeter 8 is connected with the control system. The online measurement method of adhesive viscosity is: A. The control system controls the three-way switch control valve to conduct the photoresist between the glue application tank and the exhaust tank according to the predetermined parameters, and opens the photoresist viscosity tester switch, on-line measurement of adhesive viscosity;

[0024] B. When the control system reads the data in step A and shows "normal", close the switch leading to the photoresist viscosity tester; and feed back information to the flowmeter;

[0025] C. The control system reads the flow data of the photoresist in the flowmeter at any time;

[0026] D. When the control system reads the data in step C and displays "No", adj...

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Abstract

The invention relates to the technical field of a semiconductor fabrication process, in particular to a photoresist coating system and an on-line measurement method for viscosity thereof. The photoresist coating system comprises a coating tank, an exhaust tank, a filter and a coating head which are sequentially connected via a photoresist pipe, wherein a three-way switch control valve is arranged on the photoresist pipe between the coating tank and the exhaust tank, two ends of the three-way switch control valve are respectively connected with the coating tank and the exhaust tank, a three end of the three-way switch control valve is connected with an on-line viscosity tester, the three-way switch control valve is used for conducting photoresist between the coating tank and the exhaust tank, a switch to the photoresist viscosity tester is switched on to measure the viscosity on line, the photoresist coating system is further provided with a flowmeter, and the flowmeter is electrically connected with the three-way switch control valve. The on-line measurement method for the viscosity of the photoresist coating system is particularly suitable for production of an industrial semiconductor process on a large scale, and the on-line measurement method is simple and is good in practicability.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing technology, in particular to a photoresist coating system and an online measurement method for its viscosity. Background technique [0002] With the vigorous development of integrated circuit devices, the semiconductor manufacturing process and production scale are also increasing; among them, the application of photoresist is a very important process in the semiconductor manufacturing process, because the product production process requires photolithography. Uniform line width, especially now that the size of the substrate is increasing, the requirements for the photolithographic effect will be more stringent, so the requirements for the coating process of the photoresist will become more and more stringent; especially for the characteristics of the photoresist itself The viscosity is one of the characteristics of the photoresist, which is an important parameter to measure the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/16G01N11/02
CPCG01N11/02G03F7/16
Inventor 陈世喜朱景河王学雷黄伟东李建华
Owner TRULY HUIZHOU SMART DISPLAY
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