1 results about "Photon sieve" patented technology

This invention discloses a fabrication system and method for large-area phase-type computational holograms. The method involves designing and constructing a fabrication system for large-area phase-type computational holograms. By utilizing a micromirror array and microlens array in the photoresist excitation optical path, tens of thousands of laser beams are generated for parallel writing, achieving an equivalent writing speed of 100 mm / s. The minimum lateral feature size of each beam reaches 50 nm, enabling the fabrication of large-area phase-type computational holograms. The designed large-area phase-type computational hologram employs a photonic sieve-like structure, which significantly improves the accuracy of surface shape detection compared to traditional zone plate-type computational holograms, enabling high-precision aspherical surface shape detection for extreme ultraviolet lithography objectives.