11 results about "Photon sieve" patented technology

The application relates to the technical field of optical elements, in particular to a digital holographic detection device and system based on polarization conversion. The device comprises a light beam modulation mechanism, a light splitting mechanism, a photon sieve and a polarization conversion mechanism. The light beam modulation mechanism is used for outputting coaxial dual-wavelength collimated parallel light; the light splitting mechanism is used for turning the collimated parallel light; a first polarization selection film layer is arranged on the incident surface of the photon sieve, the first polarization selection film layer is used for transmitting S polarized light and reflecting P polarized light, the photon sieve is used for focusing the transmitted S polarized light to the same position and irradiating a sample to form object light; and the polarization conversion mechanism makes the vibration directions of reference light and object light consistent. The application constructs a dual-wavelength digital holographic system by taking the photon sieve and the polarization conversion mechanism as cores, realizes stable interference and reliable collection through a compact optical path, reduces the complexity of the system, and realizes non-contact high-precision and high-efficiency measurement of complex micro-nano structures.

The invention discloses a control method and device for a multispectral photon sieve self-powered camera and a medium, and the method comprises the steps: carrying out the multiband spectrum separation of incident light through a nano-structure filtering layer, obtaining optical signals of different wavelengths, and transmitting the separated optical signals to a photon storage and calculation integrated chip for optical domain feature extraction; incident light is reflected to a wavefront sensor through a beam splitter prism for wavefront distortion detection, and micromirror adjustment parameters are calculated based on wavefront distortion data so as to drive a micromirror execution mechanism to dynamically compensate aberration; environment energy is collected through a flexible solar cell and a vibration energy collector, and the environment energy is converted into electric energy; the electric energy is stored in a storage battery, the corresponding electric quantity state of the storage battery is monitored, and the working mode of the camera is dynamically switched according to the electric quantity state; the working mode comprises a full-function mode and a low-power-consumption mode.

A radial shearing interferometer based on a bifocal photonic sieve includes two identical bifocal photonic sieves, an image detector, and a computer. The focal points of the two bifocal photonic sieves correspond to each other, generating two 4f systems. This causes the incident wavefront to be measured to be split into two beams of different sizes, which undergo shearing interference on the image detector. The computer can extract the shearing phase difference from the interferogram received from the image detector, thus obtaining the phase information carried in the beam. This invention features a simple structure, low requirements for the experimental environment, and strong anti-interference capability, and can be applied to many fields such as wavefront detection, interferometric imaging, and adaptive optics.

The application discloses an X-ray real-time imaging device and method based on an image plane coherent diffraction imaging, and the device comprises an X-ray source, an adjustable slit, an object to be measured, a first three-dimensional translation stage, a multi-focus photon sieve, a second three-dimensional translation stage, an X-ray detector and a computer; the imaging device has the characteristics of single optical path, compactness, simplicity and easy operation, and only a single intensity image needs to be recorded, so that the imaging device robustness can be improved by avoiding multiple operations; the imaging method can be used for X-ray to terahertz band imaging, and can realize accurate reproduction of a complex amplitude image of the object to be measured in real time and on line.

The invention provides a pair of myopia prevention and control glasses of a photon-like sieve model, which comprises a lens main body, and an optical correction area, a defocus area and an edge arc area are concentrically arranged on the lens main body; the defocus area is arranged between the optical correction area and the edge arc area, the defocus area is provided with a photon sieve, the photon sieve is composed of a series of small holes distributed in concentric rings, and the arrangement of the small holes meets a window function; and the light transmission of the defocus area is lower than that of the optical correction area. The photon sieve meeting the window function is introduced into the defocus area of the myopia prevention and control lens, pupil dependence of a single refraction type optical design is overcome, the imaging quality of a traditional Fresnel diffraction lens is improved, the high-order diffraction and the side lobe effect are restrained, clear and stable myopia defocus is provided, meanwhile, a low-contrast environment is formed in the retina, and therefore the myopia prevention and control lens can be used for preventing and controlling myopia. And a refraction and diffraction mixed system is formed by utilizing the opposite dispersivity of the photon sieve and a traditional refraction material, so that the chromatic aberration problem of the photon sieve serving as a diffraction optical element is solved.

This invention discloses a fabrication system and method for large-area phase-type computational holograms. The method involves designing and constructing a fabrication system for large-area phase-type computational holograms. By utilizing a micromirror array and microlens array in the photoresist excitation optical path, tens of thousands of laser beams are generated for parallel writing, achieving an equivalent writing speed of 100 mm / s. The minimum lateral feature size of each beam reaches 50 nm, enabling the fabrication of large-area phase-type computational holograms. The designed large-area phase-type computational hologram employs a photonic sieve-like structure, which significantly improves the accuracy of surface shape detection compared to traditional zone plate-type computational holograms, enabling high-precision aspherical surface shape detection for extreme ultraviolet lithography objectives.

The purpose of the present invention is to provide a diffractive optical element having improved shape stability.　This diffractive optical element causes diffraction with respect to incident light, and comprises a substrate that transmits the incident light, a fine structure that is composed of a curable resin composition and forms an unevenness on a first main surface side of the substrate to form a diffraction pattern for diffracting the incident light, and a first protective layer that is transmissive to the incident light and covers the fine structure, the fine structure exhibiting any of a Fresnel zone plate shape, a linear zone plate shape, a fractal zone plate shape, and a photon sieve plate shape when viewed in a direction orthogonal to the first main surface.

The application relates to a method and device for femtosecond laser processing of a photonic sieve, a storage medium and a terminal. The method comprises the following steps: collecting the size of a small hole of the photonic sieve; according to the size of the small hole and a preset beam spot size of processing laser, selecting whether to turn on or not to turn on modulation laser of the photonic sieve; if the modulation laser is not turned on, according to the intensity of the processing laser and a two-photon polymerization threshold of the photonic sieve, processing the photonic sieve to meet a first-level preset size; if the modulation laser is turned on, according to the modulation laser, the intensity of the processing laser and the two-photon polymerization threshold of the photonic sieve, processing the photonic sieve to meet a second-level preset size. The application can meet the demand of processing small holes with different sizes in a large-size photonic sieve, and has the characteristics of high efficiency and high precision.

The invention provides an extreme ultraviolet lithography mask defect detection method and system based on a photon sieve. A special photon sieve is designed, the photon sieve is used for replacing a Fresnel zone plate used in an existing extreme ultraviolet lithography mask defect detection system, and the extreme ultraviolet lithography mask defect detection method and system are constructed. The system employs a static narrow diverging extreme ultraviolet light source from synchrotron radiation. An extreme ultraviolet light beam emitted by the light source firstly enters a four-leaf slit, and after being modulated by the four-leaf slit, the light beam enters a plane mirror plated with an extreme ultraviolet high-reflective film. The reflector is carried on a double-axis scanning MEMS device, and after scanning, a light beam enters another plane folding reflector plated with an extreme ultraviolet high-reflective film. The reflector can reflect a light path upwards to an ellipsoid reflection collecting mirror plated with an extreme ultraviolet high-reflection film, and finally a uniform illumination light field with magnification zooming is achieved on a mask image plane. The photon sieve is used for collecting reflected light of the mask for imaging, so that the purpose of detecting defects on the extreme ultraviolet lithography mask is achieved, and higher imaging resolution and imaging quality are achieved.

Provided is a diffractive optical element which can separate incident light for each wavelength, focus the light of each wavelength to different positions, and be manufactured relatively easily.　The present invention includes: a substrate which transmits light; and a plurality of diffraction patterns including a first diffraction pattern and a second diffraction pattern which are formed so as to have different center positions on the same main surface of the substrate. Each of the first diffraction pattern and the second diffraction pattern exhibits a pattern shape selected from the group consisting of a Fresnel zone plate pattern, a fractal zone plate pattern, and a photon sieve plate pattern.

The invention discloses a water vapor Raman laser radar beam splitting system based on a photon sieve array. The system comprises an optical fiber, an L1 lens, the photon sieve array, a small hole and a CMOS imaging device which are sequentially arranged along an optical axis. The L1 lens is arranged on an emergent end light path of the optical fiber, and the emergent end face of the optical fiber coincides with the front focal plane of the L1 lens. The photon sieve array is arranged on an emergent light path of the L1 lens; the small hole is formed in the rear focal plane of the photon sieve array, and the center of the small hole coincides with the main focus of the photon sieve array on the optical axis; the CMOS imaging device is arranged on an emergent light path of the small hole. The invention further discloses a water vapor Raman laser radar light splitting method based on the photon sieve array. According to the water vapor Raman laser radar beam splitting system and method based on the photon sieve array, the problem that in the prior art, a water vapor Raman laser radar beam splitting system is complex in light path design is solved.