3 results about "Photon sieve" patented technology

This invention discloses a fabrication system and method for large-area phase-type computational holograms. The method involves designing and constructing a fabrication system for large-area phase-type computational holograms. By utilizing a micromirror array and microlens array in the photoresist excitation optical path, tens of thousands of laser beams are generated for parallel writing, achieving an equivalent writing speed of 100 mm / s. The minimum lateral feature size of each beam reaches 50 nm, enabling the fabrication of large-area phase-type computational holograms. The designed large-area phase-type computational hologram employs a photonic sieve-like structure, which significantly improves the accuracy of surface shape detection compared to traditional zone plate-type computational holograms, enabling high-precision aspherical surface shape detection for extreme ultraviolet lithography objectives.

The purpose of the present invention is to provide a diffractive optical element having improved shape stability.　This diffractive optical element causes diffraction with respect to incident light, and comprises a substrate that transmits the incident light, a fine structure that is composed of a curable resin composition and forms an unevenness on a first main surface side of the substrate to form a diffraction pattern for diffracting the incident light, and a first protective layer that is transmissive to the incident light and covers the fine structure, the fine structure exhibiting any of a Fresnel zone plate shape, a linear zone plate shape, a fractal zone plate shape, and a photon sieve plate shape when viewed in a direction orthogonal to the first main surface.

Provided is a diffractive optical element which can separate incident light for each wavelength, focus the light of each wavelength to different positions, and be manufactured relatively easily.　The present invention includes: a substrate which transmits light; and a plurality of diffraction patterns including a first diffraction pattern and a second diffraction pattern which are formed so as to have different center positions on the same main surface of the substrate. Each of the first diffraction pattern and the second diffraction pattern exhibits a pattern shape selected from the group consisting of a Fresnel zone plate pattern, a fractal zone plate pattern, and a photon sieve plate pattern.