Method for manufacturing array phase zone photon sieve dodging device

A technology of photon sieve and light homogenizer, which is applied in the field of annular photon sieve light homogenizer in part of the array, can solve the problems of high requirements for designers, low cost, large transmission loss, etc.

Inactive Publication Date: 2012-09-19
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

The kaleidoscope method is easy to manufacture and adjust, the cost is greatly reduced, and the size of the output spot can be easily changed, but the transmission loss of this system is relatively large
[0009] Cylindrical mirror method: The principle of the method is to form a hollow square structure surrounded by four cylindrical mirrors. Each cylindrical mirror is installed on a fine adjustment frame. The size and shape of the hollow part can be controlled through adjustment. The laser is irradiated on the device Above, the hollow part of t...

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  • Method for manufacturing array phase zone photon sieve dodging device
  • Method for manufacturing array phase zone photon sieve dodging device
  • Method for manufacturing array phase zone photon sieve dodging device

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Embodiment Construction

[0037] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0038] The photon sieve homogenizer with an annular ring in the array is a new type of diffractive optical phase element, that is, a phase plate. The phase plate is placed before or after the diffraction-limited lens to correct the far-field diffraction light field of the laser beam, that is, to homogenize the light, and to achieve a diffracted beam that is closer to the plane wavefront than the irregular wavefront of the incident beam (such as a Gaussian beam). The invention provides the design structure of the ring-band photon sieve homogenizer in the array part, and carries out relevant simulation experiments. Experiments have verified that the wavefront flattening of the Gaussian beam can be achieved by using the part...

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Abstract

The invention discloses a method for manufacturing an array phase zone photon sieve dodging device, which is implemented by using a large-scale integrated circuit technology and a plane photoetching technology. The method comprises the following steps of: manufacturing a master plate by using an electron beam direct-writing method; transferring patterns of the master plate onto optical glass coated with photoresist with a contact-type photoetching method; and etching the patterns transferred onto the photoresist of the optical glass into the optical glass by using an inductive coupling plasma etching technology. The method disclosed by the invention can be used to realize wavefront flattening on a Gaussian light beam and other uneven non-planar wavefront light beams, realize dodging of the light beams and also realize approximately-planar light beams.

Description

[0001] This application is a divisional application, the application number of the parent application is: 200910093293.1, the application date: September 16, 2009, and the name: an annular photon sieve homogenizer with an array part and its manufacturing method. technical field [0002] The invention relates to the technical field of wavefront shaping of laser beams, in particular to a wavefront flattening of a Gaussian wavefront and an irregular wavefront laser beam in the far-field diffraction light field, that is, to realize a light field close to a plane wavefront distribution An annular photon sieve homogenizer in the array part and a manufacturing method thereof. The photon sieve homogenizer with part of the array can be used in beam shaping, microelectronics maskless etching and other various optical paths that require plane wavefronts. Background technique [0003] It is a practical subject to homogenize the laser beam with Gaussian wavefront and irregular wavefront ...

Claims

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Application Information

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IPC IPC(8): G02B27/09G02B5/18G02B27/42G03F7/20G03F7/36
Inventor 贾佳谢长青刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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