Method for manufacturing array phase zone photon sieve dodging device

Abstract

The invention discloses a method for manufacturing an array phase zone photon sieve dodging device, which is implemented by using a large-scale integrated circuit technology and a plane photoetching technology. The method comprises the following steps of: manufacturing a master plate by using an electron beam direct-writing method; transferring patterns of the master plate onto optical glass coated with photoresist with a contact-type photoetching method; and etching the patterns transferred onto the photoresist of the optical glass into the optical glass by using an inductive coupling plasma etching technology. The method disclosed by the invention can be used to realize wavefront flattening on a Gaussian light beam and other uneven non-planar wavefront light beams, realize dodging of the light beams and also realize approximately-planar light beams.

Description

[0001] This application is a divisional application, the application number of the parent application is: 200910093293.1, the application date: September 16, 2009, and the name: an annular photon sieve homogenizer with an array part and its manufacturing method. technical field [0002] The invention relates to the technical field of wavefront shaping of laser beams, in particular to a wavefront flattening of a Gaussian wavefront and an irregular wavefront laser beam in the far-field diffraction light field, that is, to realize a light field close to a plane wavefront distribution An annular photon sieve homogenizer in the array part and a manufacturing method thereof. The photon sieve homogenizer with part of the array can be used in beam shaping, microelectronics maskless etching and other various optical paths that require plane wavefronts. Background technique [0003] It is a practical subject to homogenize the laser beam with Gaussian wavefront and irregular wavefront ...

AI Technical Summary

Problems solved by technology

The kaleidoscope method is easy to manufacture and adjust, the cost is greatly reduced, and the size of the output spot can be easily changed, but the transmission loss of this system is relatively large

[0009] Cylindrical mirror method: The principle of the method is to form a hollow square structure surrounded by four cylindrical mirrors. Each cylindrical mirror is installed on a fine adjustment frame. The size and shape of the hollow part can be controlled through adjustment. The laser is irradiated on the device Above, the hollow part of the laser passes through directly, and the light irradiated on the edge cylindrical lens will compensate for the weak light intensity part of the middle light. By calculating the parameters of the cylindrical lens and adjusting the adjustment knob properly, the uniform light effect can be obtained. The advantage of this method is that the beam transmittance is higher and the uniform light effect is better, but the designer has higher requirements, and the designer needs to calculate the lens parameters and design a high-precision fine-tuning mechanism

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