Homogenizer of array partial zone photon sieve

Abstract

The invention discloses a homogenizer of an array partial phase zone photon sieve and a manufacturing method thereof. The homogenizer of the array partial phase zone photon sieve is a partial phase zone photon sieve array manufactured on a transparent medium according to actual needs, and the size of the array is determined according to the actual needs. The manufacturing method of the partial phase zone photon sieve comprises the following steps of: firstly manufacturing a common photon sieve on the transparent medium; and then etching round rings at other Fresnel phase zones to form a phase-type Fresnel phase zone, wherein the phase of the phase zone is phi. Therefore, transparent parts are available on odd phase zones and even phase zones of a wave zone plate, which are transparent holes of odd rings and etching phase zones of even rings, or the transparent holes of the even rings and the etching phase zones of the odd rings, respectively. In the etching phase zones, the parts occupied by the round holes of the photon sieve are not etched, and the phase is still 0. By utilizing the invention, the wave front flat topping of Gaussian beams and other nonuniform and nonplanar wave front beams are realized, the homogenization of the beams is realized, and the wave front beam approximate to a plane is realized.

Description

technical field [0001] The invention relates to the technical field of wavefront shaping of laser beams, in particular to a wavefront flattening of a Gaussian wavefront and an irregular wavefront laser beam in the far-field diffraction light field, that is, to realize a light field close to a plane wavefront distribution An annular photon sieve homogenizer in the array part and a manufacturing method thereof. The photon sieve homogenizer with part of the array can be used in beam shaping, microelectronics maskless etching and other various optical paths that require plane wavefronts. Background technique [0002] It is a practical subject to homogenize the laser beam with Gaussian wavefront and irregular wavefront through various ways, so that the beam can be transformed into a beam close to the plane wavefront, and it has a wide range of applications in various optical paths, such as in beam shaping , Microelectronics maskless lithography and other various instruments that...

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Problems solved by technology

The kaleidoscope method is easy to manufacture and adjust, the cost is greatly reduced, and the size of the output spot can be easily changed, but the transmission loss of this system is relatively large

[0008] Cylindrical mirror method: The principle of the method is to form a hollow square structure surrounded by four cylindrical mirrors. Each cylindrical mirror is installed on a fine adjustment frame. The size and shape of the hollow part can be controlled through adjustment. The laser is irradiated on the device Above, the hollow part of the laser passes through directly, and the light irradiated on the edge cylindrical lens will compensate for the weak light intensity part of the middle light. By calculating the parameters of the cylindrical lens and adjusting the adjustment knob properly, the uniform light effect can be obtained. The advantage of this method is that the beam transmittance is higher and the uniform light effect is better, but the designer has higher requirements, and the designer needs to calculate the lens parameters and design a high-precision fine-tuning mechanism

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