52 results about "Extreme ultraviolet lithography" patented technology

Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using a range of extreme ultraviolet (EUV) wavelengths, roughly spanning a 2% FWHM bandwidth about 13.5 nm. In August 2019, Samsung announced the use of EUV for its own 7nm Exynos 9825 chip. However, yield issues have been a concern. ASML, the sole EUV tool supplier, reported in June 2019 that pellicles required for critical layers still required improvements. In September 2019, Huawei announced a 5G version of its Kirin 990 chip that was made in a TSMC 7nm process with EUV, as well as a non-5G version that was made in a conventional TSMC 7nm process; however, the release dates for the first phones to use the Kirin 990 chips have not been confirmed yet; in October, TSMC announced products were shipping. TSMC had indicated in the first quarter of 2019 that EUV-generated N7+ revenue would amount to no more than 1 billion TWD (32 million USD) in 2019. For 2020, more focus is being placed on more extensive use of EUV for "5nm" or "N5," although cost per transistor is still a concern.