21 results about "Plasma zone" patented technology

An example method includes providing a wide bandgap semiconductor workpiece. The example method includes exposing the wide bandgap semiconductor workpiece to one or more electrical discharges from an electrical discharge machining (EDM) system to reduce a surface roughness of the wide bandgap semiconductor workpiece. Exposing the wide bandgap semiconductor workpiece to the one or more electrical discharges may include submerging a surface of the wide bandgap semiconductor workpiece in a dielectric fluid; positioning an electrode head relative to the surface such that a gap is defined between an end of the electrode head and the surface; and generating an electrical discharge across the gap to create a plasma zone within the gap such that a material is removed from the surface.

An example method includes providing a wide bandgap semiconductor workpiece. The example method includes exposing the wide bandgap semiconductor workpiece to one or more electrical discharges from an electrical discharge machining (EDM) system to reduce a surface roughness of the wide bandgap semiconductor workpiece. Exposing the wide bandgap semiconductor workpiece to the one or more electrical discharges may include submerging a surface of the wide bandgap semiconductor workpiece in a dielectric fluid; positioning an electrode head relative to the surface such that a gap is defined between an end of the electrode head and the surface; and generating an electrical discharge across the gap to create a plasma zone within the gap such that a material is removed from the surface.

This invention relates to the technical field of atmospheric control and air treatment, and discloses a waste gas treatment device based on the synergistic effect of low-temperature plasma and catalyst. The device includes a waste gas treatment unit, which sequentially passes waste gas through a plasma ionization zone and a catalytic zone. The plasma ionization zone ionizes the waste gas, while the catalytic zone further oxidizes or decomposes any incompletely degraded intermediate products after passing through the plasma zone. An outlet end is provided on the waste gas treatment unit, and an outlet unit is located at the outlet end. A film-breaking unit, during the waste gas treatment process, drives a permanent magnet ball to rotate, causing the permanent magnet ball to intermittently approach or move away from a spring, thus causing the spring to vibrate and preventing the formation of a gas film on the inner wall of the inlet end, thereby avoiding changes in the inlet end pipe diameter.

The present invention provides a manufacturing method for optical fiber preforms that satisfies one or more of the following criteria: a method that produces as little manufacturing waste as possible, a method that produces a preform with the most uniform doping possible, a method that is as simple as possible to implement, and a method that is as cost-effective as possible. [Solution] A method for manufacturing an optical fiber matrix includes: a step of synthesizing glass particles using a plasma zone generated by a plasma generator; b step of repeatedly moving the glass matrix forward and backward in the axial direction relative to the plasma generator while the glass matrix is ​​rotating, wherein the forward and backward movement is performed at a relative supply speed between two reversal points; and c step of depositing glass particles on the glass matrix while the glass matrix is ​​moving and rotating relative to the plasma generator.

A method for producing an optical fiber preform, comprising the method steps of synthesizing glass particles using a plasma zone generated by a plasma generator; repeatedly moving a glass preform axially forward and backward relative to the plasma generator during a rotational movement of the glass preform, wherein the forward and backward movement takes place between two reversal points at a relative feed rate; and, depositing the glass particles on the glass preform while the glass preform moves and rotates relative to the plasma generator.

The invention relates to a method for manufacturing an optical fiber preform, the method comprising the steps of: a. synthesizing glass particles using a plasma zone generated by a plasma generator; b. repeatedly moving a glass preform axially forward and backward relative to the plasma generator during a rotational movement of the glass preform, wherein the forward and backward movements occur between two reversal points at a relative feed rate; c. depositing the glass particles on the glass preform while the glass preform is moving and rotating relative to the plasma generator.

The invention discloses a methanol engine cold start system and method based on pulse plasma catalytic combustion. The methanol engine cold start system comprises a gas mixer, a methanol engine, a pulse plasma catalytic combustor and a reflux pump. The inlet section of the gas mixer is connected with air, the throat section is connected with methanol, and the outlet end is provided with an electric control proportional valve; the outlet end of the gas mixer is connected to the methanol engine and the pulse plasma catalytic combustor through an electric control three-way valve. A plasma area and a catalytic area are arranged in the pulse plasma catalytic combustor; an inlet of the pulse plasma catalytic burner is connected with the outlet end of the gas mixer, and an outlet of the pulse plasma catalytic burner is connected with the reflux pump and flows back to the throat section of the gas mixer. Through cooperation of pulse plasma excitation and the catalyst, reaction activation energy is reduced, methanol mixed gas can be excited at low temperature, heating gas of 60-70 DEG C is generated, necessary heat is provided for engine starting, dependence on external energy is not needed, and complete autonomous starting is achieved.

The invention relates to a method for plasma coating of an object comprising an object profile, comprising the steps of: a. providing an exchangeable shroud (2) comprising a jet inlet (22), a nozzle outlet (24) and a sidewall (21) extending from the jet inlet to the nozzle outlet, wherein the nozzle outlet comprises an edge (25) substantially coinciding with at least a part of the object profile, and whereby the shroud comprises an identification means, preferably in relation to the nozzle outlet edge; b. detachably attaching the exchangeable shroud to a jet outlet of a plasma jet generator; c. placing the object at the nozzle outlet such that the object profile fits the nozzle outlet edge within a distance of at least 0.1 mm and preferably at most 5 mm, thereby minimizing the gap between the nozzle outlet and the object; d. plasma coating the object with a low-temperature, oxygen-free plasma at an operating pressure higher than atmospheric pressure, preferably at most 10% above atmospheric pressure, by providing a plasma jet in the shroud via the plasma jet generator and injecting a coating precursor into the plasma jet in the shroud, thereby generating said operating pressure, thereby plasma coating the object in an oxygen-deficient plasma zone, whereby the method comprises the additional step of identifying the provided shroud prior to providing the plasma jet.

The present application relates to a kind of method for treating polluted air using light-plasma coupling, belong to environmental treatment technical field, first preparation alpha-pinene composite rGO / CeO2 Nanoparticles, by filling alpha-pinene composite rGO / CeO2 Nanoparticles into the catalyst chamber of the inner wall of plasma reactor uniformly, adjust the voltage and current of plasma reactor, generate plasma zone, for treating polluted air.The present application has beneficial effect: the radiation of excitation light source generated by plasma treatment, drive photocatalytic reaction speed to accelerate, nitrogen oxides occur photocatalytic reaction, the OH and H2O reaction of alpha-pinene composite rGO / CeO2 catalyst surface in photocatalytic process generates hydroxyl radical, hydroxyl radical will reach the effect of reaction pure with nitrogen oxides, alpha-pinene contains special bicyclo double bond structure, aromatic ring on rGO and the carbon-carbon double bond of alpha-pinene occur π-π stacking, distance reduces, to improve charge transport performance, improve the removal effect of alpha-pinene composite rGO / CeO2 catalyst to nitrogen oxides.

An example method includes providing a wide bandgap semiconductor workpiece. The example method includes exposing the wide bandgap semiconductor workpiece to one or more electrical discharges from an electrical discharge machining (EDM) system to reduce a surface roughness of the wide bandgap semiconductor workpiece. Exposing the wide bandgap semiconductor workpiece to the one or more electrical discharges may include submerging a surface of the wide bandgap semiconductor workpiece in a dielectric fluid; positioning an electrode head relative to the surface such that a gap is defined between an end of the electrode head and the surface; and generating an electrical discharge across the gap to create a plasma zone within the gap such that a material is removed from the surface.

The invention discloses a pathology department environment disinfection and killing system based on discharge plasma active water. The pathology department environment disinfection and killing system comprises a solar power supply module, a plasma active water preparation module, a microbubble regulation and control module, a water storage module, an ultrasonic atomization module, a spraying module and a monitoring and control module. The system adopts a discharge structure of a high-voltage electrode and a grounding electrode, and a plasma region is formed between the electrodes and acts with a water body to generate plasma active water; different types of acidic or nearly neutral active water can be obtained through microbubble regulation and control, so that pathogenic microorganisms can be quickly killed, and toxic macromolecules can be effectively degraded. The prepared plasma active water is uniformly sprayed to the environment after being subjected to ultrasonic atomization, so that the comprehensive coverage of the space of the pathology department is realized. The system realizes automatic regulation and control through pH, water level and environment humidity monitoring, and can adopt solar energy to supply power so as to reduce energy consumption.

The present invention relates to plasma assisted production of carbon black. Particularly, the present invention relates to a method and a reactor, wherein the carbon black feedstock can be injected in multiply positions in the carbon black reactor to avoid droplets in the plasma zone.

The present application relates to the technical field of preparing calcium coal carbonized pellets, in particular to a method for preparing calcium coal carbonized pellets by pyrolysis using a sliding arc plasma system, comprising the following steps: S1, conveying quicklime and raw coal to a calcium coal pellet preparation unit, and conveying the formed calcium coal pellets to a pyrolysis chamber; S2, pyrolyzing the calcium coal pellets in the pyrolysis chamber to obtain and output calcium coal carbonized pellets; introducing the crude coal gas generated by pyrolyzing the calcium coal pellets in the pyrolysis chamber into the plasma zone of the sliding arc reforming oxidation system reactor, and introducing a preset volume of gas oxidant into the sliding arc reforming oxidation system reactor at the same time, so that the gas oxidant is mixed with the crude coal gas; S3, plasma inducing the crude coal gas and causing a reforming oxidation reaction to generate high-temperature crude synthesis gas, and the high-temperature crude synthesis gas is conveyed to a crude synthesis gas purification unit and the pyrolysis chamber, respectively; the method for preparing calcium coal carbonized pellets has the advantages of low cost, environmental protection and high added value.

An electrostatic field dust removal device, comprising: at least one negative electrode plate (10) for releasing negative charges; at least one positive electrode plate (20) alternately arranged in parallel with the at least one negative electrode plate (10) and used for receiving the negative charges released by the at least one negative electrode plate (10), wherein an electrostatic dust removal region and a glow plasma region are formed between each negative electrode plate (11) among the at least one negative electrode plate (10) and each positive electrode plate (21) among the at least one positive electrode plate (20); and exhaust gas flows between each negative electrode plate (11) and each positive electrode plate (21) and is alternately purified, wherein the exhaust gas undergoes corona-based purification in the electrostatic dust removal region and is ionized in the glow plasma region.

This invention relates to power MOSFETs, and particularly to a double-buried-gate power MOSFET structure based on charged plasma. From top to bottom, it includes a p-type body region and an n-type drift region. Polysilicon layers with oxide coatings are respectively disposed at the upper, lower, and inner surfaces of the n-type drift region. n+ charged plasma regions are formed at the left and right ends of the p-type body region, and a p+ charged plasma region is formed at the top of the p-type body region. The substrate is metallized to form the drain. The outer polysilicon gate layer is metallized to form the gate. The outer side of the n+ charged plasma region is metallized to form the first source, and the p+ charged plasma region is metallized to form the second source. Compared with existing VDMOS structures, this invention has a smaller thermal budget, lower manufacturing complexity, lower on-resistance and charge, higher power density, and better high-frequency performance.

The invention discloses an anti-agglomeration device and method for barium titanate production. The anti-agglomeration device comprises a fluidized bed vertically fixed to the ground, and the fluidized bed is sequentially provided with an expansion section, a bed body and an air chamber from top to bottom; a feed port is vertically formed in the top of the expanding section, and an air outlet is formed in the outer circumferential side wall of the expanding section in the radial direction; a group of atomizing nozzles are uniformly arranged in the bed body along the inner circumferential side wall of the bed body; an air inlet is formed in the outer side wall of the air chamber in the radial direction, and a first discharging port is vertically formed in the bottom of the air chamber. A plasma modifier fixed on the ground is arranged on one side of the fluidized bed, and a thermal insulation pipe is arranged between the plasma modifier and the fluidized bed; the fluidized bed, the atomizing nozzle and the high-frequency ultrasonic vibration plate are adopted, so that double agglomeration breaking through the thermal stress and the cavitation effect is achieved; in the invention, a plasma modifier is also adopted, Ar is excited by radio frequency to generate low-temperature plasma, HMDS steam is introduced into a plasma region, and an in-situ vapor deposition reaction is initiated on the surface of the BaTiO3 powder.

The proposed vacuum device and the method for producing multilayer thin-film optical coatings therein can be used in industrial production of precision optical products comprising multilayer thin-film coatings having one hundred or more layers. The vacuum device differs from known prototypes of similar purpose in that an even number of magnetrons is installed in the process chamber, each capable of moving within its placement plane, and two magnetrons forming a magnetron sputtering system are equipped with targets made of identical materials. Plasma sources assisting the operation of the magnetron sputtering systems are mounted on the side walls of the vacuum process chamber above the working surfaces of the targets, and holders for securing the substrates are mounted on the side walls of the vacuum process chamber at the level of the target working surfaces. According to the proposed coating production method, a magnetron sputtering process assisted by plasma sources is used, wherein plasma is generated throughout the entire volume of the vacuum process chamber, and coatings are deposited onto preheated substrates fixed on holders in a planetary mechanism. The substrates move through the high-density plasma zone alternately passing through sputtering and oxidation zones, and the optical thickness of the coatings is measured end-to-end using an optical control system.

The application relates to the field of medical suture needle surface treatment technology, in particular to a processing method for ion nitriding of an austenitic stainless steel medical suture needle, wherein the S4-processed medical suture needle is placed at a cathode plate of an ion nitriding furnace, an anode plate covers the needle tip of the medical suture needle, the ion nitriding furnace is set to a voltage of 550 V and an air pressure of 300 Pa, nitriding is carried out for 1 hour, the temperature is controlled between 350 DEG C and 430 DEG C according to the size of the medical suture needle, the process gas ratio adopts two ratios of N2:H2=1:9 or N2:H2=1:3, and the surface hardness of the nitriding layer of the medical suture needle is HV750-1200. In the application, the anode plate covers the needle tip of the medical suture needle, a plasma zone is formed between the needle tip of the medical suture needle and the anode plate, nitrogen ions are high-speed bombarded on the surface of the needle tip under the action of an electric field and are penetrated into the surface, rapid nitriding of the needle tip part is achieved, the hardness and puncture sharpness of the needle tip are improved, and the needle body and the needle tail have lower hardness and higher toughness.

The invention relates to the technical field of rare earth-doped composite alloy preparation, in particular to a high-temperature-resistant rare earth-doped composite alloy material and a preparation method thereof.The preparation method comprises the steps that a consumable electrode is smelted; the reduction amount of the melting speed of the consumable electrode in the smelting process is obtained, and the vacuum pumping speed is adjusted; the falling length of molten drops is obtained, and the direction of an induced magnetic field of a plasma area vertically below the consumable electrode is determined; the stirring rotating speed of the electromagnetic stirring mechanism is determined according to the length ratio of time sections with opposite magnetic field directions in the induced magnetic field direction and the electromagnetic stirring magnetic field direction; a molten pool splashing plane image is obtained, the height section of the corresponding impurities on the consumable electrode is determined, and the working current in the smelting process is adjusted according to the height section; and after the smelting process is completed according to the working current, a generated cast ingot is subjected to thermal machining and heat treatment, and the high-temperature-resistant rare earth-doped composite alloy material is formed. The preparation efficiency of the rare earth doped composite alloy is improved.

An example method includes providing a wide bandgap semiconductor workpiece. The example method includes exposing the wide bandgap semiconductor workpiece to one or more electrical discharges from an electrical discharge machining (EDM) system to reduce a surface roughness of the wide bandgap semiconductor workpiece. Exposing the wide bandgap semiconductor workpiece to the one or more electrical discharges may include submerging a surface of the wide bandgap semiconductor workpiece in a dielectric fluid; positioning an electrode head relative to the surface such that a gap is defined between an end of the electrode head and the surface; and generating an electrical discharge across the gap to create a plasma zone within the gap such that a material is removed from the surface.

The application discloses a high-quality single-walled carbon nanotube preparation method and a preparation device thereof, relates to the technical field of single-walled carbon nanotube material preparation, and comprises the following steps: after system vacuumization, arc starting gas is introduced to form stable high-temperature plasma torch; composite catalyst carrier gas and carbon source carrier gas are separately introduced in a branched manner; the composite catalyst and the carbon source are respectively transported to the high-temperature plasma zone to realize atomic-level uniform mixing and rapid melting and gasification; then, nucleation and growth are carried out in a temperature-controllable growth temperature zone; and single-walled carbon nanotubes are obtained through rapid quenching and gas-solid separation. The application breaks through the use limitation of catalysts in the existing preparation technology, is compatible with various catalyst forms, has strong carbon source adaptability, controllable process and high preparation efficiency, and the obtained product has low defect density, high graphitization degree and high length-diameter ratio, and can realize continuous and large-scale production and is suitable for high-end application fields such as new energy and electronic devices.