14 results about "Plasma zone" patented technology

This invention relates to the technical field of atmospheric control and air treatment, and discloses a waste gas treatment device based on the synergistic effect of low-temperature plasma and catalyst. The device includes a waste gas treatment unit, which sequentially passes waste gas through a plasma ionization zone and a catalytic zone. The plasma ionization zone ionizes the waste gas, while the catalytic zone further oxidizes or decomposes any incompletely degraded intermediate products after passing through the plasma zone. An outlet end is provided on the waste gas treatment unit, and an outlet unit is located at the outlet end. A film-breaking unit, during the waste gas treatment process, drives a permanent magnet ball to rotate, causing the permanent magnet ball to intermittently approach or move away from a spring, thus causing the spring to vibrate and preventing the formation of a gas film on the inner wall of the inlet end, thereby avoiding changes in the inlet end pipe diameter.

The present invention provides a manufacturing method for optical fiber preforms that satisfies one or more of the following criteria: a method that produces as little manufacturing waste as possible, a method that produces a preform with the most uniform doping possible, a method that is as simple as possible to implement, and a method that is as cost-effective as possible. [Solution] A method for manufacturing an optical fiber matrix includes: a step of synthesizing glass particles using a plasma zone generated by a plasma generator; b step of repeatedly moving the glass matrix forward and backward in the axial direction relative to the plasma generator while the glass matrix is ​​rotating, wherein the forward and backward movement is performed at a relative supply speed between two reversal points; and c step of depositing glass particles on the glass matrix while the glass matrix is ​​moving and rotating relative to the plasma generator.

A method for producing an optical fiber preform, comprising the method steps of synthesizing glass particles using a plasma zone generated by a plasma generator; repeatedly moving a glass preform axially forward and backward relative to the plasma generator during a rotational movement of the glass preform, wherein the forward and backward movement takes place between two reversal points at a relative feed rate; and, depositing the glass particles on the glass preform while the glass preform moves and rotates relative to the plasma generator.

The invention relates to a method for manufacturing an optical fiber preform, the method comprising the steps of: a. synthesizing glass particles using a plasma zone generated by a plasma generator; b. repeatedly moving a glass preform axially forward and backward relative to the plasma generator during a rotational movement of the glass preform, wherein the forward and backward movements occur between two reversal points at a relative feed rate; c. depositing the glass particles on the glass preform while the glass preform is moving and rotating relative to the plasma generator.

The invention relates to a method for plasma coating of an object comprising an object profile, comprising the steps of: a. providing an exchangeable shroud (2) comprising a jet inlet (22), a nozzle outlet (24) and a sidewall (21) extending from the jet inlet to the nozzle outlet, wherein the nozzle outlet comprises an edge (25) substantially coinciding with at least a part of the object profile, and whereby the shroud comprises an identification means, preferably in relation to the nozzle outlet edge; b. detachably attaching the exchangeable shroud to a jet outlet of a plasma jet generator; c. placing the object at the nozzle outlet such that the object profile fits the nozzle outlet edge within a distance of at least 0.1 mm and preferably at most 5 mm, thereby minimizing the gap between the nozzle outlet and the object; d. plasma coating the object with a low-temperature, oxygen-free plasma at an operating pressure higher than atmospheric pressure, preferably at most 10% above atmospheric pressure, by providing a plasma jet in the shroud via the plasma jet generator and injecting a coating precursor into the plasma jet in the shroud, thereby generating said operating pressure, thereby plasma coating the object in an oxygen-deficient plasma zone, whereby the method comprises the additional step of identifying the provided shroud prior to providing the plasma jet.

The invention discloses a pathology department environment disinfection and killing system based on discharge plasma active water. The pathology department environment disinfection and killing system comprises a solar power supply module, a plasma active water preparation module, a microbubble regulation and control module, a water storage module, an ultrasonic atomization module, a spraying module and a monitoring and control module. The system adopts a discharge structure of a high-voltage electrode and a grounding electrode, and a plasma region is formed between the electrodes and acts with a water body to generate plasma active water; different types of acidic or nearly neutral active water can be obtained through microbubble regulation and control, so that pathogenic microorganisms can be quickly killed, and toxic macromolecules can be effectively degraded. The prepared plasma active water is uniformly sprayed to the environment after being subjected to ultrasonic atomization, so that the comprehensive coverage of the space of the pathology department is realized. The system realizes automatic regulation and control through pH, water level and environment humidity monitoring, and can adopt solar energy to supply power so as to reduce energy consumption.

The present invention relates to plasma assisted production of carbon black. Particularly, the present invention relates to a method and a reactor, wherein the carbon black feedstock can be injected in multiply positions in the carbon black reactor to avoid droplets in the plasma zone.

The present application relates to the technical field of preparing calcium coal carbonized pellets, in particular to a method for preparing calcium coal carbonized pellets by pyrolysis using a sliding arc plasma system, comprising the following steps: S1, conveying quicklime and raw coal to a calcium coal pellet preparation unit, and conveying the formed calcium coal pellets to a pyrolysis chamber; S2, pyrolyzing the calcium coal pellets in the pyrolysis chamber to obtain and output calcium coal carbonized pellets; introducing the crude coal gas generated by pyrolyzing the calcium coal pellets in the pyrolysis chamber into the plasma zone of the sliding arc reforming oxidation system reactor, and introducing a preset volume of gas oxidant into the sliding arc reforming oxidation system reactor at the same time, so that the gas oxidant is mixed with the crude coal gas; S3, plasma inducing the crude coal gas and causing a reforming oxidation reaction to generate high-temperature crude synthesis gas, and the high-temperature crude synthesis gas is conveyed to a crude synthesis gas purification unit and the pyrolysis chamber, respectively; the method for preparing calcium coal carbonized pellets has the advantages of low cost, environmental protection and high added value.

An electrostatic field dust removal device, comprising: at least one negative electrode plate (10) for releasing negative charges; at least one positive electrode plate (20) alternately arranged in parallel with the at least one negative electrode plate (10) and used for receiving the negative charges released by the at least one negative electrode plate (10), wherein an electrostatic dust removal region and a glow plasma region are formed between each negative electrode plate (11) among the at least one negative electrode plate (10) and each positive electrode plate (21) among the at least one positive electrode plate (20); and exhaust gas flows between each negative electrode plate (11) and each positive electrode plate (21) and is alternately purified, wherein the exhaust gas undergoes corona-based purification in the electrostatic dust removal region and is ionized in the glow plasma region.

This invention relates to power MOSFETs, and particularly to a double-buried-gate power MOSFET structure based on charged plasma. From top to bottom, it includes a p-type body region and an n-type drift region. Polysilicon layers with oxide coatings are respectively disposed at the upper, lower, and inner surfaces of the n-type drift region. n+ charged plasma regions are formed at the left and right ends of the p-type body region, and a p+ charged plasma region is formed at the top of the p-type body region. The substrate is metallized to form the drain. The outer polysilicon gate layer is metallized to form the gate. The outer side of the n+ charged plasma region is metallized to form the first source, and the p+ charged plasma region is metallized to form the second source. Compared with existing VDMOS structures, this invention has a smaller thermal budget, lower manufacturing complexity, lower on-resistance and charge, higher power density, and better high-frequency performance.

The proposed vacuum device and the method for producing multilayer thin-film optical coatings therein can be used in industrial production of precision optical products comprising multilayer thin-film coatings having one hundred or more layers. The vacuum device differs from known prototypes of similar purpose in that an even number of magnetrons is installed in the process chamber, each capable of moving within its placement plane, and two magnetrons forming a magnetron sputtering system are equipped with targets made of identical materials. Plasma sources assisting the operation of the magnetron sputtering systems are mounted on the side walls of the vacuum process chamber above the working surfaces of the targets, and holders for securing the substrates are mounted on the side walls of the vacuum process chamber at the level of the target working surfaces. According to the proposed coating production method, a magnetron sputtering process assisted by plasma sources is used, wherein plasma is generated throughout the entire volume of the vacuum process chamber, and coatings are deposited onto preheated substrates fixed on holders in a planetary mechanism. The substrates move through the high-density plasma zone alternately passing through sputtering and oxidation zones, and the optical thickness of the coatings is measured end-to-end using an optical control system.

The application relates to the field of medical suture needle surface treatment technology, in particular to a processing method for ion nitriding of an austenitic stainless steel medical suture needle, wherein the S4-processed medical suture needle is placed at a cathode plate of an ion nitriding furnace, an anode plate covers the needle tip of the medical suture needle, the ion nitriding furnace is set to a voltage of 550 V and an air pressure of 300 Pa, nitriding is carried out for 1 hour, the temperature is controlled between 350 DEG C and 430 DEG C according to the size of the medical suture needle, the process gas ratio adopts two ratios of N2:H2=1:9 or N2:H2=1:3, and the surface hardness of the nitriding layer of the medical suture needle is HV750-1200. In the application, the anode plate covers the needle tip of the medical suture needle, a plasma zone is formed between the needle tip of the medical suture needle and the anode plate, nitrogen ions are high-speed bombarded on the surface of the needle tip under the action of an electric field and are penetrated into the surface, rapid nitriding of the needle tip part is achieved, the hardness and puncture sharpness of the needle tip are improved, and the needle body and the needle tail have lower hardness and higher toughness.

The invention relates to the technical field of rare earth-doped composite alloy preparation, in particular to a high-temperature-resistant rare earth-doped composite alloy material and a preparation method thereof.The preparation method comprises the steps that a consumable electrode is smelted; the reduction amount of the melting speed of the consumable electrode in the smelting process is obtained, and the vacuum pumping speed is adjusted; the falling length of molten drops is obtained, and the direction of an induced magnetic field of a plasma area vertically below the consumable electrode is determined; the stirring rotating speed of the electromagnetic stirring mechanism is determined according to the length ratio of time sections with opposite magnetic field directions in the induced magnetic field direction and the electromagnetic stirring magnetic field direction; a molten pool splashing plane image is obtained, the height section of the corresponding impurities on the consumable electrode is determined, and the working current in the smelting process is adjusted according to the height section; and after the smelting process is completed according to the working current, a generated cast ingot is subjected to thermal machining and heat treatment, and the high-temperature-resistant rare earth-doped composite alloy material is formed. The preparation efficiency of the rare earth doped composite alloy is improved.

An example method includes providing a wide bandgap semiconductor workpiece. The example method includes exposing the wide bandgap semiconductor workpiece to one or more electrical discharges from an electrical discharge machining (EDM) system to reduce a surface roughness of the wide bandgap semiconductor workpiece. Exposing the wide bandgap semiconductor workpiece to the one or more electrical discharges may include submerging a surface of the wide bandgap semiconductor workpiece in a dielectric fluid; positioning an electrode head relative to the surface such that a gap is defined between an end of the electrode head and the surface; and generating an electrical discharge across the gap to create a plasma zone within the gap such that a material is removed from the surface.