Preparation method of three-dimensional TiO2 crystal film

A crystal film, three-dimensional technology, applied in the field of preparation of three-dimensional TiO2 crystal film, can solve the problems of dense film, difficulty in obtaining regular shape, single crystal size, large free path of particles, etc., and achieve simple equipment, low price and low pollution Effect
CN102418089AInactive Publication Date: 2012-04-18DONGHUA UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
DONGHUA UNIV
Publication Date
2012-04-18
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a preparation method of a three-dimensional TiO2 crystal film. The method comprises steps of: letting discharge gas in medium block discharge plasma reactor by employing a normal pressure low temperature radio frequency medium block glow discharge method; the discharge gas discharging to generate plasma jet by radio frequency alternating current; sending a precursor and carrying gas to a plasma zone to carry out reaction and precipitate on a substrate, so as to obtain the three-dimensional TiO2 crystal film. The method is characterized in that the precipitate is inner glow precipitate. The TiO2 obtained by the invention has a large proportion of {001} active surface and a unique three-dimensional structure forming by intersecting growth of a {101} surface, a {001} surface and a {101} surface; and the titanium dioxide film irradiates strong visible fluorescence by excitation of laser of 325 nm wavelength at room temperature.
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Description

technical field

[0001] The invention relates to a three-dimensional TiO 2 The preparation method of crystal film, specifically relates to a kind of atmospheric pressure low-temperature radio frequency glow plasma chemical vapor deposition to prepare high reactivity three-dimensional TiO 2 The method for a crystal film belongs to the technical field of thin film materials. Background technique

[0002] TiO 2 It is an excellent semiconductor photocatalytic material. The material has the advantages of good chemical stability, non-toxicity, and strong oxidation under light induction. It has shown good application prospects in energy and environment, and has been used in water splitting and dye-sensitized solar cells (DSSCs). ) aspect has been applied. in TiO 2 The following reactions exist in the process of cracking water to produce hydrogen:

[0003] (TiO 2 electrode) (1)

[0004] (counter electrode) (2)

[0005] (counter electrode) (3)

[0006] (total respo...

Claims

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