1382 results about "Dielectric barrier discharge" patented technology

Embodiments of the invention provide processes to selectively form a cobalt layer on a copper surface over exposed dielectric surfaces. In one embodiment, a method for capping a copper surface on a substrate is provided which includes positioning a substrate within a processing chamber, wherein the substrate contains a contaminated copper surface and a dielectric surface, exposing the contaminated copper surface to a reducing agent while forming a copper surface during a pre-treatment process, exposing the substrate to a cobalt precursor gas to selectively form a cobalt capping layer over the copper surface while leaving exposed the dielectric surface during a vapor deposition process, and depositing a dielectric barrier layer over the cobalt capping layer and the dielectric surface. In another embodiment, a deposition-treatment cycle includes performing the vapor deposition process and subsequently a post-treatment process, which deposition-treatment cycle may be repeated to form multiple cobalt capping layers.

A UV irradiation apparatus for processing a semiconductor substrate includes: a UV lamp unit having at least one dielectric barrier discharge excimer lamp which is constituted by a luminous tube containing a rare gas wherein an inner surface of the luminous tube is coated with a fluorescent substance having a peak emission spectrum in a wavelength range of 190 nm to 350 nm; and a reaction chamber disposed under the UV lamp unit and connected thereto via a transmission window.

The object of this invention is to prevent surface discharge even when a high voltage is applied in a dielectric-barrier discharge lamp or a capacitively coupled high frequency discharge lamp with no electrodes in a discharge space. Ribbon foil electrodes 3 are embedded in the wall of a quartz discharge vessel 1. The discharge vessel 1 is disposed such that the foil electrodes 3 face each other on both sides of the axis of the quartz discharge vessel 1. It may be disposed such that the foil electrodes 3 have a truncated V-shaped cross-section. The single tube quartz discharge vessel 1 is filled with discharge gas to form excimer molecules by dielectric barrier discharge or capacitively coupled high-frequency discharge.

It is provided a dielectric barrier discharge lamp (10) for providing ultraviolet light, comprising an outer tube (12) filled with a discharge gas for providing ultraviolet light, an inner tube (14) arranged at least partially inside the outer tube (12), an outer electrode (16) electrically connected to the outer tube (12) and an inner electrode (18) electrically connected to the inner tube (14), wherein the inner electrode (18) comprises a conductor (20) and a plurality of an conductive granulated material (22) for providing an electrical contact between the conductor (20) and the inner tube (14). Due to the conductive granulated material (22) an electrical contact between the conductor (20) and the inner tube (14) is safeguarded and different thermal expansions of the inner electrode (18) and the inner tube (14) are compensated at the same time without applying mechanical stress to the inner tube (14). This leads to a dielectric barrier discharge lamp (10), which comprises an increased life time without the need for external cooling.

A resistive random access memory device formed on a semiconductor substrate comprises an interlayer dielectric having a via formed therethrough. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A barrier metal liner lines walls of the via. A conductive plug is formed in the via. A first barrier metal layer is formed over the chemical-mechanical-polishing stop layer and in electrical contact with the conductive plug. A dielectric layer is formed over the first barrier metal layer. An ion source layer is formed over the dielectric layer. A dielectric barrier layer is formed over the ion source layer, and includes a via formed therethrough communicating with the ion source layer. A second barrier metal layer is formed over the dielectric barrier layer and in electrical contact with the ion source layer. A metal interconnect layer is formed over the barrier metal layer.

A process for the in-flight surface treatment of powders using a Dielectric Barrier Discharge Torch operating at atmospheric pressures or soft vacuum conditions is described herein. The process comprising feeding a powder material into the Dielectric Barrier Discharge Torch yielding powder particles exhibiting a reduced powder agglomeration feature; in-flight modifying the surface properties of the particles; and collecting coated powder particles. An apparatus for surface treating micro- and nanoparticles comprising a Dielectric Barrier Discharge Torch operating at atmospheric pressure or soft vacuum conditions is also described herein.

The invention discloses a device and a method for preparing hydrogen through temperature controlled continuous decomposition of hydrogen sulfide, belongs to the technical field of hydrogen preparation and gas purification, and relates to a dielectric barrier discharge temperature controllable plasma generating device and a method for preparing hydrogen through continuous and stable ionizing decomposition of a hydrogen sulfide gas or a gas containing hydrogen sulfide by using the device. The device is characterized in that a reactor has a coaxial sleeve type structure, a cylinder of the reactor is made of an insulating medium, a central electrode is formed by a metal, a grounding electrode is formed by a temperature controllable circulating liquid, and decomposed sulfur is separated through temperature control, so that continuous and stable operation of preparing the hydrogen through the decomposition of the hydrogen sulfide is ensured. The invention has the advantages that the method is suitable for preparing the hydrogen and elemental sulfur by dissociating the gases containing the hydrogen sulfide in chemical industries of natural gas, petroleum and coal; and the method does not have special requirement or limitation for the source and the composition of the gases, so the method has universal applicability for preparing the hydrogen and the elemental sulfur through the decomposition of the hydrogen sulfide.

A dielectric barrier discharge apparatus for treating a substrate includes a first planar electrode; a dielectric layer disposed on a surface of the first planar electrode; a porous planar electrode spaced above and in a parallel plane with the dielectric layer, wherein the porous planar electrode has a geometric transmission factor greater than 70 percent; and a power supply in electrical communication with the first electrode and the second electrode. A process for treating a substrate includes exposing the substrate surface to reactants produced by the dielectric barrier discharge apparatus.

A power system for a dielectric barrier discharge system, such as used for generating ozone, can include a full bridge inverter stage and parallel resonant tank outputting a signal for powering a dielectric barrier discharge cell stack. The inverter stage is controlled using a combination of pulse width modulation (PWM) and frequency modulation (FM) to enable soft switching through all load conditions—from full load to light load. A current control loop error amplifier compensator can provide a duty cycle adjustment signal to a phase shift PWM controller chip that generates the switching signals for the inverter stage. A feedback signal is also used to adjust a clock frequency time constant of the PWM controller chip to provide the FM. In one embodiment, the feedback signal is an output of an inverting amplifier connected at an output of the current control loop error amplifier compensator.

The invention relates to a method for treating plant seeds by plasmas and a device for realizing the method. The plasmas of the invention are cold plasmas generated by dielectric barrier discharge under the atmospheric pressure, wherein the cold plasmas are generated in the air; the working air pressure is the atmospheric pressure; an electric source for the dielectric barrier discharge is a high-frequency and high-voltage electric source with the frequency range from 50 Hz to 20 kHz and the voltage range from 1 kV to 10 kV; and the plant seeds are treated by the plasmas for 5 to 129 sec. Thedevice for realizing the seed treating method of the invention comprises a seed treating cavity, a plasma generator for generating the plasmas in the seed treating cavity and a transmitting device capable of controlling the retention time of the seeds in the seed treating cavity. The treating operation on the plant seeds by using the atmospheric-pressure plasmas does not refer to DNA recombination, does not relate to structural genovariation of the plant seeds, and cannot cause hazards. The method only denatures the plant seeds to make the advantages become more prominent.

The invention relates to an experimental apparatus for acquiring large-area uniform discharge plasmas, which belongs to the technical field of plasmas. The experimental apparatus comprises a bipolar nanosecond pulse power supply, a reactor, multi-needle-to-plate electrodes, a gas distribution system, a spectral measurement system and a discharge measurement system, wherein the bipolar nanosecond pulse power supply drives dielectric barrier discharge of air and other gas mixtures among the multi-needle-to-plate electrodes in the reactor, and the gas mixtures are input to the reactor through the gas distribution system; the spectral measurement system collects photonic information of plasma discharge in real time and inputs the photonic information to a computer for spectral analysis; and the discharge measurement system collects discharge voltage and current of the high-voltage nanosecond pulse power supply in real time, and the discharge voltage and current are displayed through a digital oscilloscope. By virtue of the bipolar nanosecond narrow-pulse power supply, the large-area discharge plasmas are generated without a magnetic field; and the generated plasmas are uniform, diffusive, high in electron density, high in energy utilization ratio, low in energy consumption and easy to control in a discharge process.

A jetting device for a low-temperature plasma generated by the atmospheric dielectric barrier discharge relates to the technical field of the application of gas discharge plasma. Inert gas and air are used as working gas; the plasma generated in a discharge area is blown out in the form of jet; the problem of limited application range caused by the narrow parallel-plate dielectric barrier discharge area and a high plasma macroscopic temperature can be solved. The device has the structural characteristics that a hollow pipe-shaped connector is connected with a hollow dielectric pipe; an electrode coated with insulation dielectric is fixed at the center of the dielectric pipe; an annular electrode is closely attached to the outer wall of the dielectric pipe; the working gas enters the dielectric pipe from a flow meter and a retaining valve through the connector; the plasma is blown out to form the plasma jetting. The jetting device has the advantages of low plasma macroscopic temperature, large electron energy, wide expanded range, low cost, low energy consumption and high reliability; furthermore, the jetting device can used in the fields of sterilization and disinfection, the surface modification of complex-shaped material, waste gas treatment, ozone synthesis, as well as the physical and chemical fields of the discharge light source plasma.

A new and novel ozone generator with a dual dielectric barrier discharge design is disclosed where high-purity ozone is generated and whose concentration can be varied over a wide range. The simplified design of the ozone generator cell possesses a gas inlet and outlet connected to an annular, sealed dielectric gas envelope that supports both inner and outer electrodes that do not come into contact with the gas. The design eliminates the need for gaskets, o-rings or other methods applied to seal the ozone cell and reduces problems associated with potential interaction resulting from material compatability issues. The applied high voltage is provided by a simple self-resonating, push-pull oscillating circuit whose efficiency is optimized through application of an appropriate impedance matching device. The ozone is concentration is adjusted by varying the pulse width duty cycle of the applied voltage and gas flow rate. The design configuration of the ozone generating cell also eliminates the need for forced air or liquid cooling by natural convective air currents and conductive means.

A disinfecting device is proposed that is well suited for household and outdoor use. The device comprises a container housing 12 with an interior volume 24, which may contain an object or a liquid to be disinfected. The container housing 12 comprises a side wall 16 and an end cover 14. A dielectric barrier discharge lamp 32 is provided for emitting ultraviolet light into the volume 24. The lamp 32 comprises a lamp vessel 34 with gas filling and electrodes 42, 44 arranged electrically insulated from the gas filling. An alternating voltage applied to the electrodes 42, 44 causes a discharge in the gas filling. The lamp vessel 34 has a planar window from which during the discharge ultraviolet light 46 is emitted. The window is arranged in the end cover 14.

A method for non-thermal plasma aftertreatment of exhaust gases the method comprising the steps of providing short risetime (about 40 ps), high frequency (about 5G hz), high power bursts of low-duty factor microwaves sufficient to generate a dielectric barrier discharge and passing a gas to treated through the discharge so as to cause dissociative reduction of the exhaust gases. The invention also includes a reactor for generating the non-thermal plasma.

Systems, apparatus, and program product and methods for controlling boundary layer flow across an aerodynamic structure which can produce separate regions of flow structures at different strengths by means of dielectric-barrier-discharge (DBD) type plasmas, are provided. An example of such apparatus provides plasma regions that are capable of being individually controlled by voltage and/or frequency, and modulated for the purposes of flow control. The apparatus includes an electrode assembly fitted with electrodes on either side of a dielectric such that different electrode geometries and arrangements create isolated regions of plasmas which results in separate regions of flow structures. These regions may be further controlled and modulated by the use of electronic-switching to produce irregularly shaped flow structures and strengths including those having a primarily vertical component.

The invention provides a dielectric barrier discharge water treatment device and method, belonging to the technical field of a water treatment device and method. The device comprises a high-voltage high-frequency pulse power supply, a reactor shell, a column high-voltage electrode, a cylindrical submerged low-voltage electrode, a vermiculite-supported titanium dioxide catalyst, a dielectric barrier layer and a microporous aeration membrane. The method comprises the following steps: adding a solution to be treated, and applying a high-voltage pulse voltage between the column high-voltage electrode and the cylindrical submerged low-voltage electrode, wherein the peak voltage is 1-100kV, and the frequency is 1-50KHz; and adjusting the inlet air quantity, and regulating the contact time between treated wastewater and active particles inside the reactor. An aerator is introduced into the water treatment device, and medium-activity substances generated by dielectric barrier plasma discharge can completely enter the solution to the treated through the aerator, so the water treatment device has the advantages of high mass-transfer efficiency and short required time; the method is stable in running and simple to operate, and can run under atmospheric pressure; and the equipment is easy to manage and has high practicality and economical efficiency.

The invention relates to a device and a method used for combined exhaust gas disposal of dielectric barrier discharge plasma oxidation/ solution absorption. In the method, the exhaust gas sequentially passes through a plasma area generated by a dielectric barrier discharge electrode system (1) and a solution absorption area in a water storage container (5), thus achieving the object of exhaust gas disposal. In the device, a power supply of the dielectric barrier discharge electrode system (1) is an AC high-voltage power supply which is provided with a high-voltage discharge electrode (6) and a low-voltage electrode (7); wherein, the high-voltage discharge electrode (6) is a metal rod electrode or a metal toroid electrode; the low-voltage electrode (7) is a cylindrical metal conductor which is sheathed on the external wall of an insulated medium pipe (8) or solution in the water storage container (5). The device and the method of the invention have the beneficial effects of simple principle, low technical difficulty, low cost, simple operation, high disposal efficiency, and generating no secondary pollution.

A method and an apparatus for plasma-chemical production of nitrogen monoxide is used to produce inhalation gas enriched with nitrogen monoxide for medical purposes. The nitrogen-monoxide production is achieved through the use of a dielectric barrier discharge created in a process gas containing nitrogen and oxygen.