Product
Patsnap Eureka
For R&D, Patsnap Eureka makes reading and utilizing patents & technical documents easy.
Patsnap Eureka AIR
Designed for self-driven R&D workflows. Generate viable solutions, solve complex R&D challenges, empower your innovation with AI.
Patsnap Eureka Materials
Designed for material experts only. Revolutionize your material R&D, from search, analyze, to developing new materials.
Feature
TechResearch
Generate reliable direction feasibility study reports for your R&D in just a few steps.
TechSeek
Discover and master advanced knowledge NOW. Basics, ideas, possibilities, all at once.
TechMind
As an expert in R&D Theories, TechMind can generates customized viable solutions instantly.
TechRisk
Analyze your overall solution with one click, know your potential R&D risks in advance.
TechMonitor
Get weekly tech updates, stay abreast of the latest tech innovations and key insights.
Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
1394 results about "Dielectric barrier discharge" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Dielectric-barrier discharge (DBD) is the electrical discharge between two electrodes separated by an insulating dielectric barrier. Originally called silent (inaudible) discharge and also known as ozone production discharge or partial discharge, it was first reported by Ernst Werner von Siemens in 1857. On right, the schematic diagram shows a typical construction of a DBD wherein one of the two electrodes is covered with a dielectric barrier material. The lines between the dielectric and the electrode are representative of the discharge filaments, which are normally visible to the naked eye. Below this, the photograph shows an atmospheric DBD discharge occurring in between two steel electrode plates, each covered with a dielectric (mica) sheet. The filaments are columns of conducting plasma, and the foot of each filament is representative of the surface accumulated charge.
Selective cobalt deposition on copper surfaces
InactiveUS20090269507A1Pretreated surfacesSemiconductor/solid-state device manufacturingGas phaseDielectric surface
Embodiments of the invention provide processes to selectively form a cobalt layer on a copper surface over exposed dielectric surfaces. In one embodiment, a method for capping a copper surface on a substrate is provided which includes positioning a substrate within a processing chamber, wherein the substrate contains a contaminated copper surface and a dielectric surface, exposing the contaminated copper surface to a reducing agent while forming a copper surface during a pre-treatment process, exposing the substrate to a cobalt precursor gas to selectively form a cobalt capping layer over the copper surface while leaving exposed the dielectric surface during a vapor deposition process, and depositing a dielectric barrier layer over the cobalt capping layer and the dielectric surface. In another embodiment, a deposition-treatment cycle includes performing the vapor deposition process and subsequently a post-treatment process, which deposition-treatment cycle may be repeated to form multiple cobalt capping layers.
Owner:APPLIED MATERIALS INC
Copper barrier reflow process employing high speed optical annealing
A method of forming a barrier layer for a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier metal on the surfaces of the high aspect ratio openings including the vertical side walls and depositing a metal barrier layer comprising the barrier metal on the first barrier layer. The method further includes reflowing the metal barrier layer by (a) directing light from an array of continuous wave lasers into a line of light extending at least partially across the thin film structure, and (b) translating the line of light relative to the thin film structure in a direction transverse to the line of light.
Owner:APPLIED MATERIALS INC
UV-Curing Apparatus Provided With Wavelength-Tuned Excimer Lamp and Method of Processing Semiconductor Substrate Using Same
InactiveUS20140099798A1Prevents unnecessary riseLow costMaterial analysis by optical meansSemiconductor/solid-state device manufacturingFluorescenceUltraviolet
A UV irradiation apparatus for processing a semiconductor substrate includes: a UV lamp unit having at least one dielectric barrier discharge excimer lamp which is constituted by a luminous tube containing a rare gas wherein an inner surface of the luminous tube is coated with a fluorescent substance having a peak emission spectrum in a wavelength range of 190 nm to 350 nm; and a reaction chamber disposed under the UV lamp unit and connected thereto via a transmission window.
Owner:ASM IP HLDG BV
Discharge lamp
InactiveUS20100259152A1Irradiation of becomes intensiveImprove reliabilityIncadescent screens/filtersSolid cathode detailsCapacitanceGas-discharge lamp
The object of this invention is to prevent surface discharge even when a high voltage is applied in a dielectric-barrier discharge lamp or a capacitively coupled high frequency discharge lamp with no electrodes in a discharge space. Ribbon foil electrodes 3 are embedded in the wall of a quartz discharge vessel 1. The discharge vessel 1 is disposed such that the foil electrodes 3 face each other on both sides of the axis of the quartz discharge vessel 1. It may be disposed such that the foil electrodes 3 have a truncated V-shaped cross-section. The single tube quartz discharge vessel 1 is filled with discharge gas to form excimer molecules by dielectric barrier discharge or capacitively coupled high-frequency discharge.
Owner:ORC MFG
Dielectric barrier discharge lamp
InactiveUS20100244688A1Easy to replaceExtended service lifeSolid cathode detailsGas discharge lamp detailsDielectric barrier dischargeEngineering
It is provided a dielectric barrier discharge lamp (10) for providing ultraviolet light, comprising an outer tube (12) filled with a discharge gas for providing ultraviolet light, an inner tube (14) arranged at least partially inside the outer tube (12), an outer electrode (16) electrically connected to the outer tube (12) and an inner electrode (18) electrically connected to the inner tube (14), wherein the inner electrode (18) comprises a conductor (20) and a plurality of an conductive granulated material (22) for providing an electrical contact between the conductor (20) and the inner tube (14). Due to the conductive granulated material (22) an electrical contact between the conductor (20) and the inner tube (14) is safeguarded and different thermal expansions of the inner electrode (18) and the inner tube (14) are compensated at the same time without applying mechanical stress to the inner tube (14). This leads to a dielectric barrier discharge lamp (10), which comprises an increased life time without the need for external cooling.
Owner:SIGNIFY HLDG BV
Front to back resistive random access memory cells
A resistive random access memory device formed on a semiconductor substrate comprises an interlayer dielectric having a via formed therethrough. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A barrier metal liner lines walls of the via. A conductive plug is formed in the via. A first barrier metal layer is formed over the chemical-mechanical-polishing stop layer and in electrical contact with the conductive plug. A dielectric layer is formed over the first barrier metal layer. An ion source layer is formed over the dielectric layer. A dielectric barrier layer is formed over the ion source layer, and includes a via formed therethrough communicating with the ion source layer. A second barrier metal layer is formed over the dielectric barrier layer and in electrical contact with the ion source layer. A metal interconnect layer is formed over the barrier metal layer.
Owner:MICROSEMI SOC
Dielectric passivation for semiconductor devices
ActiveUS7332795B2Semiconductor/solid-state device detailsSolid-state devicesSemiconductor materialsConduction band
Owner:CREE INC
Dielectric barrier layer films
InactiveUS20060071592A1Improve performanceImprove uniformityDischarge tube luminescnet screensElectroluminescent light sourcesElectrical resistance and conductancePulsed DC
In accordance with the present invention, a dielectric barrier layer is presented. A barrier layer according to the present invention includes a densified amorphous dielectric layer deposited on a substrate by pulsed-DC, substrate biased physical vapor deposition, wherein the densified amorphous dielectric layer is a barrier layer. A method of forming a barrier layer according to the present inventions includes providing a substrate and depositing a highly densified, amorphous, dielectric material over the substrate in a pulsed-dc, biased, wide target physical vapor deposition process. Further, the process can include performing a soft-metal breath treatment on the substrate. Such barrier layers can be utilized as electrical layers, optical layers, immunological layers, or tribological layers.
Owner:DEMARAY
Plasma surface treatment using dielectric barrier discharges
A process for the in-flight surface treatment of powders using a Dielectric Barrier Discharge Torch operating at atmospheric pressures or soft vacuum conditions is described herein. The process comprising feeding a powder material into the Dielectric Barrier Discharge Torch yielding powder particles exhibiting a reduced powder agglomeration feature; in-flight modifying the surface properties of the particles; and collecting coated powder particles. An apparatus for surface treating micro- and nanoparticles comprising a Dielectric Barrier Discharge Torch operating at atmospheric pressure or soft vacuum conditions is also described herein.
Owner:TEKNA PLASMA SYST INC
Hybrid-type air purifier for an automobile
InactiveUS20050142047A1Improve efficiencyImprove the bactericidal effectMaterial nanotechnologyMechanical apparatusHybrid typeAir purifiers
Air purifier systems particularly suitable for motor vehicles are provided that comprise an air flow passage; a glow discharging device; a photo-catalyst device; and a negative ion generator. Preferred air purifiers comprise a glow discharging device having mesh-structured electrodes which can purify air via dielectric barrier discharge, a photo-catalyst device that can further purify the air firstly purified by the glow discharging device, and a negative ion generator having nano tubes, which can treat the purified air with negative ions.
Owner:HYUNDAI MOTOR CO LTD +1
Device and method for preparing hydrogen through temperature controlled continuous decomposition of hydrogen sulfide
InactiveCN103204466AImprove uniformityContinuous and stable dischargeHydrogen productionChemical industryTemperature control
The invention discloses a device and a method for preparing hydrogen through temperature controlled continuous decomposition of hydrogen sulfide, belongs to the technical field of hydrogen preparation and gas purification, and relates to a dielectric barrier discharge temperature controllable plasma generating device and a method for preparing hydrogen through continuous and stable ionizing decomposition of a hydrogen sulfide gas or a gas containing hydrogen sulfide by using the device. The device is characterized in that a reactor has a coaxial sleeve type structure, a cylinder of the reactor is made of an insulating medium, a central electrode is formed by a metal, a grounding electrode is formed by a temperature controllable circulating liquid, and decomposed sulfur is separated through temperature control, so that continuous and stable operation of preparing the hydrogen through the decomposition of the hydrogen sulfide is ensured. The invention has the advantages that the method is suitable for preparing the hydrogen and elemental sulfur by dissociating the gases containing the hydrogen sulfide in chemical industries of natural gas, petroleum and coal; and the method does not have special requirement or limitation for the source and the composition of the gases, so the method has universal applicability for preparing the hydrogen and the elemental sulfur through the decomposition of the hydrogen sulfide.
Owner:BINZHOU UNIV
Dielectric barrier discharge plasma reactor cell
InactiveUS20030030374A1Gaseous chemical processesLighting and heating apparatusElectricityElectrical conductor
A dielectric barrier discharge plasma cell that generates a uniform, non-thermal plasma that is effective at neutralizing harmful agents. The cell is able to generate a uniform non-thermal plasma because it reduces arcing by controlling the distance between the conductor and dielectric, applying a low frequency alternating current voltage to the cell, and carefully applying the layers to the conductor and dielectric.
Owner:GTE GOVERNMENT SYST CORP
Dielectric barrier discharge apparatus and process for treating a substrate
InactiveUS6664737B1Improve responseEasy dischargeElectric discharge tubesElectric arc lampsPlanar electrodeOptoelectronics
A dielectric barrier discharge apparatus for treating a substrate includes a first planar electrode; a dielectric layer disposed on a surface of the first planar electrode; a porous planar electrode spaced above and in a parallel plane with the dielectric layer, wherein the porous planar electrode has a geometric transmission factor greater than 70 percent; and a power supply in electrical communication with the first electrode and the second electrode. A process for treating a substrate includes exposing the substrate surface to reactants produced by the dielectric barrier discharge apparatus.
Owner:AXCELIS TECHNOLOGIES
Versatile zero-voltage switch resonant inverter for industrial dielectric barrier discharge generator applications
ActiveUS20130257311A1Improve dynamic rangeImprove stabilityElectrical apparatusElectroluminescent light sourcesResonant inverterSoft switching
A power system for a dielectric barrier discharge system, such as used for generating ozone, can include a full bridge inverter stage and parallel resonant tank outputting a signal for powering a dielectric barrier discharge cell stack. The inverter stage is controlled using a combination of pulse width modulation (PWM) and frequency modulation (FM) to enable soft switching through all load conditions—from full load to light load. A current control loop error amplifier compensator can provide a duty cycle adjustment signal to a phase shift PWM controller chip that generates the switching signals for the inverter stage. A feedback signal is also used to adjust a clock frequency time constant of the PWM controller chip to provide the FM. In one embodiment, the feedback signal is an output of an inverting amplifier connected at an output of the current control loop error amplifier compensator.
Owner:MKS INSTR INC
Process and apparatus for hydrogen and carbon production via carbon aerosol-catalyzed dissociation of hydrocarbons
The present invention relates to a novel process for sustainable, continuous production of hydrogen and carbon by catalytic dissociation or decomposition of hydrocarbons at elevated temperatures using in-situ generated carbon particles. Carbon particles are produced by decomposition of carbonaceous materials in response to an energy input. The energy input can be provided by at least one of a non-oxidative and oxidative means. The non-oxidative means of the energy input includes a high temperature source, or different types of plasma, such as, thermal, non-thermal, microwave, corona discharge, glow discharge, dielectric barrier discharge, or radiation sources, such as, electron beam, gamma, ultraviolet (UV). The oxidative means of the energy input includes oxygen, air, ozone, nitrous oxide (NO2) and other oxidizing agents. The method, apparatus and process of the present invention is applicable to any gaseous or liquid hydrocarbon fuel and it produces no or significantly less CO2 emissions compared to conventional processes.
Owner:UNIV OF CENT FLORIDA RES FOUND INC
Method for treating plant seeds by plasmas and device for realizing method
InactiveCN101669416AIncrease vitalityPromote germinationHorticulture methodsPlasma techniqueRetention timePlanting seed
The invention relates to a method for treating plant seeds by plasmas and a device for realizing the method. The plasmas of the invention are cold plasmas generated by dielectric barrier discharge under the atmospheric pressure, wherein the cold plasmas are generated in the air; the working air pressure is the atmospheric pressure; an electric source for the dielectric barrier discharge is a high-frequency and high-voltage electric source with the frequency range from 50 Hz to 20 kHz and the voltage range from 1 kV to 10 kV; and the plant seeds are treated by the plasmas for 5 to 129 sec. Thedevice for realizing the seed treating method of the invention comprises a seed treating cavity, a plasma generator for generating the plasmas in the seed treating cavity and a transmitting device capable of controlling the retention time of the seeds in the seed treating cavity. The treating operation on the plant seeds by using the atmospheric-pressure plasmas does not refer to DNA recombination, does not relate to structural genovariation of the plant seeds, and cannot cause hazards. The method only denatures the plant seeds to make the advantages become more prominent.
Owner:杨思泽
Experimental apparatus for acquiring large-area uniform discharge plasmas
InactiveCN103245655AIncrease electron densityImprove energy utilizationAnalysis by thermal excitationPlasma techniqueDischarge measurementsElectron density
The invention relates to an experimental apparatus for acquiring large-area uniform discharge plasmas, which belongs to the technical field of plasmas. The experimental apparatus comprises a bipolar nanosecond pulse power supply, a reactor, multi-needle-to-plate electrodes, a gas distribution system, a spectral measurement system and a discharge measurement system, wherein the bipolar nanosecond pulse power supply drives dielectric barrier discharge of air and other gas mixtures among the multi-needle-to-plate electrodes in the reactor, and the gas mixtures are input to the reactor through the gas distribution system; the spectral measurement system collects photonic information of plasma discharge in real time and inputs the photonic information to a computer for spectral analysis; and the discharge measurement system collects discharge voltage and current of the high-voltage nanosecond pulse power supply in real time, and the discharge voltage and current are displayed through a digital oscilloscope. By virtue of the bipolar nanosecond narrow-pulse power supply, the large-area discharge plasmas are generated without a magnetic field; and the generated plasmas are uniform, diffusive, high in electron density, high in energy utilization ratio, low in energy consumption and easy to control in a discharge process.
Owner:DALIAN UNIV OF TECH
Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium
InactiveCN101330794ASolve the problem of limited application rangeEasy to modifyPlasma techniquePlasma jetParallel plate
A jetting device for a low-temperature plasma generated by the atmospheric dielectric barrier discharge relates to the technical field of the application of gas discharge plasma. Inert gas and air are used as working gas; the plasma generated in a discharge area is blown out in the form of jet; the problem of limited application range caused by the narrow parallel-plate dielectric barrier discharge area and a high plasma macroscopic temperature can be solved. The device has the structural characteristics that a hollow pipe-shaped connector is connected with a hollow dielectric pipe; an electrode coated with insulation dielectric is fixed at the center of the dielectric pipe; an annular electrode is closely attached to the outer wall of the dielectric pipe; the working gas enters the dielectric pipe from a flow meter and a retaining valve through the connector; the plasma is blown out to form the plasma jetting. The jetting device has the advantages of low plasma macroscopic temperature, large electron energy, wide expanded range, low cost, low energy consumption and high reliability; furthermore, the jetting device can used in the fields of sterilization and disinfection, the surface modification of complex-shaped material, waste gas treatment, ozone synthesis, as well as the physical and chemical fields of the discharge light source plasma.
Owner:XI AN JIAOTONG UNIV
Ozone generator with dual dielectric barrier discharge and methods for using same
InactiveUS20050199484A1Electrical discharge ozone preparationEnergy based chemical/physical/physico-chemical processesPush pullEngineering
A new and novel ozone generator with a dual dielectric barrier discharge design is disclosed where high-purity ozone is generated and whose concentration can be varied over a wide range. The simplified design of the ozone generator cell possesses a gas inlet and outlet connected to an annular, sealed dielectric gas envelope that supports both inner and outer electrodes that do not come into contact with the gas. The design eliminates the need for gaskets, o-rings or other methods applied to seal the ozone cell and reduces problems associated with potential interaction resulting from material compatability issues. The applied high voltage is provided by a simple self-resonating, push-pull oscillating circuit whose efficiency is optimized through application of an appropriate impedance matching device. The ozone is concentration is adjusted by varying the pulse width duty cycle of the applied voltage and gas flow rate. The design configuration of the ozone generating cell also eliminates the need for forced air or liquid cooling by natural convective air currents and conductive means.
Owner:OLSTOWSKI FRANEK
UV disinfecting device
InactiveUS20120006995A1Efficient productionEffective treatmentInvestigating moving fluids/granular solidsScattering properties measurementsDielectric barrier dischargeEngineering
A disinfecting device is proposed that is well suited for household and outdoor use. The device comprises a container housing 12 with an interior volume 24, which may contain an object or a liquid to be disinfected. The container housing 12 comprises a side wall 16 and an end cover 14. A dielectric barrier discharge lamp 32 is provided for emitting ultraviolet light into the volume 24. The lamp 32 comprises a lamp vessel 34 with gas filling and electrodes 42, 44 arranged electrically insulated from the gas filling. An alternating voltage applied to the electrodes 42, 44 causes a discharge in the gas filling. The lamp vessel 34 has a planar window from which during the discharge ultraviolet light 46 is emitted. The window is arranged in the end cover 14.
Owner:KONINKLIJKE PHILIPS ELECTRONICS NV
Method for generating a highly reactive plasma for exhaust gas aftertreatment and enhanced catalyst reactivity
InactiveUS6190507B1Lower impedanceImprove responseInternal combustion piston enginesExhaust apparatusMicrowaveReactive plasma
A method for non-thermal plasma aftertreatment of exhaust gases the method comprising the steps of providing short risetime (about 40 ps), high frequency (about 5G hz), high power bursts of low-duty factor microwaves sufficient to generate a dielectric barrier discharge and passing a gas to treated through the discharge so as to cause dissociative reduction of the exhaust gases. The invention also includes a reactor for generating the non-thermal plasma.
Owner:THE UNITED STATES AS REPRESENTED BY THE DEPARTMENT OF ENERGY
Analyzer, ionization apparatus and analyzing method
ActiveUS20110253889A1Reduce sensitivityReduce loss rateParticle separator tubesMaterial analysis by optical meansExcited moleculeAtmospheric pressure
An analyzer performs dielectric barrier discharge and ionization of a sample by a reaction between the sample and excited molecules or ions generated by the dielectric barrier discharge at a pressure lower than an atmospheric pressure.
Owner:HITACHI HIGH-TECH CORP
System, apparatus, program product, and related methods for providing boundary layer flow control
ActiveUS20120193483A1Mitigate cross-flow instabilityStable flowWingsDrag reductionElectronic switchEngineering
Systems, apparatus, and program product and methods for controlling boundary layer flow across an aerodynamic structure which can produce separate regions of flow structures at different strengths by means of dielectric-barrier-discharge (DBD) type plasmas, are provided. An example of such apparatus provides plasma regions that are capable of being individually controlled by voltage and / or frequency, and modulated for the purposes of flow control. The apparatus includes an electrode assembly fitted with electrodes on either side of a dielectric such that different electrode geometries and arrangements create isolated regions of plasmas which results in separate regions of flow structures. These regions may be further controlled and modulated by the use of electronic-switching to produce irregularly shaped flow structures and strengths including those having a primarily vertical component.
Owner:LOCKHEED MARTIN CORP
Apparatus and method for processing a substrate
InactiveUS6631726B1Proceed efficientlyMinimizes contact angleMaterial analysis using wave/particle radiationElectric discharge tubesWater vaporUltraviolet lights
A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member [H.] and an oxidative active member [.OH].< / PTEXT>
Owner:HITACHI ELECTRONICS ENG CO LTD
Dielectric barrier discharge water treatment device and method
InactiveCN103482720AIncrease chance of contactImprove mass transfer efficiencyWater/sewage treatment by irradiationWater/sewage treatment by electrochemical methodsLow voltageHigh pressure
Owner:TAIYUAN UNIV OF TECH
Plasma surface treatment using dielectric barrier discharges
Owner:TEKNA PLASMA SYST INC
Method and apparatus for treating surface of substrate plate
InactiveUS6821906B2Decorative surface effectsSemiconductor/solid-state device manufacturingUltravioletOxygen
Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.
Owner:HITACHI ELECTRONICS ENG CO LTD
Double-dielectric barrier discharge low-temperature plasma generator
InactiveCN101835336AEvenly distributedImprove conversion efficiencyPlasma techniqueHigh energyLow voltage
The invention discloses a double-dielectric barrier discharge low-temperature plasma device, and belongs to the field of low-temperature plasma technology. The plasma device comprises an air inlet (1), a polytetrafluoroethylene plug (2), a low voltage electrode (3), a quartz glass tube A (4), a quartz glass tube B (5), a high voltage electrode (6) and an air outlet (7), wherein the outer layer of the high voltage electrode (6) is the quartz glass tube B (5), and the low voltage electrode (3) consists of constantan sheets and is led out by a lead wire and grounded. In the process of treating pollutant gas, the low-temperature plasma generator can effectively reduce the corrosion of air on the high voltage electrode and avoid generating arc discharge and further damaging or breaking down discharge dielectric layers. The formed double-dielectric barrier discharge has high stability and high energy density utilization rate. The low-temperature plasma device can stably work under normal pressure and is applied to the discharge of automotive noxious pollutant gas.
Owner:JIANGSU UNIV
Device for treating exhaust air in combination of dielectric barrier discharge plasma oxidation/solution absorption and method
InactiveCN101274213AThe principle is simpleEasy to operateDispersed particle separationWater storageElectrical conductor
The invention relates to a device and a method used for combined exhaust gas disposal of dielectric barrier discharge plasma oxidation / solution absorption. In the method, the exhaust gas sequentially passes through a plasma area generated by a dielectric barrier discharge electrode system (1) and a solution absorption area in a water storage container (5), thus achieving the object of exhaust gas disposal. In the device, a power supply of the dielectric barrier discharge electrode system (1) is an AC high-voltage power supply which is provided with a high-voltage discharge electrode (6) and a low-voltage electrode (7); wherein, the high-voltage discharge electrode (6) is a metal rod electrode or a metal toroid electrode; the low-voltage electrode (7) is a cylindrical metal conductor which is sheathed on the external wall of an insulated medium pipe (8) or solution in the water storage container (5). The device and the method of the invention have the beneficial effects of simple principle, low technical difficulty, low cost, simple operation, high disposal efficiency, and generating no secondary pollution.
Owner:DALIAN UNIV OF TECH
Apparatus for plasma-chemical production of nitrogen monoxide
InactiveUS6955790B2Overcome disadvantagesGas-gas reaction as plasma stateMedical devicesNitrogen monooxideNitrogen
A method and an apparatus for plasma-chemical production of nitrogen monoxide is used to produce inhalation gas enriched with nitrogen monoxide for medical purposes. The nitrogen-monoxide production is achieved through the use of a dielectric barrier discharge created in a process gas containing nitrogen and oxygen.
Owner:MAQUET CRITICAL CARE
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com