Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium

A low-temperature plasma, atmospheric pressure medium technology, applied in the direction of plasma, electrical components, etc., can solve the problems of high plasma temperature and limited industrial application scope, and achieve the effect of convenient modification treatment

Inactive Publication Date: 2008-12-24
XI AN JIAOTONG UNIV
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Problems solved by technology

However, the ordinary parallel flat-plate atmospheric pressure dielectric barrier discharge only occurs in a narrow area between the two plates, and at the same time limited by the plasma generation conditions, the temperature of the generated plasma is relatively high, so its industrial application range is limited. certain limitations

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  • Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium
  • Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium
  • Jet apparatus capable of blocking discharging from generating low temperature plasma by atmos medium

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Embodiment Construction

[0014] Below in conjunction with accompanying drawing, the present invention is described in further detail;

[0015] A jet device for generating low-temperature plasma by atmospheric-pressure dielectric barrier discharge, including a gas source 6, a flow meter 7, and a check valve 8, which are sequentially connected through pipelines, and are provided with electrodes and a power supply, and one end of a hollow tubular connector 1 passes through the The pipeline is connected to the check valve 8, and its other end is airtightly connected to one end of the hollow medium pipe 2. The connector 1 can be made of insulating material or a combination of metal material and insulating material. The electrode 3 covered by the insulating medium is introduced from the side of the dielectric tube 2 and fixed in the center of the dielectric tube 2 along the axis to form the center electrode 3. The center electrode 3 can be made of tungsten, copper, stainless steel, aluminum and other metal c...

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Abstract

A jetting device for a low-temperature plasma generated by the atmospheric dielectric barrier discharge relates to the technical field of the application of gas discharge plasma. Inert gas and air are used as working gas; the plasma generated in a discharge area is blown out in the form of jet; the problem of limited application range caused by the narrow parallel-plate dielectric barrier discharge area and a high plasma macroscopic temperature can be solved. The device has the structural characteristics that a hollow pipe-shaped connector is connected with a hollow dielectric pipe; an electrode coated with insulation dielectric is fixed at the center of the dielectric pipe; an annular electrode is closely attached to the outer wall of the dielectric pipe; the working gas enters the dielectric pipe from a flow meter and a retaining valve through the connector; the plasma is blown out to form the plasma jetting. The jetting device has the advantages of low plasma macroscopic temperature, large electron energy, wide expanded range, low cost, low energy consumption and high reliability; furthermore, the jetting device can used in the fields of sterilization and disinfection, the surface modification of complex-shaped material, waste gas treatment, ozone synthesis, as well as the physical and chemical fields of the discharge light source plasma.

Description

technical field [0001] The invention belongs to the technical field of gas discharge, and relates to a device for generating discharge plasma. Background technique [0002] There are a large number of active particles in low-temperature plasma, which are more active and more active than those produced by ordinary chemical reactors, and are more likely to react with the surface of materials and biological cells in contact, so they are extremely useful in many fields. Wide application prospects, such as ozone synthesis, material surface modification, plasma etching, solid film deposition, sterilization, air pollution treatment, etc. In the prior art, although it is easy to generate relatively uniform discharge plasma under low pressure, its generation process requires a vacuum environment, which brings a lot of inconvenience to the application; in contrast, the generation of plasma under atmospheric pressure does not require expensive vacuum In recent years, researchers at ho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/32H05H1/34
Inventor 张冠军许桂敏马跃
Owner XI AN JIAOTONG UNIV
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