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Compound photon sieve for large-caliber imaging and manufacturing method thereof

A production method and photonic sieve technology, which are applied in the photoengraving process, optics, diffraction grating and other directions of the pattern surface, can solve the problems of reducing the amount of layout data, unable to produce large-diameter imaging photonic sieves, etc., and achieve the suppression of side lobe effects and The effect of advanced diffraction, imaging contrast enhancement, sharp focal spot

Active Publication Date: 2011-05-04
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0010] In order to solve the problem that the existing processing technology cannot produce large-diameter imaging photon sieves, another object of the present invention is to provide a method for manufacturing a composite photon sieve for large-diameter imaging, so as to effectively reduce the amount of layout data, so that the existing The advanced processing technology can meet the production requirements of large-diameter imaging photon sieves

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  • Compound photon sieve for large-caliber imaging and manufacturing method thereof
  • Compound photon sieve for large-caliber imaging and manufacturing method thereof
  • Compound photon sieve for large-caliber imaging and manufacturing method thereof

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Embodiment Construction

[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0044] A composite photon sieve, including a light-transmitting quartz substrate and an opaque metal chromium film plated on it, the material of the light-transmitting substrate can also be light-transmitting materials such as ordinary glass or plexiglass, and the light-impermeable The material of the metal film can also be opaque metals such as gold, aluminum or copper;

[0045] A series of light-transmitting annular zones and some light-transmitting small holes are distributed on the opaque metal chromium film; the diameter of the quartz substrate is 10cm, the diameter of the photon sieve is 17.75mm, the number of annular zones is 370 rings, and the wavelength is 355nm, the focal length is 0.3m, the diameter of the ligh...

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Abstract

The invention discloses a compound photon sieve for large-caliber imaging and a manufacturing method thereof and belongs to the technical field of diffractive optical elements. The compound photon sieve comprises a transparent substrate and a lightproof metal film plated on the pervious substrate; a series of transparent girdles and pervious apertures which are randomly distributed are designed on the lightproof film; a pervious plane can be made of transparent materials such as fused quartz, common glass, organic glass and the like; the lightproof film is a metal light-blocking layer of chromium, gold, aluminum, copper and the like prepared on the transparent substrate; and the transparent girdles and the transparent apertures are not provided with the metal light-blocking layer. Compared with Fresnel wave zone plates, the compound photon sieve provided by the invention can improve numerical aperture and imaging resolution and can effectively restrain side-lobe effect and high-order diffraction in the direction of an optical axis; and compared with a common photon sieve, the compound photon sieve can improve imaging contrast, effectively reduces data volume of geometry data standard II (GDSII) map files, and reduces the difficulty in processing large-caliber imaging photon sieves.

Description

technical field [0001] The invention relates to the technical field of diffractive optical elements, in particular to a composite photon sieve for large-aperture imaging and a manufacturing method thereof. Background technique [0002] The photon sieve is a new type of diffractive optical element based on the Fresnel zone plate. It replaces the area corresponding to the bright ring on the Fresnel zone plate with a large number of randomly distributed light-transmitting small holes, and the diameter of the small holes is the corresponding 1.5 times the width of the zone plate ring. These light-transmitting small holes randomly distributed in the position make the diffracted light interfere with each other, which can effectively suppress the side lobe effect and advanced diffraction, improve the resolution, and obtain a sharper focal spot. [0003] The resolution of the traditional zone plate in the imaging field depends on the width of its outermost ring, which is limited by...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/00
Inventor 谢常青潘一鸣朱效立贾佳刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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