Binary photon sieve

A technology of photon sieve and light-transmitting film, applied in optics, optical components, instruments, etc., can solve the problem of low diffraction efficiency, achieve high diffraction efficiency, suppress high-order diffraction, and improve imaging contrast

Inactive Publication Date: 2007-10-24
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The purpose of the present invention is to provide a kind of binary photon sieve in order to overcome the shortcoming that the diffraction efficiency is not high

Method used

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  • Binary photon sieve

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Embodiment 1

[0037] Figure 1 is an example of a binary photon sieve. The design parameters of this binary photon sieve are: photon sieve diameter Φ=80mm, F # =8, the base material is K9 glass, the thickness is a glass sheet of 2mm, and the design wavelength is 532nm; after calculation, this binary photon sieve has 2347 annular band cycles (composed of planar light-transmitting small holes and groove-type light-transmitting small hole composition), to obtain the distribution of the planar light-transmitting holes and the groove-type light-transmitting holes of the binary photon sieve; make the first mask according to the distribution of the planar light-transmitting holes; The distribution of the holes creates a second mask with alignment marks between the two masks. The first step is to vapor-deposit a layer of chromium film on the glass substrate, then apply glue on the surface coated with chromium film, use the first mask to photolithography, develop and fix, and use a solution to remov...

Embodiment 2

[0039] Figure 2 is an example of a binary photon sieve. The design parameters of this binary photon sieve are: photon sieve diameter Φ=80mm, F # =10, the base material is K9 glass, the thickness is a glass sheet of 2mm, and the design wavelength is 532nm; after calculation, this binary photon sieve has 1878 annular zone periods (composed of planar light-transmitting small holes and boss-type light-transmitting small holes Composition), to obtain the distribution of the planar light-transmitting holes and the convex platform-type light-transmitting holes of the binary photon sieve; make the first mask according to the distribution of the planar light-transmitting holes, and make the first mask according to the distribution of the convex-table light-transmitting holes A second mask is made with alignment marks between the two masks. The first step is to apply glue on the glass substrate. The thickness of the glue layer should be greater than 0.5 microns. Use the second mask to ...

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Abstract

The invention discloses a binary photon screen, comprising a transparent plate base with a light-tight film provided with transparent holes, wherein the transparent holes are plane type and concave type, or plane type and cam type. The invention has the advantages that (1), relative to the Fenier zone plate, the holes on the photon screen are randomly distributed in a relative Fenier transparent annular area, to effectively restrain the high-order diffraction along optical axis and horizontal side lobe effect, to improve image contrast, to obtain cute focus, (2), relative to the Fenier zone plate and the vibration photon screen, the binary photon screen has high diffraction efficiency.

Description

technical field [0001] The invention relates to an optical element, in particular to a binary photon sieve. Background technique [0002] The photon sieve is a new type of diffraction element that replaces the light-transmitting annular zone in the traditional Fresnel zone plate with a large number of light-transmitting small holes randomly distributed (as shown in Figure 1). Compared with the Fresnel zone plate, the small holes on the photon sieve are randomly distributed in the corresponding Fresnel light-transmitting zone area, which can effectively suppress the high-order diffraction in the optical axis direction and the lateral side lobe effect, and improve imaging contrast, a sharper focus can be obtained, and compared with the traditional Fresnel zone plate and the outermost peripheral zone width of the binary diffraction element is limited by the processing technology, the peripheral area of ​​the photon sieve (the corresponding Fresnel zone is usually The annular z...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/28G02B5/00
Inventor 侯昌伦白剑侯西云杨国光
Owner ZHEJIANG UNIV
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