Compact maskless photoetching system and exposure method thereof

Abstract

The invention discloses a compact maskless photoetching system and an exposure method thereof, belongs to the field of maskless digital photoetching, and aims to solve the problem that ultraviolet light energy is sharply reduced due to light path folding in the prior art. According to the compact maskless photoetching system and the exposure method thereof, purple light and red light are integrated on the same plane, so that it can be ensured that the purple light and the red light form a coaxial light source; the red light is used for illumination and exposure pattern alignment; the purple light is used for exposure distribution andthe periphery of an optical axis; and thus, the problem of overlarge size of an existing maskless photoetching system caused by complex structure and excessive used elements in the existing maskless photoetching system is solved, and the problem that the photoetching efficiency of the photoetching system is low due to low light energy utilization rate caused by a complex light path is also solved.

Description

technical field [0001] The invention belongs to the field of maskless digital photolithography, in particular to a projection photolithography technology based on an ultraviolet exposure light source. Background technique [0002] Since it does not require complex and expensive mask processing, maskless digital lithography has broad application prospects in PCB circuit manufacturing, micro-opto-electromechanical and biochip processing, and micro-nano semiconductor device preparation. In particular, with the unique digital image generation function based on digital micromirror (DMD) or liquid crystal spatial light modulator (SLM) and the unique ultraviolet selective exposure characteristics of photoresist, visible lithography can be realized, which is especially suitable for Lithography image flexible and diverse scientific research level lithography instrumentation needs. In recent years, the integration of small desktops is one of the development trends of maskless digital...

AI Technical Summary

Problems solved by technology

Although the folding of the optical path can effectively reduce the volume of the light source, in the large-array projection lithography system, the size of the optical components is large, and it is difficult to effectively reduce the volume of the system depending on the optical path folding alone.

In addition, excessive optical path folding leads to a sharp reduction in the energy of ultraviolet light, while increasing the power of ultraviolet light, considering the difficulty of manufacturing high-power ultraviolet light sources and the particularity of heat dissipation management, resulting in increased system costs

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