Fully-spherical projection objective

A projection objective lens, a global technology, applied in optics, instruments, optical components, etc., can solve the problems of complex objective lens structure, long conjugate distance, high price, etc., and achieve high lithography efficiency, high object telecentricity, and reduced The effect of production cost

Inactive Publication Date: 2012-11-07
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Japan Nikon (Nikon), Canon (Canon) and German Zeiss (Zeiss) and other companies disclose the working wavelength 193 nm projection lithography objective lens, the resolution is relatively high, but these objective lenses are complex in structure, difficult to manufacture, and expensive
Most systems with a numerical aperture of 0.75 have high-order aspheric surfaces, longer conjugate distances, and larger system volumes

Method used

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Embodiment Construction

[0022] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0023] figure 1 It is a schematic diagram of the layout of the spherical projection objective lens of the present invention, 28 pieces of spherical lenses form the first lens group G1, the second lens group G2, the third lens group G3, the fourth lens group G4 and the fifth lens group G5, which are sequentially incident from the light beam The direction is set to form a double waist structure as a whole.

[0024] The first lens group G1 includes a first positive lens 1 , a second positive lens 2 , a first negative lens 3 and a first meniscus lens 4 . , the first lens group G1 has positive refractive power and converges the incident light beam. Wherein, the first positive lens 1 converges the light onto the second positive lens 2, the second positive lens 2 continues to converge the light, and the light reaches the firs...

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Abstract

The invention provides a fully-spherical projection objective which is used for forming an image of an object plane into an image plane. The fully-spherical projection objective, along the direction of an optical axis, comprises a first lens group, a second lens group, a third lens group, a fourth lens group and a fifth lens group; and in a sequence of the incident direction of a light beam, the first lens group G1 has a positive focal power, the second lens group G2 has a negative focal power, the third lens group G3 has the positive focal power, the fourth lens group G4 has the negative focal power, and the fifth lens group G5 has the positive focal power. All lenses in the fully-spherical projection objective are spherical lenses, not aspherical lenses. By adoption of the fully-spherical projection objective, aberration can be better compensated, imaging quality is improved, system resolution is improved, and photoetching efficiency is improved.

Description

technical field [0001] The invention relates to a spherical projection objective lens, in particular to a high-resolution projection lithography objective lens system. Background technique [0002] Optical projection lithography is an optical exposure process that uses the principle of optical projection imaging to transfer high-resolution patterns to rubber-coated silicon wafers by step-and-repeat or step-and-scan exposure of IC patterns on the mask. Optical projection lithography is developed on the basis of contact and proximity lithography. The use of projection lithography can prolong the service life of the mask, and if the projection objective lens with reduced magnification is used, it is also convenient for mask production. Optical projection lithography has experienced the development of stepper and scanner. [0003] The lithography resolution can be improved by shortening the wavelength, reducing the process constant and increasing the numerical aperture of the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B13/06G02B13/18G02B13/22G02B1/00G03F7/20
Inventor 朱红伟邢廷文林妩媚廖志远廖志杰张海波
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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