A maskless laser direct writing overlay exposure method

A technology of laser direct writing and exposure method, which is applied in the field of lithography, can solve the problem that there is no flexible means for the selection of the number of overlaps and exposure measurement, and achieve the effect of convenient and precise control.
CN104298080BActive Publication Date: 2016-08-31SVG TECH GRP CO LTD +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SVG TECH GRP CO LTD
Publication Date
2016-08-31

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Abstract

The invention discloses a maskless laser direct writing stacking exposure method. During X-direction moving of a precision motion platform, exposed graphs are subjected to equal-pixel translational display in the height direction of an SLM (Spatial Light Modulator); when the movement distance of the platform is equal to the pixel imaging translational quantity of the SLM, an exposure signal is sent to realize synchronous exposure of graphs and positions; after one-line exposure, the images in the width direction of the SLM are subjected to set-pixel translational display, and at the same time, the precision motion platform deflects for a corresponding set-pixel imaging distance in the Y direction so as to realize bidimensional stacking exposure in the height and width directions. The maskless laser direct writing stacking exposure method is flexible in measures, can obtain different exposure stacking folds so long as the X-direction displayed translational quantity and the Y-direction stacking fold are changed, conveniently realizes accurate control of the exposure metering, is small in graphic data quantity and achieves the same stacking exposure data amount at any number of times.
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Description

technical field

[0001] The invention relates to the technical field of photolithography, in particular to a maskless laser direct writing stacking exposure method. Background technique

[0002] Maskless laser direct writing technology is widely used in precision mask manufacturing, MEMS device manufacturing, flat panel display, thin line width PCB board manufacturing and other fields.

[0003] In order to achieve high image accuracy and better exposure uniformity and the demand for exposure measurement, the maskless laser direct writing system on the market generally adopts the method of overlapping and repeated exposure in the XY two-dimensional direction. There is no flexible method for the selection of the number of laps and the control of exposure measurement. Different lap times and exposure measurement control often require the design of different data formats and unique platform position and positioning methods to achieve multiple overlapping exposures. Purpose. [...

Claims

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